全部 100mg 1g 250mg 5g 25g 100g 1ml 500g 50mg 10g 25mg 5mg 200mg 10mg 500mg 2.5kg 1mg 5ml 10kg 100ml 25ml 500ml 2.5l 20mg 250ml 2g 1l 1.2ml 50g 12x500g 1kg 250g 50ml 10l 12x500ml 5kg 10ml 2.5g 2ml 100t/ea 50t/ea 200μl 800ml 25l 5l 25kg 100μl 10ea 1000g 48t/ea 96t/ea 20t/ea 100μg 15mg 2.5mg 0.5g 20x500g 20kg 25×25mm 20ml 0.25g 2mg 150ml 10t/ea 250μl 0.6ml 10x0.6ml 500t/ea 25μg 0.5ml 400μl 125t/ea 150t/ea 25t/ea 165t/ea 40t/ea 30mg 500μg 50mm 0.5mg 10x0.5ml 1000ml 1000t/ea 200t/ea 1000u 200u 200g 4l 50μl 20l 1set/ea 200ml 200μg 25cm 2kg 400g 50μg 0.1g 0.1ml 10+1l/ea 100+10ml/ea 500+50ml/ea 2000u 100ku 100l 400mg 500μl 10ku 20ku 20x500ml 10x100μl 20x100μl 10μg 12.5ml 1200u 600u 120μl 1cm 1ku 5ku 5x1ml 2cm 300mg 4000u 8000u 50u 5m (10x染液 20ml+缓冲液200ml)/ea 0.1ku 0.5ku 0.25ml 0.2ml 0.55ml 10x0.55ml 10x1g 1.5ml 10×100μl 10×10cm 10*1ml/ea 10*1ml 10000u 20000u 50000u 1000mg 5000u 250u 3000u 500u 1000μl 100cm 26g 40g 60g 70g 75g 80g 85g 90g 95g 300g 150g 170g 158g 176g 20g 6x500g 125mg 5x100mg 2l 400ml 12ml 20x5ml 51ml 54ml 52ml 53ml 55ml 350ml 100m 25m 5x100t/ea 100u 100x100mm 25μl 50ku 15ml 10mm2/ea 25mm2/ea 10m 250m 50m 10x0.75ml 10x1ml 10x20cm 5x10cm 10x250μl 5x250μl 10x2l 10x5g 110g 114g 46g 12ku 24ku 150u 75u 15g 160mm 1ea 52g 250 mg 4g 5x1g 2ku 300ml 4x4l 25x1ml 1m 3m 5set/ea 2*250u 2.5ml 2.5m 200000u 40000u 5x10000u 600μl 20x20mm 250cm 50cm 25u 4ku 2x1ml 2x2l 30g 30μl 3g 3ml 400u 8ku 4x100μl 4x1ml 4x400μl 4x125ml/ea 50×50mm 5cm 50x100mm 5μg 60μl 6g 90x90mm

全部 95% 98% 97% ≥95% ≥98% 99% ≥97% 96% 10mm in dmso 90% ≥99% ≥98%(gc) 95+% ≥96% ≥90% >98.0%(gc) 99.9% metals basis 99.99% metals basis ≥98%,99%e.e. ≥98%(hplc) 98 atom% d 97%(hplc) 分析对照品 试剂级, 98% ≥97%(gc) 99.5% ≥95%(gc) ≥98%(t) 99.9% >99% 试剂级, 99% 98 atom % d ≥98 atom % d 试剂级 ≥98% (hplc) ≥98.0% ≥98%(gc)(t) 85% ≥98%,≥99% e.e. 98%, 98 atom % d 98+% 94% ≥98%,≥99%e.e. 分析对照品,>98% 99.99% >97% 试剂级, 99.0% 93% 99.999% metals basis >95% 80% 92% 10mm in water 98%,ee99% ≥98%(hplc)(t) ≥98.0%(gc) ≥99%(gc) 试剂级, 99.5% >97.0%(gc) 95% hplc 99.95% metals basis >98% ≥96%(gc) ≥90%(gc) >95.0%(gc) 97% 99%ee >98.0%(t) 2mm in dmso 100 μg/ml 异辛烷溶液 ≥95%(hplc) ≥95%,99%e.e. 99.9% trace metals basis ≥97.0% 0.5m in thf 95% mix tbc as stabilizer 97%,99%ee 过滤除菌,细胞培养适用 ≥93% ≥98 % 10mm in h2o >99.0%(gc) ≥98.0%(hplc) >98.0%(hplc) 1.0 m solution in thf, mkseal 100μg/ml in methanol, 不确定度3% 0.5 m solution in thf, mkseal 98%,99%ee analytical standard ≥95%(t) ≥97%(t) ≥99.5% 98%(hplc) ≥98%(n) 97%, 99% e.e. 优级试剂 >98%(gc) ≥95%,≥99%e.e. >98.0% 99.9% (reo) kit ≥97%(gc)(t) 100μg/ml in acetonitrile 99 atom % d 99%,water≤50 ppm (by k.f.), mkseal 99.99% trace metals basis 优级试剂, 99% 1000μg/ml in methanol, 不确定度2% ≥97%(hplc) ≥98%(t)(hplc) 干粉,细胞培养适用 98% 98%atom%d 99.999% trace metals basis ≥98%(hplc)(n) ≥98%(lc) 试剂级, 97% 试剂级, 98.0% 98.5% 99.5% metals basis ≥85% ≥99.99% metals basis ≧95% 分析对照品, ≥98% >96.0%(gc) 100μg/ml in methanol 70% 75% 98% 99%ee ≥80% ≥94% ≥99%(t) 1000μg/ml in acetonitrile, 不确定度2% 95%(hplc) 99 atom % 13c 99% metals basis 99.995% metals basis sp 1000μg/ml in methanol 95% (stabilized with tbc) 98%(gc) 99.99% (reo) acs ≥97 % 试剂级, 95% 试剂级, 98.5% >98.0%(gc)(t) >98.0%(hplc)(t) 98% (hplc) 98%,gc 99.5% trace metals basis 99.8% metals basis >98% ≥95% (hplc) ≥95.0%(gc) ≥99%(hplc) 固体 超干级, 99.99% metals basis >98%(hplc) >98%(lc) 95%,stabilizedwithtbc 99.999% m.w. 2000 ≥92% ≥95.0% 优级试剂, 99.5% 100μg/ml in acetonitrile, 不确定度3% 50% 97% mix tbc as stabilizer 97%, 99%e.e. 99 atom % 13c 99% trace metals basis >95% ≥97% (hplc) ≥98% (tlc) ≥99.0% ≥99.9% trace metals basis >97.0%(t) >99% (tlc) 10% in h2o ≥98%(lc&n) ≥99.5%(gc) >90.0%(gc) >99.5% 0.5 m in thf 95%(gc) 99%, with molecular sieves, water≤50 ppm (by k.f.), mkseal 99%,with molecular sieves, water≤50 ppm (by k.f.), mkseal 99.8% ≥70% 91% 95% +(stabilized with tbc) 95%(stabilized with tbc) 97+% 98%,lc&t 98%,t ≥98%,99%d.e. ≥98%,顺反混合物 ≥98.0% (hplc) 丰度:99atom%;化学纯度:≥98.5% 分析对照品,98% 分析标准品 >95.0%(hplc) 10x 97%, 99%ee 98 atom % d, 98%(cp) 98%,顺反混合物 99+% average mn 2000 br m.w. 5000 ≥93%(gc) ≥97%(hplc)(t) ≥98%(lc&t) 0.5μg/ml in isooctane 100μg/ml in cyclohexane 10μg/ml in isooctane 35μg/ml in isooctane 95%, contains tbc as stabilizer 98%, 99%e.e. 99.5%,with molecular sieves, water≤50 ppm (by k.f.), mkseal ≥95 % ≥95%(gc)(t) ≥98%(gc&t) 丰度:10atom%;化学纯度:≥98.5% 分析对照品, ≥99%(hplc) 试剂级, 96% >97%(hplc) >98.0%(n) >99% (hplc) 1000ug/ml in purge and trap methanol 20μg/ml in isooctane 40% 50% in h2o 88% 97%(gc) 98 atom % 15n 98%,99% e.e. 99.995% trace metals basis m.w. 1000 m.w. 4000 mw2000 ≥90%(hplc) ≥94%(gc) ≥95.0%(t)(hplc) ≥97.0% (hplc) ≥99 % 无水, 粉末, 99.99% metals basis 过滤除菌 >95.0%(t) >96% 0.25 m solution in thf, mkseal 0.2m,ph7.4 0.3-0.8mmol/g 0.5m,ph7.4 1.0 m solution in thf,mkseal 10×,过滤除菌,无酶 100×,过滤除菌,细胞培养适用 97% (stabilized with tbc) 98% (stabilized with tbc) 99.9% (metals basis) 99.998% metals basis d,99% tech. 90% technical grade ≥80%(gc) ≥85%(gc) ≥90%(t) ≥95%(lc) ≥95%(t)(hplc) ≥95.0% (hplc) ≥95.0%(hplc) ≥97.0%(gc) ≥98 atom % d, ≥98%(cp) ≥98.0%(t) ≥99%(tlc) ≥99.5%(4 times purification) ≥99.9% 分析对照品, ≥98%(hplc) 用于合成 符合usp测试规范 药典专用 试剂级, 90% 试剂级, 97.0% 超干级, 99.99% (reo) 过滤除菌,无菌无酶,细胞培养适用 过滤除菌,无酶 >99%(gc) 0.2m,ph8.0 0.5m,ph7.0 0.5m,ph8.5 100 ug/ml in isooctane 1m 2.0 m solution in thf, mkseal 30% in h2o 5% in h2o 50%水溶液 65% 95%,gc 97% +(stabilized with tbc) 97%(stabilized with tbc) 98%, mixture of isomers 98%, 异构体混合物 98%,gc&t 98%,mixture of isomers 99%(hplc) 99.5%,water≤50 ppm (by k.f.), mkseal 99.7% 99.997% metals basis >97% average mn 10000 average mn 20000 ≥97%(lc) ≥98%,gc ≥98.0% (gc) ≥98.5% ≥99.0%(gc) ≥99.99% trace metals basis 分析对照品, ≥99% 分析对照品,≥98% 天然来源, ≥98% 无水, 粉末, 99.9% metals basis 无色液体 >90% >94.0%(gc) >97.0%(hplc) >99.0%(t) 1.0 m solution in hexanes, mkseal 1000μg/ml in acetonitrile 100μg/ml in isooctane 20% in h2o 95% (hplc) 97% average mw2000 97% average mw5000 97%, contains tbc as stabilizer 97%,stabilizedwithmehq 98% +98%atom%d 98%(hplc)(t) 98%(stabilized with mehq) 98%,stabilizedwithmehq 98%,含稳定剂铜屑 98%,异构体混合物 98.0%(gc) 99%(gc) 99%,water≤50 ppm (by k.f.),mkseal 99.9% trace rare earth metals basis 99.98% metals basis acs,≥99.5% average mn 600 technical grade, 92% technical grade, 95% ≥95.0%(hplc)(qnmr) ≥96%(gc)(t) ≥96%(hplc) ≥97.0%(t) ≥98%,异构体混合物 ≥98%,顺反异构体混合物 ≥99%(gc)(t) 试剂级, ≥99% 试剂级, ≥99.5% >95%(gc) >95%(lc) >97%(gc) >98%(gc&t) >99.0% (gc) >99.5%(gc) 0.2m,ph7.0 0.2m,ph8.5 0.5 m solution in thf ,mkseal 0.5m solution in thf 0.5m,ph8.0 1.0 m in thf, mkseal 1.0 m in thf 100mm,过滤及高温双重灭菌 100μg/ml in hexane 25μg/ml in acetonitrile 5m 60% 60%水溶液 95%,stabilized with tbc 97% (hplc) 97%,gc 97%,含有数量不等的酸酐 97%,异构体混合物 98 atom % d, 98% (cp) 98 atom % d, 98% 98%(mixture of isomers) 98%(mixture) 98%, stabilized with copper chip 98%purity,99%e.e. 99 atom % 13c, 98%(cp) 99%,gc 99.95% trace metals basis 99.95% 99.99% metals basis,200目 99.9999% metals basis average mn 1000 average mn 5000 d,99.5% mw=1000 mw=2000 spectrophotometric grade, ≥99% usp级 ≥50% ≥60% ≥90% (hplc) ≥90.0% ≥95%(lc&t) ≥96%(t) ≥97.0% (gc) ≥98% (hplc), powder ≥98%(n)(t) ≥98%(t&lc) ≥98.0%(t)(hplc) ≥99% trace metals basis 无水,99.9% metals basis 环保级 试剂级, 99.8% 超干级, 99.99%(reo) >96%(gc) >97.0%(gc)(t) >98%(t) >98.0%(hplc)(n) >98.0%(lc&n) >99% (gc) 0.2m,ph6.5 1.0 m solution in thf ,mkseal 100μg/ml in hexane, 不确定度3% 100μg/ml in mtbe 10g/l in h2o 10μg/ml in cyclohexane 1m,ph8.0 20 wt. % in h2o 200目 20x 25% in water 25%水溶液 30% in water 300-400目 40% in water 400目 50 wt. % in h2o 50% in water 82% 90%(nmr) 95% (stabilized with mehq) 95%, 异构体混合物 95%,含有数量不等的酸酐 95%,顺反混合物 95%混合(tbc作为稳定剂) 96%(hplc) 97% average mw10000 97% average mw1000 97%,>99% ee 97%,stabilizedwithtbc 98 atom % 13c, 95%(cp) 98 atom % 15n 98 atom% 98%,lc 98%,water≤50 ppm (by k.f.), mkseal 98%,含不同量的酸酐 98.0%(t) 98atom % d, 98% 99 atom % 13c, 98% (cp) 99 atom% ¹³c 99% (cp) 99%,with molecular sieves, water≤50 ppm (by k.f.),mkseal 99%,含稳定剂mehq 99.9% metals basis,10μm 99.9% metals basis,50nm 99.9%(reo) 99.98% 99.999% (metals basis) acs, ≥99.0% average mn 3400 average mn 40000 meets usp testing specifications mw5000 mw=5000 natural reagent grade, 98% reagent grade ≥95%(hplc)(qnmr) ≥95%(hplc)(t) ≥95%(n) ≥95%,99%d.e. ≥95.0% (gc) ≥96.0% ≥97%(lc&n) ≥97%(n)(t) ≥97%(n) ≥97%(t)(hplc) ≥98 atom % d, ≥98% (cp) ≥98.0%(hplc)(qnmr) ≥99% (gc) ≥99.0% (gc) ≥99.0%(hplc) ≥99.5% (gc) ≥99.99% 优级试剂, 98% 优级试剂, 99.8% 优级试剂, 99.9% 分析对照品, ≥99.5%(gc) 分析对照品,99.5% 分析对照品,>95% 工业级 无水,99.99% metals basis 白色粉末 粉末,99.9% metals basis > 98% >80.0%(t) >85.0%(gc) >90.0%(hplc) >93.0%(gc) >95%(lc&t) >95%(t) >95.0%(lc) >95.0% >98%(lc&n) >98%(lc&t) >99.0%(lc) >99.5% (gc) 0.25m in tetrahydrofuran 0.2m,ph6.0 0.2m,ph7.2 0.5 m in thf 0.50 m in 2-methf 0.5m,ph6.0 0.5m,ph6.5 0.5m,ph7.5 0.5m,ph7.6 0.5m 0.85-1.7mm, 元素分析仪专用 1% in h2o 1.0 mg/ml in acetonitrile 10 wt. % in h2o 10% (v/v) in h2o 10% 100 μg/ml in acetonitrile 100 μg/ml in isooctane 100-200目 1000μg/ml in hexane, 不确定度2% 1000μg/ml in mtbe 10μg/ml in acetonitrile 1m,ph7.4 1m,ph7.5 2.0 m solution in thf,mkseal 20×,过滤除菌,无酶 20g/l in h2o 25% in h2o 2mm in h2o 30 wt. % in h2o 40 wt. % in h2o 45%水溶液 5.0% pd basis 50% w/w in water 50% w/w 水溶液 50×,过滤除菌,细胞培养适用 60.0 g/l葡萄糖,无ht添加剂,无l-谷氨酰胺,无碳酸氢钠,无酚红,过滤除菌,细胞培养适用 65 wt. % in h2o 70%水溶液 75-150目 83% 89% 95% (stabilized with bht) 95% average mn 2000 95% contains ≤10%h2o 95%(mixture) 95%(nmr) 95%(t) 95.0%(gc) 97 atom % d 97% (stabilized with mehq) 97%(nmr) 97%(stabilized with mehq) 97%, 50% in methanol 97%, mixture of isomers 97%, stabilized with tbc 97%,含不同量的酸酐 97.0% (gc) 98 atom % 13c, 98 atom % 15n, 95%(cp) 98 atom % d, 95% 98 atom % d, 99% (cp) 98 atom % d, 99%(cp) 98 atom % d,98% 98 atom% 15n 98% (stabilized with tbc) 98% (stabilized with bht) 98% (stabilized with copper chip) 98% 99.9+% ee 98% metals basis 98% mix tbc as stabilizer 98%(stabilized with copper chip) 98%(stabilized with tbc) 98%, 99 atom % 13c 98%, 99 atom % d 98%, 99%ee 98%, contains tbc as stabilizer 98%, mixture of cis and trans isomers 98%, stabilized with mehq 98%, stabilized with tbc 98%, 用于合成 98%,lc&n 98%,n 98%,with molecular sieves, water≤50 ppm (by k.f.), mkseal 98%,含稳定剂hq 98%,顺反异构混合物 99 atom % 13c, 99%(cp) 99 atom % 13c, 99%(cp) 99 atom% 13c 99% (metals basis) 99% (reo) 99%(4 times purification) 99%,升华纯化 99%,粉末 99.5%, water≤50 ppm (by k.f.), mkseal 99.5%,100目 99.8%,with molecular sieves, water≤50 ppm (by k.f.), mkseal 99.9 % metals basis 99.9% metals basis,200nm 99.9% metals basis,200目 99.9% metals basis,粉末 99.9%,200目 99.99% (metals basis) 99.99% metals basis,粉末 99.998% trace metals basis acs,≥99.0% bs dye content 90 % for spectrophotometric det. of cu, ≥99% ind mw 1000 mw 2000 da mw 5000 mw3400 powder reagent grade, 99% tech. 85% technical grade, 90 % ≥70%(gc) ≥75%(gc) ≥75% ≥88%(gc) ≥92%(gc) ≥95% (gc) ≥95% (stabilized with tbc) ≥95%(hplc)(n) ≥95%(tlc) ≥95%,异构体混合物 ≥95%,顺反异构体混合物 ≥95.0% (tlc) ≥96% (hplc) ≥96%(t&lc) ≥97 % sum of enantiomers ≥97.0% (tlc) ≥98 atom %, ≥98%(cp) ≥98%(gc), 用于生化研究 ≥98%(hplc)(qnmr) ≥98%, ≥98 atom % d ≥98%, 用于生化研究 ≥98%,含稳定剂铜屑 ≥98.0% (nt) ≥98.0% (t) ≥98.0%(gc)(t) ≥98.0%(hplc)(n) ≥99% (hplc) ≥99.0% (hplc) ≥99.0% (sum of enantiomers, gc) ≥99.7% ≥99.8% ≥99.9% metals basis ≥99.9%(gc) ≥99.999% metals basis 丰度:98atom%;化学纯度:≥98.5% 分析对照品, 99.5% 分析对照品,99% 分析对照品,≥99.5% 基质:sio2,表面基团:-cooh,粒径:0.1-1μm,单位:5mg/ml 基质:sio2,表面基团:-cooh,粒径:1-2μm,单位:10mg/ml 基质:sio2,表面基团:-cooh,粒径:2-3μm,单位:10mg/ml 基质:sio2,表面基团:-cooh,粒径:3-4μm,单位:10mg/ml 基质:sio2,表面基团:-epoxy,粒径:1-2μm,单位:10mg/ml 基质:sio2,表面基团:-epoxy,粒径:2-3μm,单位:10mg/ml 基质:sio2,表面基团:-epoxy,粒径:3-4μm,单位:10mg/ml 基质:sio2,表面基团:-epoxy,粒径:4-5μm,单位:10mg/ml 基质:sio2,表面基团:-nh2,粒径:1-2μm,单位:10mg/ml 基质:sio2,表面基团:-nh2,粒径:2-3μm,单位:10mg/ml 基质:sio2,表面基团:-sioh,粒径:2-3μm,单位:10mg/ml 基质:sio2,表面基团:-sioh,粒径:3-4μm,单位:10mg/ml 基质:sio2,表面基团:-sioh,粒径:4-5μm,单位:10mg/ml 液体 生物技术级 离子对色谱级 粉末 试剂级, >99.0%(gc) 试剂级, 85% 试剂级, 90.0% 试剂级, 94% 试剂级, ≥98% 超干级, 99.9% metals basis 通用 高糖,无碳酸氢钠,无l-谷氨酰胺,无酚红,干粉,细胞培养适用 高糖,碳酸氢钠,无l-谷氨酰胺,无ht添加剂,酚红,过滤除菌,细胞培养适用 >80.0%(gc) >85%(gc) >90%(hplc) >90.0%(lc) >90.0%(t) >94% >95%(hplc) >95.0%(gc)(t) >95.0%(lc&t) >96.0%(lc&t) >96.0%(t) >97%(gc&t) >97.0%(hplc)(t) >97.0%(lc) >97.0% >98%(t&lc) >98.0%(lc) >98.5%(gc) >99%(hplc) >99%, ee >98% >99.0% >99.5%(lc) (d, 99%) (d,99.5%) (d,99.9%) 0.0025,过滤除菌,细胞培养适用 0.01m in h2o 0.05%(w/v)in water 0.05000mol/l(0.05m) 0.1%(w/v) in h2o 0.1000mol/l(0.1m) 0.1m in h2o 0.1m,ph7.4,10×,过滤除菌,无酶 0.1mol/l in h2o 0.1mol/l 介质:h2o 0.1mol/l,介质:h2o 0.1mol/l 0.2m,ph7.5 0.2m,ph7.6 0.2m,ph9.0 0.5 m in h2o 0.5 m in thf, mkseal 0.5 m solution in thf,mkseal 0.5m in 2-methf 0.5m in h2o 0.5m solution in thf, mkseal 0.5m, ph7.0 0.5m,ph5.0 0.5m,ph9.0 0.5m,ph9.5 0.5mol/l in thf 0.5mol/l in water 0.5mthf 0.7-1.3 mmol/g 0.8mmol/g 1% (v/v) in h2o 1% (w/v) in h2o 1%乙醇溶液 1.0 m in h2o 1.0 m solution in heptane, mkseal 1.0 mol/l in h2o 1.0m,ph6.5 1.0m,ph6.8 1.0m,ph7.4 1.0m,ph7.5 1.0m,ph8.0 1.0mm 直径, 99.8% metals basis 1.0mol/l in thf 1.8 m solution in thf, mkseal 10%(w/v) 10%水溶液 10%溶液 1000 ug/ml, 10 mol/l hno3 1000ug/ml, 5% hno3 1000μg/ml in acetonitrile,uncertainty 2% 1000μg/ml in hexane 1000μg/ml in purge and trap methanol 1000μg/ml, in purge and trap methanol 1000μg/ml,溶于吹扫-捕集甲醇溶液中 100g/l in h2o 100mg/ml,过滤除菌 100mm 100μg/ml in h2o 100μg/ml in water 100目 10ug/ml in methanol 1250目 14% in h2o 14.4-97.4 kda 15.3% pt 1m in h2o 1m,ph7.0 1m,ph7.6 1m,ph8.5 1m,ph9.0 1mg/ml,无菌 1x 2× 2.0 m in thf, mkseal 2.0 m solution in hexanes, mkseal 2.0m in thf,mkseal 20%水溶液 200-300目 2000ug/ml in purge and trap methanol 200mm,100×,过滤除菌,细胞培养适用 200mm 20mg/ml,过滤除菌 20mg/ml 20x,ph7.4 29:1 2m in h2o 2mm in water 2m 2x 30% 30%水溶液 30-35% in h2o 30g/l in h2o 30nm 球形,99.5% 35 μg/ml in isooctane 35% in h2o 35% in water 35% 35wt.% in h2o 37.5:1 4×,含巯基还原剂,过滤除菌,无酶 40% in h2o 40% 水溶液 40g/l in h2o 40nm 球形,99.5% 40目 43-200 kda 5% (v/v) in h2o 5%(w/v) in h2o 5%溶液 50 wt. % in water 50% in chlorocyclohexane 50% solution in h2o 50% w/w in h2o 50% w/w 水溶液, 试剂级 50 μg/ml in isooctane, analytical standard 50g/l in h2o 50μm 5x 60 wt. % in h2o 60.0 g/l葡萄糖,无l-谷氨酰胺,无碳酸氢钠,无酚红,过滤除菌,细胞培养适用 65% in h2o 6x 70 wt. % in h2o 70% hf 70% in water 80% in ethanol 80% in h2o 80% in water 80-85% 85%, 异构体混合物 86% 87% 8m 9.5mm 直径,99.999% metals basis 90% (stabilized with tbc) 90%(gc) 90%(hplc) 90%,stabilized with tbc 90%,t 90%,顺反混合物 92%,含有稳定剂mehq 95 atom % d, 95% 95% (gc) 95% (stabilized with copper chip) 95% +98%atom%d 95% average mn 10000 95%(mixture of isomers) 95%(stabilized with mehq) 95%(tbc作为稳定剂) 95%, 50-70 cst 95%, 98 atom % d 95%, mixture of isomers 95%, stabilized with mehq 95%, stabilized with tbc 95%,40-60目 95%,98%ee 95%,ee99% 95%,gc&t 95%,mixture of isomers 95%,stabilizedwithmehq 95%,分子量200 95%,含稳定剂铜屑 95%,异构体混合物 95%,顺反异构体混和物 95%mixtbcasstabilizer 95%混合物(tbc作为稳定剂) 96%, contains tbc as stabilizer 96%,gc 96+% 97% (stabilized with copper chip) 97% average mw20000 97% average mw550 97%(cis- and trans- mixture) 97%(mixture) 97%(stabilized with hq) 97%, contains mehq as stabilizer 97%, stabilized with mehq 97%, 异构体混合物 97%,(hplc) 97%,mixture of isomers 97%,含铜稳定剂 technical grade, 90% 97.0% (hplc) 97.0%(gc) 98 atom % d, 99 atom % 13c 98 atom % d,96% 98 atom %15n, 99 atom %13c 98% (contains ~10%solvents) 98% (stabilized with mehq) 98% 99.99% ee 98% gc 98% metal basis, ir 25.5%最低 98% mix tbc as stabilize 98% rel-(1r-2e-pr)-equatorial 98% trace metals basis 98% 异构体混合物 98%(cis- and trans- mixture) 98%(mehq作为稳定剂) 98%(mixture of cis and trans) 98%, 325目 98%, 98 atom % 15n 98%, 99% e.e. 98%, contains mehq as stabilizer 98%, unsublimated 98%, water≤50 ppm (by k.f.), mkseal 98%, 白色粉末 98%,100目 98%,300目 98%,ee 99% 98%,isomersmixture 98%,stabilizedwithcopperchip 98%,stabilized 98%, 98%,含有数量不等的酸酐 98%,含稳定剂mehq 98%,异构体的混合物 98%,白色固体 98.0% (hplc) 98atom% 99 atom % 13c, 97%(cp) 99% (hplc) 99% mix tbc as stabilizer 99%(lc-ms) 99%, with molecular sieves, water≤50 ppm (by k.f.),mkseal 99%, -325目 99%, mixture 99%, water≤50 ppm (by k.f.), mkseal 99%,2-4μm 99%,300目 99%,50nm 99%,hplc 99%,t 99%,单杂<0.1% 99%,含稳定剂铜屑 99%,含铜屑稳定剂 99.5 atom % d 99.5% (4 times purification) 99.5% (metals basis) 99.5% (reo) 99.5% trace metals basis excluding hf 99.6% 99.8%,water≤50 ppm (by k.f.), mkseal 99.8%,water≤50 ppm (by k.f.),mkseal 99.9% metals basis,100nm 99.9% metals basis,30nm 99.9%,2-5um 99.9%,325目 99.9%,500目 99.9%,50nm 99.9%,with molecular sieves, water≤50 ppm (by k.f.), mkseal 99.9%,粉末 99.95 % metals basis 99.95% trace metal basis 99.98% trace metals basis 99.99% metal basis 99.99% metals basis,10μm 99.99% metals basis,50nm 99.99% trace rare earth metals basis 99.99%(reo) 99.99%metals basis 99.9985% (metals basis) 99.999% metals basis,200目 99.999% metals basis,for perovskite precursor 99.9995% metals basis 99.9999% metals basis,块状 >97%(gc) >98%(gc) >99%metals basis,粒径:15nm,比表面积(bet):300±50m2/g acs reagent,99% acs, ≥99% average m.w. 2000 average m.w. 5000 average mn 2,000 average mn 400 bp reference standard br≈58% d,98% d,99.8% dye content 85 % dye content 90 % ep reference standard fe2o3≤2ppm for microbiology gc hepes,l-谷氨酰胺,酚红,过滤除菌,细胞培养适用 hplc≥98% in 10mm water lc-ms mw 10000 mw 20000 mw 3400 da mw 3400 pd 18.5% pellets ph8.0 purity: 95%,isotopic purity:95% solid, ≥98%(hplc) t-95% technical grade, 85% technical grade, mixture of isomers technical,≥90 % ulc-ms,0.1% in water v1.0 v2.0 ~0.5 m in tert-butyl methyl ether, ≥95% (hplc) ~40% active ingredients in h2o ≥40% ≥6% ≥60%(gc) ≥65% ≥85%(hplc) ≥85%(t) ≥85.0% ≥89% ≥90% (gc) ≥90%(lc) ≥90.0%(gc) ≥90.0%(qnmr) ≥90.0%(t) ≥92%(hplc) ≥93%(hplc) ≥93%(t) ≥93.0%(gc) ≥94% (hplc) ≥94%(t) ≥95% (tlc) ≥95% v basis ≥95%(lc&n) ≥95%(t)(n) ≥95%, contains tbc as stabilizer ≥95%,单酯和二酯的混合物 ≥95%,顺反混合物 ≥95.0%(gc)(t) ≥95.0%(qnmr) ≥95.0%(t) ≥96%(lc) ≥96.0%(hplc) ≥97% (stabilized with tbc) ≥97%(gc&t) ≥97%(lc&t) ≥97%(nt) ≥97%,hplc ≥97%,含稳定剂铜屑 ≥97%,异构体混合物 ≥97%,顺反异构体混合物 ≥97.0% (hplc),用于荧光分析 ≥97.0% (nt) ≥97.0% (t) ≥97.0%(hplc) ≥98 atom % d, ≥97%(cp) ≥98 atom % d, ≥99% (cp) ≥98%(gc&n) ≥98%(hplc),solid ≥98%(t)(gc) ≥98%(tlc) ≥98%, lc-ms用离子对试剂 ≥98.0% (hplc),用于荧光分析 ≥98.0% (tlc) ≥98.0%(gc)(qnmr) ≥98.5 % sum of enantiomers ≥98.5% (hplc) ≥98.5%(hplc) ≥99 atom % d, ≥98%(cp) ≥99 atom % d, ≥99%(cp) ≥99%, 升华提纯 ≥99%, 用于合成 ≥99%,gc ≥99%,hplc ≥99.0% (t) ≥99.5%, 升华提纯 ≥99.8%(gc) 不含酚红,过滤除菌,细胞培养适用 不含钙、镁离子和酚红,过滤除菌,无菌无酶,细胞培养适用 不含钙镁离子,过滤除菌,无菌无酶,细胞培养适用 丰度:99atom %;化学纯度:≥98.5% 丰度:99atom%;化学纯度:≥98% 优级试剂,适用于分析,acs,iso,reag.ph eur 分子量1000 分子量~3000 分子量~4000 分析对照品, 98%(hplc) 分析对照品, 98% 分析对照品, 99%(hplc) 分析对照品, ≥96% 分析对照品,≥99% 分析标准品,98% 分析标准品,≥98% 制备色谱级, 99.9% 即用干粉,无酶 含钙、镁离子,不含酚红,过滤除菌,无菌无酶,细胞培养适用 吸附柱法 基质:sio2,表面基团:-cooh,粒径:4-5μm,单位:10mg/ml 基质:sio2,表面基团:-nh2,粒径:0.1-1μm,单位:5mg/ml 基质:sio2,表面基团:-nh2,粒径:3-4μm,单位:10mg/ml 基质:sio2,表面基团:-nh2,粒径:4-5μm,单位:10mg/ml 基质:sio2,表面基团:-sioh,粒径:1-2μm,单位:10mg/ml 天然来源, 98% 天然来源, 99% 支链异构体混合物 无水、粉末、99.99% 无水级, 99.99% metals basis 无糖,无hepes,l-谷氨酰胺,酚红,过滤除菌,细胞培养适用 无酶 生物制剂,适用于细胞培养,适用于昆虫细胞培养 生物医用研究级,≥98.0%,<70μm 用于gc衍生化,99% 用于生化研究 用于药物研究 用于酶联免疫,≥99.0% 电子级, 99.9999% metals basis 磁珠法 细胞培养级, ≥98% 药用级 试剂级, 50 wt. % in h2o 试剂级, 95.0% 试剂级, 96.0% 试剂级, 99% metals basis 试剂级, 99.00% 试剂级, 99.5%(gc) 试剂级, 99.7% 试剂级, 99.9% 试剂级, fe:16.5-18.5% 试剂级, ≥99.0% 超干, 99.9% (reo) 超干, 99.99% (reo) 超干, 99.99% metals basis 超干, 99.999% metals basis 超干,99.999% metals basis 超干级, 99.95% metals basis 超纯级,99.0% 适用于电化学分析,≥99.0% 重蒸馏,99.5% 重蒸馏,≥99.5% 颗粒 基础级试剂,适用于制备 高糖,l-谷氨酰胺,碳酸氢钠,酚红,过滤除菌,细胞培养适用 高糖,碳酸氢钠,无l-谷氨酰胺,无ht添加剂,无酚红,过滤除菌,细胞培养适用 > 98 % hplc, powder > 99 % hplc, solid >100 iu/mg >30u/mg,来源于兔肌 >40.0%(gc) >52%(gc) >60.0%(gc) >75%(gc) >75.0%(gc) >80.0%(gc),含200-650ppm mehq稳定剂 >80.0%(lc) >85.0%(hplc) >86.0%(lc) >90% (tlc) >90%(gc),单脂 >90%(gc),含100 ppm 对叔丁基邻苯二酚稳定剂 >90%(lc) >90%(t) >90%, mn~40000 >90.0%(n) >92%(t) >92% >93%(gc) >93%(hplc) >93%(t) >93.0%(hplc)(t) >93.0%(hplc) >93.0%(lc),顺反混合物 >93.0% >95% (lc-ms) >95%(lc-ms) >95%, 含稳定剂bht >95.0%(gc&t) >95.0%(gc) ,含0.2 % caco3/mgo (1:1)稳定剂 >95.0%(gc), 含稳定剂bht >95.0%(gc),异构体混合物 >95.0%(hplc)(n) >95.0%(n) >95.0%(t),硬型,混合物 >96%(gc&t) >96%(hplc) >96.0%(gc),stabilized with hq >96.0%(hplc) >96.0%(lc&n) >96.0% >96.5% >97% (hplc) >97% (sum of isomers, gc) >97%(gc),包含180-200 ppm mehq 稳定剂 >97%(t&lc) >97%(t) >97%, 含稳定剂tbc >97.0%(gc&t) >97.0%(gc),含稳定剂铜 >97.0%(hplc)(n) >97.0%(lc&t) >97.0%(n) >97.0%,total of isomer >97.5% >98% usp >98%(gc&n) >98%(gc) , 含铜作稳定剂 >98%(hplc), unsublimate >98.0% (gc) >98.0%(gc&t) >98.0%(gc),含100ppm环氧丙烷稳定剂 >98.0%(hplc)(w) >98.0%(lc),含≤5%己烷 >98.0%(lc),含≤5%的二氯甲烷 >98.0%(n)(t) >98.0%(t&lc) >98.0%(t)(hplc) >98.0%(w) >99% (lpc; may contain up to 10% of the 2-lpc isomer, tlc) >99%(gc),包含180-200 ppm mehq 稳定剂 >99.0% (gc), 无色液体 >99.0% (hplc) >99.0%(gc)(t) >99.0%(gc),250ppm mehq做稳定剂 >99.0%(gc),含mehq稳定剂 >99.0%(gc),用于hplc荧光标记 >99.0%(hplc) >99.5%(hplc) >99.7%(gc) >99.8%(gc) >99.9% (gc) >99.998% <1% diethylene glycol monobutyl ether <100nm(tem),20 wt. % in h2o <100nm,99.9% metals basis <45 μm (0.05%/0.5%) in water (10-20%)[用于酯化] (1mg/ml的甲醇溶液)[用于水分析] (5-10%)[用于酯化] (99.99%-ce) (reo) (99.99%-pr)(reo) (99.99%-sc)(reo) (99.99%-zr)(reo) (d, 99%) dcl 20% in d2o (d, 99%) dcl 36.5% in d2o (d, 99.5%) (<5% d2o) (d, 99.5%) 30% in d2o (d, 99.5%) 40% in d2o (d, 99.5%)+ 0.03% v/v tms (d, 99.5%) (d, 99.96%) (d,99.5%) + 0.05% v/v tms (d,99.5%) +0.03% v/v tms (d,99.8%) +0.03% v/v tms (d,99.8%)(0.03% v/v tms) (d,99.8%)+0.03% v/v tms+silver foil (d,99.8%)+0.03% v/v tms (d,99.8%)+silver foil (d,99.8%) (d,99.9%) + 0.03 % (v/v) tms (d,99.96%)(+0.03% v/v tms) (d2, 98%) (~5% d2o) (d3, 98%) (d3, 99%) (d4, 98%) (d5, 99%) (d7, 98%) (dhqd)2phal:0.552% (e)+(z),98% (edta-free, 100x in dmso) 100x (mixture of 3- and 4-isomers) stabilised with 4-tert-butylpyrocatechol for synthesis: ≥ 98.0 % (a/a) (w/w=7/3) (顺式+ 反式), ≥92%(gc) -100 目, 99.9% (metals basis) -100 目, 99.9% metals basis -100 目, 99.999% (metals basis) -200+325目, 99.95% metals basis -200目,97% -200目粒径 -22 目, 99.995% metals basis -22 目,99.998% metals basis -22 目,99.999% (metals basis) -325目, 99.5% metals basis -325目,99.99% (metals basis去除ta), ta <500ppm -40 目, 99.9% (reo) 0.001mol/l 0.001m 0.005,过滤除菌,细胞培养适用 0.0053 0.01 g/ml的硫酸铜水溶液 0.0100 in h2o 0.01000mol/l(0.01m) 0.0127mm (0.0005in)厚, 99.95% (metals basis) 0.01505mol/l 0.015mm 直径, 99.95% metals basis 0.015mol/l 介质:h2o 0.01600mol/l(0.016m) 0.01mol/l 介质:h2o 0.01mol/l 0.01 0.02%,过滤除菌,细胞培养适用 0.02005mol/l 0.02008mol/l 0.02516 mol/l 0.025mm 厚, 99.985% metals basis 0.02m in h2o 0.02mol/l 0.05 mol/l naoh(0.05摩尔/升 氢氧化钠) 0.05 m聚(二甲基硅氧烷), 乙烯基封端 0.05% (v/v) in h2o 0.05% (w/v) in h2o 0.05%((w/v) in h2o 0.05%/0.02%,溶于pbs,过滤除菌,细胞培养适用 0.05-0.5kb,8条带,过滤除菌 0.050 mol/l in h2o 0.05021mol/l 0.05m in h2o 0.05mm 直径,99.995% metals basis 0.05mol/l 介质:h2o 0.05mol/l,介质:h2o 0.05m 0.05 0.06,过滤除菌,无酶 0.064mol/l(0.064m) 0.065 0.06 0.075,过滤除菌,无菌无酶,细胞培养适用 0.08,过滤除菌,无酶 0.085 wt. % in h2o 0.085% phosphoric acid in ethanol 0.085% phosphoric acid in ipa 0.085% phosphoric acid in methanol 0.08 0.0979mol/l 介质:h2o 0.1 g/ml的氢氧化钠水溶液 0.1 m cf3so3h in acetic acid 0.1 m in methanol, mkseal 0.1 m in poly(dimethylsiloxane), vinyl terminated 0.1 m solution in thf , mkseal 0.1% (v/v) in h2o 0.1% in ethanol 0.1%(w/v)in water 0.1%乙醇溶液 0.1%水溶液 0.1-0.5mg/ml in water 0.1-1.5kb, 11条带 0.1-10kb, 13条带 0.1-10kb,21条带,红色荧光,过滤除菌 0.1-10kb,21条带,绿色荧光,过滤除菌 0.1-2kb, 6条带 0.1-5kb, 8条带 0.1-5kb,14 条带,过滤除菌 0.100 m in h2o 0.100 n in h2o 0.1001mol/l 介质:95%乙醇 0.104 m in methylvinylcyclosiloxanes 0.12,过滤除菌,无酶 0.127mm (0.005in) 厚, 退火, 99.8% (metals basis) 0.13%(0.044n) in h2o 0.15,过滤除菌,无酶 0.15m in h2o 0.15μg/ml, 5% hno3 0.16 m soln. in 1, 2-dimethoxyethane 0.1m in 1 liter of water 0.1m in thf 0.1m in water 0.1m,ph7.5 0.1m,ph7.6,10×,过滤除菌,无酶 0.1m,ph8.0,10×,过滤及高温双重灭菌 0.1mm 厚, 99.9% (reo) 0.1mm 厚, 99.9% metals basis 0.1mm 厚, 99.99% metals basis 0.1mm 直径, 99.99% metals basis 0.1mm, 99.999% metals basis 0.1mm,99.9% metals basis 0.1mm,99.99% metals basis 0.1mmol/l, ph 6.8 0.1mol/l, 介质: h2o 0.2 mm,99.9% metals basis 0.2 mm,99.99% metals basis 0.2 n in h2o 0.2%(w/v)in water 0.2%溶液 0.2-0.6kb,6 条带,过滤除菌 0.2-0.8mmol/g loading 0.2-10kb,含预混引物 0.2-12kb,12 条带,红色荧光,过滤除菌 0.2-12kb,12 条带,绿色荧光,过滤除菌 0.2-12kb,m-mlv 0.2-12kb,去基因组dna,含预混引物 0.2-12kb,含预混引物 0.2-12kb,高拷贝,低拷贝基因检测 0.2-12kb,高稳定性 0.2-15kb,6 条带,过滤除菌 0.22g/l 0.25 m solution in 2-methyltetrahydrofuran 0.25 m solution slurry in thf, mkseal 0.25%,不含酚红,过滤除菌,细胞培养适用 0.25%,溶于pbs,过滤除菌,细胞培养适用 0.25%,过滤除菌,细胞培养适用 0.25%/0.02%,过滤除菌,细胞培养适用 0.25-15kb, 7条带 0.25-5kb,9条带,过滤除菌 0.25m in h2o 0.25m solution in thf, mkseal 0.25m solution in thf 0.25mm 厚, 99.994% metals basis 0.25mm 直径, 99.99% (metals basis 去除 ta) 0.2g/l 0.2m in h2o 0.2m, ph3.5 0.2m, ph3 0.2m, ph4.5 0.2m, ph4 0.2m, ph5.5 0.2m, ph5 0.2m, ph6.5 0.2m, ph6 0.2m, ph7.4 0.2m, ph8.0 0.2m,ph10.0 0.2m,ph2.5 0.2m,ph3.0 0.2m,ph3.5 0.2m,ph5.0 0.2m,ph5.5 0.2m,ph7.4,20×,过滤及高温双重灭菌 0.2m,ph7.4,20×,过滤除菌,无酶 0.2m,ph7.6,20×,过滤除菌,无酶 0.2m,ph7.8 0.2m,ph9.2 0.2m,ph9.5 0.2mg/ml, 混合溶剂 0.2mm直径,99.999% metals basis 0.2mol/l 介质:h2o 0.2μg/ml, 5% hno3 0.3 m solution in thf, mkseal 0.3%(w/v)in water 0.300mol/l in h2o 0.35m in h2o 0.35mol/l in h2o 0.3m in h2o 0.3mm 厚, 99.9% (reo) 0.4 m solution in 1,4-dioxane, mkseal 0.4 m solution in thf, mkseal 0.4±0.008mol/l in h2o,trace metal grade 0.4m in ethylene glycol 0.5 m in anhydrous thf 0.5 m in tetrahydrofuran 0.5 m slurry in thf ,mkseal 0.5 m solution in thf 0.5% (v/v) in h2o 0.5% (w/v) in h2o 0.5% in h2o 0.5% pd,50% water-wet paste, d50=25um 0.5%(w/v) in h2o 0.5%(w/v)in water,含0.5% ki 0.5%溶液 0.5 m in h2o 0.5-15kb,11 条带,过滤除菌 0.5-15kb,7条带,过滤除菌 0.50 m solution in 2-methyltetrahydrofuran, mkseal 0.50 m solution in 2-methyltetrahydrofuran 0.55 0.59 0.5m in 2-methf, mkseal 0.5m in h2o, ph7.0-7.5 0.5m in methf 0.5m in thf,mkseal 0.5m, ph5.5 0.5m, ph6.0 0.5m, ph6.5 0.5m, ph6.8 0.5m, ph7.2 0.5m, ph7.4 0.5m, ph7.5 0.5m, ph8.5 0.5m,ph10.0 0.5m,ph10.5 0.5m,ph10 0.5m,ph3.0 0.5m,ph7.2 0.5m,ph9.4 0.5m,ph9.6 0.5m,溶于四氢呋喃 0.5mg/ml in methanol 0.5minthf 0.5mm 厚, 99.998% metals basis 0.5mm 厚,99.9975% metals basis 0.5mm 直径, 99.998% metals basis 0.5mol/l 介质:h2o 0.5mol/l, 介质: h2o 0.5msolutioninthf,mkseal 0.5wt%la, 300目,氧含量<1000 ppm 0.5wt%la, 300目 0.6 m solution in thf, mkseal 0.6% on activated carbon, 50% water-wet paste 0.6%(w/v)in water 0.600 m in h2o 0.600mol/l in h2o 0.62mm 厚, 99.9% (reo) 0.6m in thf, mkseal 0.6mmol/g 0.7 m solution in thf,water≤1000ppm, mkseal 0.7-1.4 mmol/g 0.75m solution in thf, mkseal 0.7m solution in hexanes, mkseal 0.8-12mm (0.03-0.47in), 99.98% (metals basis) 0.8m solution in thf, mkseal 0.8mg/ml solution (ph 10) 0.9 m in heptane , mkseal 0.9% (w/w) in h2o 0.9%,过滤除菌,无菌无酶,细胞培养适用 0.9%溶液 0.9m solution in thf, mkseal 0.9mmol/g 1 m in ethyl acetate 1 m in thf, mkseal 1 m in thf 1 mg/ml in methanol 1 mol/l 1 μm,98.5% 1% on polyethylenimine/sio2,40-200 mesh 1% on titania(anatase)(surfactant and reactant-free),≤100nm 1%(w/v)in water 1%(w/w) in h2o 1%pd 1%溶液 1 m in hexanes 1 m in thf 1 mg/ml in methanol (:aqueous 10 mm nh4oh (7:3)), ≥90% (tlc) 1 mg/ml in methanol (:aqueous 10 mm nh4oh (7:3)), ≥95% (tlc) 1×,in pbs,过滤除菌,无酶 1×,in pbstw,过滤除菌,无酶 1×,in pbstx,过滤除菌,无酶 1×,in tbs,过滤除菌,无酶 1×,in tbstw,过滤除菌,无酶 1×,in tbstx,过滤除菌,无酶 1×,无气味,过滤除菌,无酶 1×,过滤除菌,无酶 1×,预混粉末 1×10-6g/ml,u=3% 基体:高氯酸 1×10-9g/ml,u=3%基体:高氯酸 1,000 mesh 1-1.5mm 厚, 保存在石蜡油里, 99.9% (reo) 1-10 μm,98% 1-10kb, 8条带 1-3mm (0.04-0.1in),99.9997% (metals basis) 1-3mm,99.999% metals basis 1-3μm, ≥99% metals basis 1.0 m in acetic acid 1.0 m in heptane, mkseal 1.0 m in heptane 1.0 m in hexane, mkseal 1.0 m in methylene chloride 1.0 m in thf,mkseal 1.0 m in thf/hexanes, mkseal 1.0 m solution in 2-methyl-thf, mkseal 1.0 m solution in 2-methyltetrahydrofuran, mkseal 1.0 m solution in ethanol, mkseal 1.0 m solution in h2o 1.0 m solution in hexanes ,mkseal 1.0 m solution in p-xylene, mkseal 1.0 m solution in tert-butanol, mkseal 1.0 m solution in tert-butyl methyl ether, mkseal 1.0 m solution in thf , mkseal 1.0 m solution in thf 1.0 m 二氯甲烷溶液 1.0 mol/l in thf 1.0 m in ethyl acetate 1.0 m in heptane 1.0 m in thf, mkseal 1.0 m in thf 1.0 m solution in thf, mkseal 1.0 mg/ml in methanol 1.0.m solution in thf, mkseal 1.00 m in h2o 1.00 n in h2o 1.008μg/ml in water 1.00mg/ml,介质:甲醇 1.00mg/ml,基体:甲醇 1.0m in 2-methf 1.0m in cyclohexane 1.0m in methf 1.0m in tetrahydrofuran 1.0m,ph6.0 1.0m,ph7.0 1.0m,ph7.2 1.0m,ph7.6 1.0m,ph7.8 1.0m,ph8.2 1.0m,ph8.4 1.0m,ph8.5 1.0m,ph8.8 1.0m,ph9.5 1.0mm 厚, 99.99% metals basis 1.0mm 直径, 退火,99.995% metals basis 1.0mm 直径,99.999% metals basis 1.0mm直径, 99.9% metals basis 1.0mol/l in thf, mkseal 1.1% in h2o, surfactant-free, high-conductivity grade 1.137ppm(±0.357ppm) 1.2-2.0mm, 元素分析仪专用 1.25m,ph6.5-6.8,过滤除菌,无酶 1.25mmol/g 1.3 m in thf, mkseal 1.3 m solution in thf, mkseal 1.3 wt % dispersion in h2o, conductive grade 1.3%-1.5% in isopropanol 1.3m lifsi 1.4 m solution in butyl diglyme, mkseal 1.4 m solution in thf,mkseal 1.45% (v/v) in h2o 1.45 m solution in butyl diglyme, mkseal 1.4m solution in thf, mkseal 1.4mmol/g 1.5 m in h2o 1.5 m in thf 1.5 m solution in 2-methyltetrahydrofuran, mkseal 1.5 m solution in dibutyl ether, mkseal 1.5% (v/v) in h2o 1.5% in h2o, neutral ph, high-conductivity grade 1.5-2.0u/mg 1.5-2.5mm, 元素分析仪专用 1.50 n in h2o 1.53mmol/g 1.5m,ph6.8,过滤除菌,无酶 1.5m,ph8.8,过滤除菌,无酶 1.5mm 直径, 退火,99.995% metals basis 1.5μg/ml, 5% hno3 1.6 m in thf, mkseal 1.6 m solution in hexanes, mkseal 1.6m in hexane ,mkseal 1.6μg/ml in methanol 1.7 m solution in thf,mkseal 1.90% (v/v) in h2o 1.9m solution in thf, mkseal 10 % 溶液 10 atom % 18o 10 mg/ml in 20 mm hepes 10 mg/ml,基体:庚烷 10 mg/ml,基体:正己烷 10 mm in dmso 10 mm/dmso 10 nm diameter, λmax, 780 nm, dispersion in h2o 10 wt% in hexanes 10 wt.% in 10 wt.% nitric acid, 99.999% trace metals basis 10 wt.% in hexanes 10 wt.% 基体:丙二醇 10% (v/v) in h2o 10% (w/w) in h2o 10% fe 10% in acetonitrile 10% in meoh 10% in propandiol 10% in propanediol 10% pd basis 10% pd(oh)2 10% pd,contains 40-60% h2o 10% solution in h2o 10% w/v in ethanol 10% w/w soln. in thf 10% w/w乙醇溶液 10% 水溶液 10%(w/v) in h2o 10%,用于病理实验 10%,过滤除菌,无酶 10%pd 10%于水中 10%溶液, 丙二醇 10%的水溶液,约2.4mol l 10%的水溶液 10×,in pbs,过滤除菌,无酶 10×,不含酚红,过滤除菌,细胞培养适用 10×,过滤除菌,无菌无酶,细胞培养适用 10×,过滤除菌,细胞培养适用 10-150 kda 10-170 kda 10-200 kda 10-30 nm, 25% in h2o 10-80% 10.0mg/ml,基体:纯水 100 mesh,99.9% 100 ng/ul于环己烷 100 nm 粒径, 20 wt. % 异丙醇溶液 100 nm 粒径, 20 wt. % 水溶液 100 μg/ml in methanol 100 μg/ml in methanol 100 μg/ml in n-hexane 100 mm in h2o 100-200 mesh, 1% dvb,0.5-2.5mmol/g 100-200 mesh,1% dvb,0.3-0.8mmol/g 100-200m 100-300nm, 99.5% metals basis 10000 x in dmso 10000×,dsdna染色,pcr级,过滤除菌 10000×,过滤除菌 10000× 1000mg/l于叔丁基甲醚 1000ug/ml, 1%hno3 1000μg/ml in acetonitrile, uncertainty 2% 1000μg/ml in cyclohexane 1000μg/ml in ethanol, 不确定度2% 1000μg/ml in ethanol 1000μg/ml in ethyl acetate 1000μg/ml in h2o(以三氯乙醛计) 1000μg/ml in h2o 1000μg/ml in isopropanol 1000μg/ml in meoh:accn(1:1) 1000μg/ml in water:glycerol 1000μg/ml, 溶于吹扫-捕集甲醇溶液中 1000μg/ml, 溶剂:甲醇 1000分子量 100g/l, 介质: h2o 100g/l,介质:h2o 100g/l 100mg/l in methanol 100mg/l,溶剂:水 100mg/l于甲醇 100mg/ml in ethanol 100mg/ml 100mm,过滤除菌 100nm,99.5% metals basis 100ug/ml in isooctane 100ug/ml in methanol 100ug/ml in n-hexane 100ug/ml, 溶剂: 正己烷 100ug/ml, in methanol 100ug/ml,1% hno3 100x,双抗,细胞培养适用 100x 100μ g/ml in acetonitrile 100μ g/ml in ethyl acetate 100μ g/ml in methanol 100μg/ml in acetonitrile, uncertainty 3% 100μg/ml in ethanol, 98% (cp) 100μg/ml in h2o(以三氯乙醛计) 100μg/ml in meoh:accn(1:1) 100μg/ml in n-hexane 100μg/ml in water:glycerol 100μg/ml 异辛烷溶液 100μg/ml, 溶剂: 甲醇 100μg/ml,in acetonitrile 100μg/ml,溶剂:甲醇 10:1 10g/l in h2o,适用于gb/t 5750.5 酚盐分光光度法 10g/l, 介质: h2o 10ku/ml,过滤除菌,细胞培养适用 10mg/ml in ethanol 10mm in ethanol 10mm in methanol 10mm,ph7.4,1×,过滤及高温双重灭菌 10mmol/l, ph 8.0 10m 10n 10ug/ml in isooctane 10wt% in hexanes 10wt.% in hexane,mkseal 10x,ph7.6 10x,ph8.0 10μg/ml in methanol 10μg/ml in mtbe 10μg/ml in water 10μg/ml, 5% hno3 10μg/ml,u=2% 10μg/ml,u=3% 11-180 kda 11-245 kda 11.5% (w/v) 11g/l 12% (v/v) in h2o 12% (w/v) in h2o 12% (w/v) in water 12% zr in mineral spirits 12% 12-14% fe 12-16目 12.0-14.5% fe basis 12.1±1.1μg/l 125 cst 12醇:14醇=70:30,moa-3 12醇:14醇=70:30,moa-5 12醇:14醇=70:30,moa-9 13%于四氢呋喃中, 约0.8mol/l 13-14% active oxygen 14% in methanol,mkseal 14% solution in h2o 14.4-116 kda 14.5 - 16% wt.% 磷 140g/l in h2o 15 wt. % in h2o 15% (v/v) in h2o 15% mo 15%(w/v) 15% 15%于丙二醇中,约1.2mol/l 15%水溶液 15%水胶体分散液 15-120 kda 15-130 kda 15-20 wt. % in h2o, ≥99.99% trace metals basis 15.0 g/l葡萄糖,无氯化钠, 无l-谷氨酰胺, 无碳酸氢钠, 无酚红,干粉,细胞培养适用 15.0 g/l葡萄糖,无氯化钠, 无l-谷氨酰胺, 无碳酸氢钠, 无酚红,过滤除菌,细胞培养适用 150g/l, 介质: h2o 150g/l 150nm, 99.9%, α型 150μm 15cm或更小, 99.999% metals basis 15wt.% in h2o 16.5%(w/v), stabilized 17% (v/v) in h2o 17-23%钒 18 wt%二甲苯溶液 18 wt. % in h2o,含5-8% 甲醇稳定剂 18.2mω,过滤及高温双重灭菌,pcr适用 188ppb(±78ppb) 19-117 kda 19-23% ce basis 19:1 19mm 或更小, 99% metals basis 19u/mg 1:1.5型 1:1比例 1:1水溶液 1:2水溶液 1:3水溶液 1:4水溶液 1g/l in h2o 1g/l in water 1g/l 1m in methf 1m in water 1m lipf6 in ec:dec=1:1 vol% with 10% fec 1m lipf6 in fec:femc:hfe=1:1:1 wt% 1m solution in benzyl alcohol, mkseal 1m solution in thf, mkseal 1m thf 1m,ph5.0 1m,ph6.0 1m,ph6.5 1m,ph6.8,过滤除菌,无酶 1m,ph7.0-7.4,过滤除菌,无菌无酶,细胞培养适用 1m,ph7.8 1m,ph8.8,过滤除菌,无酶 1m,无rnase 1m,过滤除菌,无酶 1mg/ml in dimethyl sulfoxide 1mg/ml in ethanol 1mg/ml in h2o(cp) 1mg/ml in mes-buffered saline 1mg/ml in water 1mg/ml, 基体:冰乙酸 1mg/ml,基体:水 1mg/ml 1mm 直径, 99.998% metals basis 1mol/l in thf 1mol/l thf溶液 1mol/l 介质:h2o 1mol/l, 介质: h2o 1mol/l, 基体: h2o 1wt. % loading(dry basis), 4-8mesh, (wetted with ca. 60% water) 1x,ph4.5 1x,ph7.2-7.4,无菌无酶,细胞培养适用 1μg/ml in water 1μg/ml, 5% hno3 2 % cross-linked with divinylbenzene 2 m in thf, mkseal 2 mg/l in methanol 2% (v/v) in h2o 2% (w/v) in ethanol 2% (w/v) in h2o 2% (w/w) in h2o 2% pd basis 2%(w/v) 2%pd 2%水溶液 2 m in thf 2×,red 2×,变性,过滤除菌 2×,含dtt,过滤除菌,无酶 2×,含巯基还原剂,过滤除菌,无酶 2×,无气味还原剂,过滤除菌,无酶 2×,染料法,低rox 2×,染料法,独立rox 2×,染料法 2×,过滤除菌 2×,还原型,过滤除菌,无酶 2×,非还原型,过滤除菌,无酶 2-5kb,7条带,过滤除菌 2-5mm (0.08-0.20in) 直径, 99.9999% (metals basis) 2-5um/99.5% 2.0 m in dmf 2.0 m in h2o 2.0 m in thf 2.0 m solution in hexane, mkseal 2.0 m solution in hexanes 2.0 m solution in thf ,mkseal 2.0 m solution in thf 2.00 m in h2o 2.0m in thf 2.0m solution in thf, mkseal 2.0m,ph7.4 2.0m,ph7.5 2.0m,ph8.0 2.0mm 厚,99.9985% metals basis 2.0mm 直径, 99.999% metals basis 2.0mm直径, 99.999% metals basis 2.1 ppm(±0.2ppm) 2.24ppm(±0.1ppm) 2.2m in hexane ,mkseal 2.3 mol/l in h2o 2.5 m solution in 2-methyltetrahydrofuran, mkseal 2.5 m solution in hexanes, mkseal 2.5 m solution in thf, mkseal 2.5% (v/v) in h2o 2.5% in h2o 2.5m (30 wt%) in thf 2.5mg/ml in h2o 2.5u/μl,热启动 2.7 wt % dispersion in h2o, low-conductivity grade 2.8 m in 2-methyltetrahydrofuran, mkseal 2.8 m solution in 2-methyl-thf, mkseal 2.88μg/ml, 5% hno3 2.93ppm(±0.2ppm) 20 wt. % in ethanol 20 wt. % suspension in thf 20 wt. % 正丙醇溶液 20% (v/v) in h2o 20% in c6h5cl 20% in tetrahydrofuran, mkseal 20% in water, for direct count for bacteria, yeast, and mold 20% in water 20% pd(oh)2 20% w/w in h2o 20% w/w乙醇溶液 20%(w/v)异丙醇溶液 20%,cod≥17万mg/l 20%-26% in h2o 20% 20%溶液 20%甲醇溶液,~20% in methanol (t) 20%甲醇溶液 20× 20-25% 乙醇溶液 20-30nm,99.99% metals basis 20-40目, gc 20-40目 200-300 目 200-400 mesh, extent of labeling: 1.5-2.0 mmol/g loading, 2 % cross-linked 2000 u/ml 2000 μg/ml in methanol 2000μg/ml in mtbe 2000目 200g/l in h2o 200nm,99% 200nm,99.5% metals basis 200ug/ml in isooctane 200μg/ml in hexane 20nm 球形,99.5%,γ型 20nm-100nm,99.9% metals basis 20nm-50nm 球形,99.5% 20nm~160nm,100od(±5od) in h2o 20ug/ml in isooctane 20x,ph7.6 20~30 nm 粒径, 30 wt. % 异丙醇溶液 20~30 nm 粒径, 30 wt. % 水溶液 20μg/ml in h2o(cp) 20目 22%-25% w/v in isopropanol 22-25% aqueous solution 22.5%水溶液 22mm (0.9in) 直径, 99% (metals basis), sr ≤0.8% 24% in tetrahydrofuran, mkseal 24.0 g/l 葡萄糖,碳酸氢钠, 无氯化钠, 无l-谷氨酰胺, 无酚红,干粉,细胞培养适用 24.0 g/l 葡萄糖,碳酸氢钠, 无氯化钠, 无l-谷氨酰胺, 无酚红,过滤除菌,细胞培养适用 2400分子量 25 ug/ml in acetonitrile 25 ug/ml in methanol 25 wt. % in hexanes 25 wt.% 水溶液 25 μg/ml in acetonitrile 25% (v/v) in h2o 25% (v/v) in h2o 25% in meoh 25% in methanol 25% w/w in 1-methoxy-2-propanol 25% w/w in hexane 25% in isopropanol 25%的吡啶溶液,约1.2mol/l 25-30 mpa·s 25-30 wt. % 水溶液 250g/l, 介质: h2o 25g/l in h2o 25mg/5ml in pbs,非磁性,1um 25mm,过滤及高温双重灭菌,pcr适用 25wt.% in d2o, 99 atom % d 25μ g/ml in acetonitrile 260g/l 27% 乙酸乙酯溶液 28% in water 28% k2o,粉末 2g/l in h2o 2g/l 2m in thf 2m,ph7.0,过滤除菌,无酶 2mg/ml, 基体:无水乙醇 2um 2x,ph 7.5 2x,ph7.4 2x,还原型 2x,非还原型 2μm,医用研究级 3 wt.% 基体:丙二醇 3% nh3 in h2o 3% pd,reduced,50%-60% water-wet paste 3%pd 3%溶液 3-5mm,吸附剂,催化剂及载体 3.0 m solution in 2-methyl-thf, mkseal 3.0 m solution in thf, mkseal 3.12mmol/g 3.175mm 直径 x 3.175mm 长, 99.9999% (metals basis) 3.175mm 直径 x 3.175mm 长,99.9999% metals basis 3.175mm 直径 x 6.35mm 长, 99.95% (metals basis去除ta) 3.3-20.1 kda 3.3-31.0 kda 3.4 m solution in 2-methyltetrahydrofuran, mkseal 3.405mol/l,溶剂h2o 3.4um 3.5%溶液 3.6g/l in h2o 3.8% in h2o 30 nm 粒径, 20 wt. % 异丙醇溶液 30 nm 粒径, 20 wt. % 水溶液 30 wt%甲醇溶液(ca. 5mol/l) 30% (v/v) in h2o 30% (w/w) in h2o 30% solution in h2o 30% w/w 水溶液 30%,29:1,过滤除菌,无酶 30%,39:1 30%,cod≥25万mg/l 30%-32.5%活性含量(以edtmp.na计) 30%乙二醇溶液 30%甲醇溶液 30±2% in h2o 30-35 wt. % in 200#paint solvent 30-35% in  water 30-38% 30-40 wt. % in d2o, 98 atom % d 30.6-39.0%cu 3000ppm 3000μg/ml in h2o 300目,99% 300目 30nm 球形 纯度:99% trace metals basis 30nm 球形 纯度:99.5% trace metals basis 30nm 球形 纯度≥97% trace metals basis 30nm 球形,99.5%,α型 30nm,30 wt. % 1,2-丙二醇单甲醚乙酸酯溶液 30nm,98%,α型 30nm,99.5% 30u/ul 30目,98% 31% in h2o 31wt.% phthalyl 32%,30:2,过滤除菌,无酶 32-36% 325目, 99.5% metals basis 33 wt.% in acetic acid 33 wt.% solution in acetic acid, mkseal 33% in h2o, 99% (dry basis) 33-35% tio2 33.1-33.5% in dipropyleneglycol 33.1-33.5% in monoethyleneglycol 34-40%ca 35 wt. % in h2o 35 μg/ml 异辛烷 35 μg/ml于异辛烷 35% pt basis 35%水溶液 35.0 g/l葡萄糖,无氯化钠,无l-谷氨酰胺,无碳酸氢钠,无酚红,干粉,细胞培养适用 35.0 g/l葡萄糖,无氯化钠,无l-谷氨酰胺,无碳酸氢钠,无酚红,过滤除菌,细胞培养适用 35ug/ml in isooctane 36%,固体 36% 36.0-40.0% ru basis 37 wt. % in h2o,含10-15% 甲醇稳定剂 39-44% b2o3 basis, 31-37% cao basis, powder 399.6 mosmol·kg-1 3m,ph4.5 3m,ph5.2,过滤除菌 3m,ph5.2 3m,ph5.5 3m,ph7.0 3mm in dmso 3mol/l in meoh 3m 4 wt. % in h2o 4% (v/v) in 70% ethanol 4% ca 4%(w/v) in h2o 4%/0.5% 4%/1% 4%/2.5% 4%溶液 4×,含dtt,过滤除菌,无酶 4×,非还原,过滤除菌,无酶 4-6mm,99.999% metals basis 4.00% (w/w) in h2o 4.00mg/l in water 4.15mm厚, 99.99% metals basis 4.5%(active oxygen) 4.5-6.5% (al) 4.76% (v/v) in h2o 40 cst 40 wt. % in h2o (8.8 m) 40 wt. % in h2o, 含0.01%的乙酸铵阻聚剂 40 wt. % in methanol, contains (3-chloropropyl)trimethoxysilane 40 wt.% in h2o 40% (w/w) in h2o 40% 2-乙基己酸溶液(8-12% sr) 40% in ethanol,mkseal 40% w/w in hexanes 40% w/w in water 40% w/w 水溶液 40% w/w水溶液 40% 水溶液,即 2.6mol/l 40%,19:1,过滤除菌,无酶 40%,37.5:1,过滤除菌,无酶 40%水溶液 40%溶液,电子级 40%甲醇溶液 40-47%mgo 40-50nm, ≥99.95% metals basis 40-60%,工业级 40-60目 gc 40.0 - 50.0 %甲醇溶液 40.0%, 优级试剂 40.5%-42.5% pb 40g/l, 介质: h2o 40mpa.s 40nm,99.5% metals basis 40nm,99.5% 42% 42%~46% khso5 basis 43.6%(wt) in dichloromethane 430g/l 44 wt. % in h2o 45% fecl3 basis in h2o 45%的水溶液 45-50% in water(stabilized with mehq) 45-50%, soluble in isobutanol 45-55 %(w/w) in h2o, ≥98 atom % 13c, ≥98%(cp) 45-55% in water 45-60%, mixture of isomers 45.0 - 50.0% 45mg/ml in h2o 45um,-325 目, 99.9% metals basis 45wt.% aqueous solution 46% 460μg/mg 47% 47-49°c 48% 48-50% ni basis,150μm 48-50% ni basis,40μm 48-50% ni basis,425-850um 48-50% ni basis,50μm 48-50% ni basis,60μm 48-50%溶液 48wt. % in h2o 48~50% au basis 49 wt. % in 2-ethylhexanoic acid 49 wt. % in hexane, ce: 12% 49.5%,3%c,过滤除菌,无酶 49.5%,6%c,过滤除菌,无酶 4mol/l in h2o 4n,靶材专用 4x, 非还原性 4x,ph7.4 4种套装 5 % 溶液 5 wt. % in h2o 5% carboxyl basis 5% on carbon black (surfactant and reactant-free) 5% pd, 50-70% wetted powder 5% pt, 99.95% metals basis 5% w/v in ethanol 5% w/v in isopropanol 5%(v/v) in h2o 5%,5%,过滤除菌,无酶 5%-10% in ethanol, mkseal 5%pd 5%的水溶液 5%载量,粉末 5×,含dtt,过滤除菌,无酶 5×,无气味还原剂,过滤除菌,无酶 5×,过滤除菌,无酶 5×,过滤除菌 5×,非变性,过滤除菌 5×,预混粉末 5-10 nm 粒径, 20 wt. % 异丙醇溶液 5-10 nm 粒径, 20 wt. % 水溶液 5-10%, for esterification 5-10nm,自分散 5-245 kda 5.0 m in 1 m naoh 5.00 n in h2o 5.00mol/l in h2o 5.4mg/l,1-5层 5.5 g/l 葡萄糖,无碳酸氢钠,无l-谷氨酰胺,无ht添加剂,无酚红,无氯化钠,干粉,细胞培养适用 50 wt%己烷溶液 50 wt. % in h2o, 99% trace metals basis 50 wt. % in h2o, 99.9% trace metals basis 50 wt. % in mineral spirits 50 wt. % in pentane 50 wt. % 水溶液 50 wt. %水溶液 50 wt.% solution in water 50% (v/v) in h2o 50% in 2-ethylhexanoic acid 50% in dichloromethane 50% in ea 50% in ethanol 50% in isopropanol 50% in methanol 50% in triacetin, stabilized 50% pt basis 50% w/w solution in methanol, mkseal 50% w/w水溶液 50% 水溶液 50% in isopropanol 50% in volatile silicone 50% in xylene 50%(gc), 异构体混合物 50%(w/v) 50%aqueoussolution(99.9%-eu)(reo) 50%水溶液,含磷酸稳定剂≤2% 50%溶液 50%甲醇溶液 50%邻苯二甲酸二辛酯溶液 50×,不含抗氧化剂,过滤除菌,细胞培养适用 50×,不含维生素a,过滤除菌,细胞培养适用 50×,过滤除菌 50-100 mesh, extent of labeling: 3-4 mmol/g loading, 1 % cross-linked 50-55% w/w hbf4 50-60% tio2, 35-40% k2o 50-60%的水溶液 50-70% 50-80 cst 50.00%水溶液 5000-70000 cps(25°c), stabilized with mehq 50000 ug/ml in dichloromethane 5000μg/ml in methanol 500g/l in h2o 500g/l, 介质: h2o 500nm 500μg/ml in h2o 500μg/ml in mtbe 500μg/ml in water 500μg/ml, 5% hno3 50g/l, 介质: h2o 50g/l 50mg/l于乙腈(以醛酮计) 50mg/ml,过滤除菌 50mm,ph10.0 50mm,ph10.5 50mm,ph8.5 50mm,ph9.0 50mm,ph9.5 50mmol/l, ph7.4 50nm 近球形,99.5% 50nm,20-30% in water 50nm,30 wt. % 1,2-丙二醇单甲醚乙酸酯溶液 50nm,40 wt. % in h2o 50nm,40 wt. % 异丙醇 50nm,50 wt. % in h2o 50nm,99% 50nm,球形, 99.9% metals basis 50wt%水溶液 50wt.% in h20 50x,ph8.0 50μg/ml in ethanol, 98% (cp) 50μg/ml in methanol 50μg/ml, 5% hno3 53-220 kda 54% in dichloromethane 55 wt. % in h2o 55% in water 55%, soluble in isobutanol 55%,外消旋和内消旋的混和物 55-60 wt% bf3 55.0 - 58.0 %, 不含稳定剂, acs试剂 55.0 - 58.0 % 55mm,1000×,过滤除菌,细胞培养适用 57wt. % in h2o, 蒸馏, 不含稳定剂, 99.99% trace metals basis 57wt. % in h2o, 蒸馏, 含<1.5 % h3po2 稳定剂, 99.95% 595ug/mg 5g/l in h2o 5m,ph4.8 5mg/l in methanol 5mm (0.2in) 直径,99.995% (metals basis) 5mm 或更小, 99.9999% metals basis 5mm 直径,99.995% metals basis 5mm 直径,99.999% metals basis 5mm 直径,99.9999% metals basis 5u/μl,大肠杆菌 5u/μl,超长片段 5u/μl,高保真 5u/μl 5ug/ml in methanol 5um/99.5% 5wt. %(dry basis), matrix activated alumina 5x, ph7.0 5x,ph6.5 5x,ph7.0 5x,ph7.4 5μg/ml in ethanol, 98% (cp) 6 wt. % (on silica gel) 6% (v/v) in h2o 6%-8%fe 6×,无气味还原剂,过滤除菌,无酶 6×,红色荧光,溴酚蓝,过滤除菌 6×,绿色荧光,溴酚蓝,过滤除菌 6×,过滤除菌 6×,非还原,过滤除菌,无酶 6.0 g/l 葡萄糖,无碳酸氢钠,无l-谷氨酰胺,无ht添加剂,无酚红,无氯化钠,干粉,细胞培养适用 6.35mm 厚, 99.9% metals basis 6.5-270 kda 60 wt. % in methanol, contains (3-chloropropyl)trimethoxysilane 60 wt. % 水溶液 60 wt. %水溶液 60% (w/v) in h2o 60% in h2o 60% in heptane, ca. 1.7 mol/l, mkseal 60% in heptane,ca. 1.7mol/l 60% in n-butoxide, hf: 22.6 wt% 60% in water,300-500ppm mehq 60% in water 60% w/w in water 60% 水溶液 60%,gc 60%-70% 60%正己烷溶液, ca. 1.7mol/l 60%溶液 60-200目 60-64% 60-70% 水溶液 60-80目 gc 60.0 g/l葡萄糖,无ht添加剂,无l-谷氨酰胺,无碳酸氢钠,无酚红,干粉,细胞培养适用 60.0 g/l葡萄糖,无l-谷氨酰胺,无碳酸氢钠,无酚红,干粉,细胞培养适用 60.8 - 74.3 % tin 600目 60nm 球形,98.0% 60nm,99.9% metals basis 61%min in mineral spirits ,pb 24% 61.0iu/mg 62 wt. % in h2o 62% in ethanol 62% in methanol 62.0~68.0 w/w% 64-66%的水溶液 65 % water 65 wt. % in mineral spirits 65% in etoh 65%(lc) 65+% in water 65-70% p2o5 basis 65-72% in water 65wt% in h2o 66-669 kda 68-70%, mixtures 6g/l in h2o 6m in h2o 6mm 直径, 99.99999% metals basis 6mm 直径,99.9% metals basis 6m 7% (w/v) in h2o 7%(w/v) in h2o 7-9% 7.5% (v/v) in h2o 7.5% w/w p2o5 7.5%(w/v) in h2o 7.50 m in h2o 7.5g/l in h2o 7.5m in h2o 70 wt. % 正丙醇溶液 70 wt.% in 1-methoxy-2-propyl acetate 70% (hplc) 70% in 1-methoxy-2-propyl acetate 70% in etoh 70% in h2o 70% 水溶液 70%(hplc) 70%(含30%甲醇和水) 70%,含异构体和邻苯二甲酸 70%,含稳定剂铜屑 70%in water 70%溶液 70%甲醇溶液 70%的水溶液,约7.3mol 70 wt. % in h2o 70 wt. % in isopropanol 70-75% in heptane 700-1500 cst 7000-10000 cps(25°c), stabilized with mehq 70g/l 72% in ethanol 72.5g/l in h2o 73%,含约20%的2-溴-1-丁醇 73% 73-79% tio2, 19.5-22.5% k2o 74%,光球状,3-5mm 74%,片状 74-76% in water 75 wt. % in h2o 75% (contains ca. 23% isomer) 75% (v/v) in h2o 75% in h2o 75%(hplc) 75%(v/v),消毒用 75%,含稳定剂mgo 75%异丙醇溶液 75%水溶液 75-80 wt. % in water 7500 78% in 2-ethylhexanoic acid 8 wt. % in h2o 8% (v/v) in h2o 8-15nm, ≥99.95% metals basis 80 % in water 80 g/l aqueous 80 wt. % in h2o, contains 600 ppm monomethyl ether hydroquinone as inhibitor 80 wt.%,含benzoic acid ,isophtalic acid 稳定剂 80% (contains 5% phenol at maximum) 80% (hplc) 80% ethanol solution 80% in isopropanol 80% 水溶胶 80%(mixtures of isomers) 80%(t) 80%, mixture of isomers 80%, 含碳酸钙稳定剂 80%, 粉末 80%,gc 80%,含2,6-异构体 80%,天然 80%-85% 80-100目 gc 80.0 g/l葡萄糖,氯化钠, 无l-谷氨酰胺, 无碳酸氢钠, 无酚红,干粉,细胞培养适用 80.0 g/l葡萄糖,氯化钠, 无l-谷氨酰胺, 无碳酸氢钠, 无酚红,过滤除菌,细胞培养适用 80.0% in thf 80.0%(gc), 含约20%反-异构体 800nm 球形 纯度>99.5% 800目 80g/l, 介质: h2o 80nm, 99.5% metals basis 80wt.% in isopropanol 83%,gc 83.5-86.5% tio2, 13.5-16.5% k2o 85% (t) 85% in hexamethyldisiloxane 85% in water 85%(mixtures) 85%(t) 85%, cont. ca 10% 2-cyclohexylidenecyclohexanone 85%, 医药级ph eur,bp,jpe,nf,e338 85%,gc 85%,stabilized with tbc 85%,其余物为2-氯代萘 85%,分子量627-691 85%,含100ppm mehq稳定剂 85%,工业级 85-90%,工业级 85.0%,gc 87%,顺反异构体混和物 88% (m- and p- mixture)(stabilized with tbc + onp + o-nitrocresol) 88.5% (hplc) 8m,过滤除菌 9 wt. % in h2o 9% in benzene 9.5mm 直径,99.97% metals basis 90% (hnmr) 90% (hplc),用于荧光分析 90% (stabilized with diisopropylethylamine) 90% (stabilized with na2co3) 90% (t) 90% +(stabilized with tbc) 90% mix tbc as stabilizer 90% stabilized with 60-100 ppm mehq 90% technical grade 90%(gc )(mixture of isomers) 90%(hplc)(混旋) 90%(mixture of c-16 and c-18 isomers), 工业级 90%(mixture of isomers) 90%(mixture) 90%(stabilized with tbc) 90%(t) 90%(tbc作为稳定剂) 90%(total of isomer) 90%(以干基计) 90%, stabilized with mehq 90%, γ型 90%, 包含对苯二酚稳定剂 90%, 含200ppm mehq稳定剂 90%, 含稳定剂α-生育酚 90%, 异构体混合物 90%, 来源于鲨鱼 90%,5-和6-异构体混合物 90%,gc 90%,lc&n 90%,lc 90%,mixture of isomers 90%,nmr 90%,stab. with 0.5% 4-methoxyphenol 90%,stabilized with 250-450ppm hq 90%,stabilized with k2co3 90%,含有10-(4-碘苯基)吩噻嗪的最大值为10% 90%,含碳酸钙稳定剂 90%,工业级 90%,异构体混合物 90%,异构体的混合物 90%,溶于水 90%,顺反异构体混和物 90.0% (hplc) 90.0%(gc) 90.7μg/ml in methanol 90g/l in h2o(cp) 90nm,0.03mg/ml,溶剂:超纯水 90nm,30 wt. % 1,2-丙二醇单甲醚乙酸酯溶液 90nm,40 wt. % 乙醇 91%,≤10% dichloromethane 92% (mixture of monomer and dimer) 92% (stabilized with hq) 92%(gc) 92%, stabilized with mehq 92-94 % 92-94% 93% (stabilized with mehq) 93%(hplc) 93%,gc 93%,lc 93%,t 93%,含200 ppm tbc 阻聚剂 93%,含稳定剂吩噻嗪 93%,外消旋和内消旋混合物 93%,异构体混合物 93%,黄相 94%(gc) 94%(hplc) 94%,刺球状,1-3mm 94%,刺球状,3-5mm 94%,含0.2% topanol 稳定剂 94%,含mehq稳定剂 94%,用于植物细胞培养 95 atom % 15n, 95% 95 atom % 6li 95 atom % d, 96% 95 atom % d, 98% 95 atom % d 95 atom% 95% + rel-(1r-4e-ps)-axial 95% (contains <2.5%h2o) 95% (contains <6%solvent) 95% (contains 40-44%water) 95% (contains h2o) 95% (h-nmr) 95% (mix) 95% (stabilized with 1%bht) 95% (tlc) 95% + rel-(1r-4e-ps)-axial 95% +(isomers mixture)(~4-6:6-4) 95% +(stabilized with copper chip) 95% +(stabilized with mehq) 95% ,stabilized with mehq 95% 1060815-16-8 95% 99%ee 95% anhydrous basis 95% average mn 2000-1500 95% average mn 20000 95% average mn 3000-6000-300 95% average mn 5000 95% average mw1000 95% containing less than 10% ea 95% gc 95% mix50%lioh 95% stabilized with tbc 95%(cis- and trans- mixture) 95%(gc)(t) 95%(gc), stabilized with mehq 95%(hplc)(t) 95%(mixture of t8,t10,t2) 95%(stabilized with bht) 95%(stabilized with copper chip) 95%(stabilized with dcm) 95%(stabilized with k2co3) 95%(sum of mixtures) 95%(含有<3%h2o) 95%(含水约50%,单位重量以干重计) 95%(含碳酸钾稳定剂) 95%(含约40%的十八烷基醚硫酸钠) 95%, 0.1% 4-甲氧基苯酚稳定剂 95%, 1 mg/ml in methanol:ammonia solution 95%, 15-30 cst 95%, 20% in water 95%, 200ppm 4-甲氧基苯酚稳定剂 95%, 250-350 cst 95%, 95atom%d 95%, 98%ee 95%, contains 0.1% bht as stabilizer 95%, contains 0.1% hq as stabilizer 95%, contains h2o 95%, mixture of diastereomers 95%, mw20000 95%, mw2000 95%, mw40000 95%, mw≥700kda 95%, stabilized with 0.2% tbc 95%, stabilized with caco3 95%, stabilized with copper chip 95%, stabilized with hq 95%, total of isomers 95%, wetted with ca. 20% water 95%, ~400mesh 95%, 分子量1000 95%, 分子量600 95%, 分子量:10000 95%, 分子量:20000 95%, 分子量:2000 95%, 含k2co3稳定剂 95%, 含有mehq作为抑制剂 95%, 含有稳定剂mehq 95%, 异构体混合物(反式为主) 95%,>90%e.e. 95%,(e)+(z) 95%,(双酯≥75%,单酯≥20%) 95%,100目 95%,1m solution in water 95%,200 ppm monomethyl ether hydroquinone as inhibitor 95%,200-300目 95%,5-10% branched isomers 95%,contains30-35%pinacone 95%,containsea 95%,dcm<5% 95%,ee 98% 95%,ee98% 95%,fe 21% min 95%,lc&t 95%,lc 95%,mixture of cis and trans isomers,with 200ppm 4-methoxyphenol 95%,mw 10000 95%,mw 2000 95%,nmr 95%,stabilized with 50-350ppm mehq 95%,stabilized with 60-100 ppm mehq 95%,stabilized with mehq 95%,stabilizedwithbht 95%,stabilized 95%,trans-isomer >92% 95%,t 95%,≤1.0% water 95%,分子量2000 95%,分子量400 95%,含0.01 % 柠檬酸稳定剂 95%,含0.2% sodium carbonate 稳定剂 95%,含100-500 ppm tbc稳定剂 95%,含100ppm mehq稳定剂 95%,含200ppm mehq稳定剂 95%,含250ppm bht 稳定剂 95%,含≤3%二氯甲烷 95%,含稳定剂mehq 95%,含稳定剂tbc 95%,固体 95%,对映体混合物, 主要是(s)-型 95%,异构体的混合物 95%,蓝相 95%,颗粒状 ≥550ug/mg(dried basis) ≥95.0%(t)(hplc),mixture endo- and exo- ≥98.0%(gc),mixture of cis and trans isomers 95.0% (gc) 95.0% (qnmr) 95.0%(hplc) 95.0%(total of isomers) 95 96 atom % d, 98% (cp) 96% (hplc) 96% (predominantly (s-)) 96% (tlc) 96% ,含80- 120 ppm hydroquinone 稳定剂 96% dry weight,5-10% 甲醇做稳定剂 96%(gc), contanins ≤200ppm mehq as inhibitor 96%(gc) 96%(isomers mixture) 96%(mixture of isomers) 96%(mixture of tautomers) 96%(mixture) 96%(stabilized with copper) 96%(stabilized with tbc) 96%(酯含量) 96%, 2500-3500 da 96%, 98 atom % d 96%, contains mehq as inhibitor 96%, contains naco3 as stabilizer 96%, mixture of isomers 96%, mixture 96%, mkseal 96%, stabilized with 100ppm 4-methoxyphenol 96%, 含有200 ppm mehq阻聚剂 96%, 大约200ppm bht 稳定剂 96%, 异构体混合物 96%,(99% ee) 96%,5-和6-异构体混合物 96%,stabilizedwithtbc 96%,sum of branched isomer,0.01% mehq 96%,上层覆保护剂 96%,含200 ppm mehq 稳定剂 96%,含250ppmmehq稳定剂 96%,含30 - 70 ppm mehq 稳定剂 96%,含30%水作为稳定剂 96%,含稳定剂铜屑 96%,异构体混合物 96%,混合构型 96%,溶于油 96%,片状 96.0% (gc) 96.0% (tlc) 96.0%(gc) 96.5% (gc) 96.5% 97 %,200 ppm mehq 97 atom % 18o 97 atom % d, 95%(cp) 97 atom % d, 96% (cp) 97 atom % d,98% (cp) 97% (contains 2-5%dioxane) 97% 25-27% solution in ethyl acetate 97% 99%ee(contains ~10%solvents) 97% average mw4000 97% contains ≤10%h2o 97% hplc 97% metals basis 97% rel-(1r-2e-ps)-axial 97% trace metals basis, 300-500nm 97% trace metals basis, 50-300nm 97%(contains of anhydride) 97%(d4<0.1%, d5<0.1%, d6<0.1%) 97%(gc)(t) 97%(hplc)(t)(contains <10%h2o) 97%(hplc), 99%e.e. 97%(mix) 97%(mixtures) 97%(s)-binapine 97%(stab. with hydroquinone) 97%(stabilized with bht) 97%(stabilized with copper chip) 97%(sum of mixtures) 97%(t) 97%(tbc作为稳定剂) 97%(total of isomer), ≤20% trimethylallenylsilane (in equilibrium), 500 ppm bht as stabilizer 97%(含200-300ppmmehq稳定剂) 97%(基于干物质)in 25% h2o 97%, with molecular sieves, water≤50 ppm (by k.f.),mkseal 97%, (e)+(z) 97%, 0.05%的对叔丁基邻苯二酚作稳定剂 97%, 20 wt. % in h2o 97%, 20% in methoxyethanol 97%, 25% in h2o 97%, 30-45kda 97%, 4-叔-丁基邻苯二酚 稳定剂 97%, 50% in ethanol 97%, 60% in ethanol 97%, 60% in heptane 97%, 65% in methanol 97%, 95 atom % d 97%, average mw 10000 97%, average mw 1000 97%, average mw 2000 97%, average mw2000 97%, average mw5000 97%, contains cylinder +fill charge 97%, dmso溶解性≥10mg/ml 97%, mix-50%z 97%, mixture of 2- and 4-isomers 97%, mixture of cis and trans 97%, mixture of isomers,stabilizer:100-300ppm mehq 97%, mixture of tetramer 97%, mixtures of c16&c18 97%, mixtures 97%, moistened with ca 20% water 97%, pd 5%, 铅毒化 97%, stabilized 250 ppm bht 97%, stabilized with 0.5% calcium carbonate 97%, sum of c16 c18 c20 97%, water ca 10% 97%, water ≤ 3.0% 97%, 含0.01% bht稳定剂 97%, 含有稳定剂mehq 97%, 含稳定剂mehq 97%, 含稳定剂tbc 97%, 含稳定剂铜屑 97%, 含铜稳定剂 97%, 来源于山苍子油 97%, 白色固体 97%, 精制级 97%, 约含150ppm 4-甲氧基苯酚稳定剂 97%, 颗粒 97%,0.01% 氢醌稳定剂 97%,0.1% 对叔丁基邻苯二酚作稳定剂 97%,10%h2o 97%,10mg/ml solution in water 97%,1μm 97%,300目 97%,40-100kda 97%,50% in methanol 97%,99% ee 97%,averagemw2000 97%,bet surface area 8~16 m2/g 97%,cis- and trans- mixture 97%,contains≤7%ea 97%,contain≤10%ea 97%,ee97% 97%,ee值98% 97%,ee值≥98% 97%,gc&t 97%,hq as inhibitor 97%,lc&t 97%,mix 97%,n 97%,pd 10% 97%,predominantlytrans 97%,stab. with <1% magnesium oxide 97%,stabilized with bht 97%,stabilized with tbc 97%,stabilizedwith5%k2co3 97%,stabilizedwithcopperchip 97%,sum of enantiomers 97%,t 97%,water≤50 ppm (by k.f.), mkseal 97%,含0.02% 4-methoxyphenol 稳定剂 97%,含0.05% bht 稳定剂 97%,含0.05% 四溴双酚a 稳定剂 97%,含0.1 % 对苯二酚 稳定剂 97%,含0.1% tbc稳定剂 97%,含0.1%对叔丁基邻苯二酚(tbc)稳定剂 97%,含100-200ppm bht稳定剂 97%,含100ppm bht稳定剂 97%,含100ppmmehq稳定剂 97%,含60-100ppm bht稳定剂 97%,含tbc稳定剂 97%,含低聚物 97%,含含稳定剂氢醌 97%,含稳定剂hq 97%,含稳定剂mehq 97%,含稳定剂mgo 97%,含稳定剂tbc 97%,含稳定剂水滑石 97%,含铜作稳定剂 97%,片状 97%,用于gc衍生化,含1% tbdmscl 97%,用于gc衍生化 97%,铜稳定剂 97%,顺反异构体 97%,顺反异构体混合物 97%,顺反混合物 97%,顺式 + 反式 97%,香料级 500μg/ml,h2o 97-103%(t),beta≥60%,lossondrying≤5% 97.0 % gc 97.0% (nt) 97.0% (sum of isomers, gc) 97.0% (tlc) 97.0%(hplc) 97.00%盐酸盐 97.5% (gc) 97.5% 98 atom % 13c, 95% (cp) 98 atom % 13c, 97%(cp) 98 atom % 13c, 98 atom % 15n, ≥98% 98 atom % 13c, 98% (cp) 98 atom % 13c, 98% 98 atom % 15n, 98%(cp) 98 atom % 15n, 99 atom % 13c 98 atom % d(deuterated from d0-d8), 95% 98 atom % d, 97%(cp) 98 atom % d, ≥99%(cp) 98 atom % d,95% 98 atom % 13c, 95% (cp) 98 atom % 13c, 98 atom % 15n, 95%(cp) 98 atom % 13c, 99% (cp) 98 atom % 15n, 98 atom % 13c, 95%(cp), 97%(chiral purity) 98 atom % 15n, 99 atom % 13c 98 atom %, 98%(cp) 98 atom %, 98% 98 atom %, ≥97% (cp) 98 atom %d 98 atom % 98 atom% 13c 98 atom% 15n, 98 atom% d 98 atom% d, 95%(cp) 98 atom% d, 99%(cp) 98 atom% d,99%(cp) 98 atom%d 98% (contains <0.5%h2o) 98% (isomers mixture) 98% stabilized with tbc 98% (as sncl4) 98% (contains <1%h2o) 98% (contains <5%h2o) 98% (gc) 98% (hplc)(contains <10%ammonium sulfate salt) 98% (isomer mixture) 98% (mix) 98% (only trans) 98% (reo) 98% (stabilized with citric acid) 98% (stabilized with phenothiazine) 98% (tlc) 98% +(contains <7%h2o) 98% +(contains <8%h2o) 98% +(isomer mixture) 98% +(isomers mixture) 98% +(stabilized with tbc) 98% ,ee98% 98% ,含5-10 ppm tert-butylcatechol 稳定剂 98% 100mm in water 98% 98%atom%13c 98% 98.68% ee 98% 98atom%d 98% 99.75%ee 98% analytical standard 98% contains ca. 11% dioxane 98% dry weight 98% hplc 98% ir 53% 98% metal basis, rh 19.32%最低 98% mixture of isomers 98% stabilized with tbc 98% trace metals basis excluding zr 98%(900-1100ppm mehq as inhibitor) 98%(cis+trans) 98%(contains of anhydride) 98%(gc&t) 98%(gc)(t) 98%(gc), 顺反混合物, stabilized with mehq 98%(m- and p- mixture)(stabilized with tbc) 98%(mix2%ea) 98%(mixture of isomers) 98%(mixture of isomer) 98%(mixture of isomeric branched chain hexanes) 98%(mixtures of isomers) 98%(nmr) 98%(stabilized with bht) 98%(stabilized with koh) 98%(stabilized with methylhydroquinone) 98%(t) 98%(tlc) 98%(total of isomer) 98%(~36% bf3 basis) 98%(以干基计), water≤16.5% 98%(混合异构体) 98%+,水封 98%, with molecular sieves, water≤50 ppm (by k.f.), mkseal 98%, 10 mg/ml in methyl acetate 98%, 1800-2000目 98%, 250-500 cst (50˚c) 98%, 400nm-1μm 98%, 80%ee 98%, 95 atom % d 98%, 98 atom % 13c 98%, 98 atom % d, 98 atom % 13c 98%, 98 atom%d 98%, 98%atom%d 98%, carbon≤1.5% 98%, contains <7%h2o 98%, contains 10-15%acoh 98%, contains 15 wt.% water as stabilizer 98%, contains caco3 as stabilizer 98%, contains potassium carbonate as stabilizer 98%, ee80% 98%, ee99% 98%, for analysis, acs,iso,reag. ph eur 98%, in 10% dcm 98%, mix tbc as stabilizer 98%, mixtures 98%, mixture 98%, ph<7 (33.3% in water) 98%, ru≥25.8% 98%, stab. with 1-5% hexane 98%, stabilized with ~1.5% phenothiazine 98%, with molecular sieves, water≤50 ppm (by k.f.), mkseal 98%, ~20nm 98%, 含<1%正丁硫醇稳定剂 98%, 含0.1%tbc稳定剂 98%, 含k2co3稳定剂 98%, 含铜屑稳定剂 98%, 无水 98%, 游离态 98%, 用于蛋白质研究 98%, 白色粉末, 用于生化研究 98%, 立体异构体混合物 98%, 粉末 98%, 粒径: 0-2μm 98%, 粒径: 1-2μm 98%, 粒径: 100-300nm 98%, 粒径: 600-800nm 98%, 粒径; 100-500nm 98%, 粒径; 400-700nm 98%, 粒径; 800-1000nm 98%, 顺反混合物 98%, stabilized with bht 98%,(stabilized with mehq) 98%,(t) 98%,10-20目 98%,100-200 ppm bht as inhibitor 98%,1250目 98%,200目 98%,4 ~ 8μm 98%,40-60目 98%,400目 98%,42-50(mpa25°c) 98%,97%ee 98%,98 atom % d 98%,98%atom%d 98%,99%e.e. 98%,co:45-47% 98%,contains 0.1-0.2%mehq 98%,contains<10-20%h2o 98%,contains≤6%h2o 98%,contains≤7%h2o 98%,ee 97% 98%,ee92% 98%,ee95% 98%,gc&n 98%,hplc 98%,m.w ~80000 98%,mix tbc as stabilizer 98%,mixture of cis and trans 98%,pd 15% 98%,pd>11.0% 98%,pd>13.3% 98%,pd>15.5% 98%,pd>19.0% 98%,pd>21.0% 98%,pd>22.5% 98%,pd>29.0% 98%,pd>36.2% 98%,pt:55.0 ± 1.3% 98%,rh>25.8% 98%,rh>42% 98%,stabilized with 0.1% 3,5-di-tert-butylcatechol 98%,stabilized with 0.2% α-tocopherol 98%,stabilized with 5% k2co3 98%,stabilized with 5-20 ppm hydroquinone 98%,stabilized with bht, water≤50 ppm (by k.f.), mkseal 98%,stabilized with copper chip 98%,stabilized with hq 98%,stabilized with mehq 98%,stabilized with tbc 98%,stabilizedwith4-7%h2o 98%,光学纯 70% 98%,光学纯 98%,含 o-型 98%,含0.01% koh稳定剂 98%,含0.1% 对苯二酚稳定剂 98%,含0.1%碳酸钾稳定剂 98%,含0.10% alpha-tocopherol 抗氧化剂 98%,含0.3 % mgo稳定剂 98%,含50 - 100 ppm bht 稳定剂 98%,含500 ppm bht稳定剂 98%,含90 - 110 ppm mehq 稳定剂 98%,含有数量不等的1,3-二异丙基咪唑鎓-2-羧酸盐 98%,含水约20% ,单位重量以干重计 98%,含稳定剂bht 98%,含稳定剂tbc 98%,含稳定剂吩噻嗪 98%,含铜屑稳定剂 98%,支链异构体类的混和物 98%,无水 98%,无水级 98%,无色液体 98%,晶体 98%,棕色结晶粉末 98%,正丁酰氯≤0.10% 98%,深蓝紫色结晶粉末 98%,片状 98%,球状 98%,用于过氧化物酶试验 98%,用于酯化 98%,磺酸掺杂 98%,粒径:100-300nm 98%,约含0.5% mehq 稳定剂 98%,蓝相 98%,适用于荧光 98%,非对映异构体混合物 98%,顺反异构体混合物 98%,黄相 98%atom%d na salt, 97% 98%含稳定剂mehq 98%混合(tbc作为稳定剂) 98%混合物(tbc作为稳定剂) 98 atom % d cage content (gpc)≥85% 98-101% 98-102%(t)(含有30-40%h2o) 98.0% (at) 98.0% (tlc) 98.0%(hplc)(t), 用于高效液相色谱标记 98.0%(hplc) 98.0%(n)(t) 98.0%(tlc) 98.0-102.0% anhydrous basis (hplc) 98.00%-gc&t 98.00%lc&n 98.00%lc 98.1%(isotopic value:99.1%) 98.5 atom %, 15n 98% 98.5%, with molecular sieves, water≤50 ppm (by k.f.), mkseal 98.5%, mixture of isomers 98.5%,water≤50 ppm (by k.f.), mkseal 98.5-101.5% (at) 98.9-101.2% b2o3 basis 99 %,stab. with 0.1% tbc 99 atom % 11b 99 atom % 13c, 95% 99 atom % 13c, 98 atom % 15n 99 atom % 13c, 98 atom % d 99 atom % 13c, 99 atom % 15n, 95% (cp) 99 atom % 13c, 99 atom % 15n, 98%(cp) 99 atom % 13c, 99 atom % d 99 atom % 13c, 99% (cp) 99 atom % 13c, 99% 99 atom % d, 80%(hplc) 99 atom % d, 99 atom % 13c 99 atom % d, 99% (cp) 99 atom % 13c, 97%(cp) 99 atom % 13c, 98%(cp) 99 atom % 7li, 99%(cp) 99 atom %, 98% 99 atom %, ≥98% 99 atom %13c, 99%(cp) 99 atom %13c 99 atom% d, 95 atom% 18o 99% (contains 20-30%h2o) 99% (dry wt.), water <2% 99% (gc) 99% (hplc), 98% 99% (metals basis excluding ba) 99% (purity excludes ~1% zr) 99% (tlc) 99% ,粒径≤1μm 99% 10-50微米 99% 99.9+% ee 99% au assay:39.91 ± 0.8% 99% isotopic 99% metals basis, 325 mesh 99% metals basis, 含有约10%的nicro3 99% metals basis,2-10 μm 99% metals basis,pd 9.0% 99% purity,>99% ee 99% trace metals basis, 150-200nm 99% trace metals basis, 20nm, 球形 99% trace metals basis, 350nm 99% trace metals basis,sba-15 99%(99.99 %-ta) 99%(99.99%-w) 99%(gc), contanins ≤200ppm mehq as inhibitor 99%(mixture of isomers),来源枯草菌脂肽钠 99%(mixture of isomers) 99%(mixtures), 包含~0.006%对苯二酚稳定剂 99%(nmr) 99%(sum of mixtures) 99%(titration) 99%(二甲苯异构体+乙基苯) 99%(升华级) 99%(含200-300ppmmehq稳定剂) 99%(天然) 99%(支链异构体类的混合物总和) 99%, water≤50 ppm (by k.f.),mkseal 99%, with molecular sieves, water≤50 ppm (by k.f.), mkseal 99%, 0.1-1mm 99%, 0.2-0.5μm 99%, 0.5-1μm 99%, 1-3mm 99%, 10% w/v in isopropanol/hexane(50:50) 99%, 100±5nm 99%, 100-300nm 99%, 10μm 99%, 2-4mm 99%, 200目 99%, 3-5μm 99%, 300-500nm 99%, 4-7mm 99%, 400目 99%, 7% s, dissolved in tbp 99%, 99.999%-si 99%, acid<200 ppm, h2o<100 ppm 99%, mixture of isomers 99%, stabilized with bht 99%, stabilized with mehq 99%, sublimed 99%, with molecular sieves, stabilized with 400 ppm triethylamine, water≤50 ppm (by k.f.), mkseal 99%, with molecular sieves,water≤50 ppm (by k.f.), mkseal 99%, β型 99%, ≥99.99% trace metals basis 99%, 含50-150 ppm tbc 稳定剂 99%, 平均粒径: 2μm 99%, 异构体混合物 99%, 用于合成 99%, 用于药物研究 99%, 粉末 99%, 粒径: 5-10μm 99%, 粒径<10μm 99%,(mixture of isomers) 99%,-325目 99%,0.1%单杂 99%,0.5~0.7um 99%,1-4mm 99%,1-5μm 99%,100目 99%,15nm,疏水性 99%,1~2μm 99%,200目 99%,3-5μm 99%,3000-4000目 99%,325 目,粉末 99%,40-60目 99%,500目 99%,50目 99%,6-10μm 99%,6μm 99%,99.99%-hf, <0.2% 99%,<500nm 99%,anhydride group content≥41.0% 99%,bp 99%,ee 98% 99%,ee99% 99%,hq as inhibitor 99%,metals basis 99%,mixture of isomers 99%,p≥27% 99%,stabilized with 100ppm mehq,water≤50 ppm (by k.f.),mkseal 99%,stabilized with bht, water:300-500ppm (by k.f.), mkseal 99%,stabilized with bht, water≤50 ppm (by k.f.), mkseal 99%,water≤50 ppm (by k.f.), mkseal 99%,≤100nm 99%,主要是顺式 99%,十二水合物 99%,单杂<0.2%,ee99.5% 99%,含0.01 % bht 稳定剂 99%,含0.01% copper 稳定剂 99%,含0.01% 铜片 稳定剂 99%,含0.1 % koh 稳定剂 99%,含1-3%乙醇稳定剂 99%,含10 - 20 ppm mehq 稳定剂 99%,含10-100ppm 4-methoxyphenol 稳定剂 99%,含10-15ppm 4-叔-丁基邻苯二酚稳定剂 99%,含10-20 ppm mehq 作为稳定剂 99%,含15 - 20 ppm mehq稳定剂 99%,含150-400 ppm bht 稳定剂 99%,含20ppm mehq稳定剂 99%,含50-150 ppm tbc 稳定剂 99%,含50ppm bht 稳定剂 99%,含水20% 99%,含阻聚剂mehq 99%,异构体混合物 99%,总杂<0.1% 99%,水分≤1.0% 99%,用于生化研究 99%,粒径<1.2um 99%,粒状 99%,适用于分析 99%,金红石,2-3um 99%,锐钛,100nm 99%,锐钛,2-3um 99%,闪烁级 99%,高纯级 99%,黄色结晶针状固体 99%[bmim][po4] 99.0% (at) 99.0% (hplc) 99.0% (t) 99.0% metals basis 99.0%(hplc) 99.0%,stabilized with 5-20 ppm hydroquinone 99.0-100.3% (w/w) (t) 99.0-100.5% (in dried substance), meets analytical specification of e 282 99.00%,ee99% 99.1%(isotopic value:98.6%) 99.5 atom % d, 3 n in d2o 99.5 atom % d, 99% (cp) 99.5% ( 4 times purification ) 99.5% (loss on drying≤10%) 99.5% (metals basis excluding sr), sr <500ppm 99.5% (metals basis 去除ni), ni < 0.2% 99.5% (metals basis 去除铪) ,325目 99.5% (metals basis,锆除外), zr <1% 99.5% ,粒径:1-2um 99.5% metals basis (去除铪),1-3μm 99.5% metals basis, 1-1.5um 99.5% metals basis, 100-200nm 99.5% metals basis, 40nm, 近球形 99.5% metals basis, 50-100nm 99.5% metals basis, d50: 2-3μm 99.5% metals basis, ≤6um 99.5% metals basis,<100 nm 99.5% metals basis,<100nm 99.5% metals basis,10μm 99.5% metals basis,150nm,锐钛,亲水 99.5% metals basis,2.0μm 99.5% metals basis,25μm 99.5% metals basis,2μm 99.5% metals basis,300目 99.5% metals basis,5 μm 99.5% metals basis,5μm 99.5% metals basis,<15μm 99.5% metals basis,≤45um 99.5% metals basis,≥200目 99.5% metals basis,粉末, 2 μm 99.5% metals basis,粉末,<3 μm 99.5% trace metals basis, 3μm 99.5% trace metals basis, aqueous nanoparticle dispersion, <5 nm, 20% wt.% in h2o 99.5%( based on diamine), mixture of isomers 99.5%(4 times purification) 99.5%(gc) 99.5%, water≤50 ppm (by k.f.),mkseal 99.5%, with molecular sieves, water≤50 ppm (by k.f.), mkseal 99.5%, with molecular sieves, water≤50 ppm (by k.f.),mkseal 99.5%, 10-80目 99.5%, acid <200 ppm, h2o <100 ppm 99.5%, d50≈3μm 99.5%, hafnium chloride<50ppm 99.5%, with molecular sieves, water≤50 ppm (by k.f.), mkseal 99.5%, with molecular sieves, water≤50 ppm (by k.f.), mkseal 99.5%, 含<1%正丁硫醇稳定剂 99.5%, 适用于分析 99.5%,-325mesh 99.5%,1-3μm 99.5%,100-200nm,球形 99.5%,100nm 99.5%,10um 99.5%,15±5nm 99.5%,150-200目 99.5%,2-3μm 99.5%,20±5nm 99.5%,20-80nm 99.5%,200nm 99.5%,200目 99.5%,20nm 99.5%,30±5nm 99.5%,300目 99.5%,40-100nm 99.5%,50±5nm 99.5%,500nm 99.5%,50nm 99.5%,60-120nm 99.5%,dtt,无酶 99.5%,ee99.5% 99.5%,gc 99.5%,metals basis 99.5%,stabilized with 5-20 ppm hydroquinone 99.5%,stabilized with bht, water≤50 ppm (by k.f.), mkseal 99.5%,trace metals basis 99.5%,water< 0.005% (by k.f.), mkseal 99.5%,water≤50 ppm (by k.f.),mkseal 99.5%,with molecular sieves, stabilized with bht, water≤30 ppm (by k.f.), mkseal 99.5%,with molecular sieves, stabilized with bht, water≤50 ppm (by k.f.), mkseal 99.5%,with molecular sieves, water≤50 ppm (by k.f.),mkseal 99.5%,≤3 μm 99.5%,≤30μm 99.5%,升华纯化 99.5%,单杂<0.1% 99.5%,含0.1 % koh 稳定剂 99.5%,含稳定剂铜屑 99.5%,异构体混合物 99.5%,无水级,水≤50ppm,mkseal 99.5%,片状 99.5%,生物技术级 99.5%,粉末 99.5%metals basis 99.5%分析标准品 99.56%,无水级 99.6%,25μm 99.7% metal basis 99.7% trace metals basis, <25 nm 99.7%(isotopic value:98.9%) 99.7%,stabilized with bht, water≤50 ppm (by k.f.),mkseal 99.7%,water≤50 ppm (by k.f.), mkseal 99.7%,with molecular sieves, stabilized with bht, water≤50 ppm (by k.f.), mkseal 99.7%,with molecular sieves, water≤50 ppm (by k.f.), mkseal 99.8 atom % d, cp:98% 99.8% metal basis, 1μm, 近球形 99.8% metals basis, 100目 99.8% metals basis, 10nm-25nm, 锐钛, 亲水 99.8% metals basis, 30nm, 锐钛, 亲水 99.8% metals basis,100-300nm,金红,亲水 99.8% metals basis,100nm,金红,亲水 99.8% metals basis,100nm,金红,亲油 99.8% metals basis,100nm,锐钛,亲水 99.8% metals basis,100nm,锐钛,亲油 99.8% metals basis,25nm,金红,亲水 99.8% metals basis,25nm,锐钛,亲水 99.8% metals basis,300目 99.8% metals basis,40nm,金红,亲水 99.8% metals basis,40nm,锐钛,亲水 99.8% metals basis,5-10nm,锐钛,亲水亲油型 99.8% metals basis,5-10nm,锐钛,亲水型 99.8% metals basis,50±10nm 99.8% metals basis,60nm,金红,亲水 99.8% metals basis,60nm,锐钛,亲水 99.8% metals basis,60nm,锐钛,亲油(硬脂酸处理) 99.8% metals basis,60nm 99.8% metals basis,90±10nm 99.8% metals basis,rh 81% 99.8% trace metals basis 99.8%, with molecular sieves, water≤50 ppm (by k.f.),mkseal 99.8%, cl≤0.005% 99.8%,10μm 99.8%,1μm,,高白度 99.8%,200目 99.8%,6.35mm (0.25in) dia x 6.35mm (0.25in) length 99.8%,d50 0.5-1.5μm 99.8%,pb:0.0005% 99.8%,pb:0.001% 99.8%,stabilized with bht, water≤50 ppm (by k.f.), mkseal 99.8%,water≤30 ppm (by k.f.), mkseal 99.8%,比表面积(bet): 260m2/g;粒径:7-40nm 99.8%,比表面积(bet):100m2/g;粒径:7-40nm 99.8%,比表面积(bet):115m2/g;粒径:7-40nm 99.8%,比表面积(bet):120m2/g;粒径:7-40nm 99.8%,比表面积(bet):150m2/g;粒径:7-40nm 99.8%,比表面积(bet):170m2/g;粒径:7-40nm 99.8%,比表面积(bet):200m2/g;氯化物:0.0125 99.8%,比表面积(bet):200m2/g;粒径:7-40nm 99.8%,比表面积(bet):230m2/g;粒径:7-40nm 99.8%,比表面积(bet):300m2/g;粒径:7-40nm 99.8%,比表面积(bet):380m2/g;粒径:7-40nm 99.85% (metals basis) 99.85% 99.9 %,~60% in neodecanoic acid (15-20% bi) 99.9 atom % d 99.9% metals basis, ≤1μm 99.9% (metals basis), pt 44.9% min 99.9% metal basis, d50≤10μm 99.9% metal basis 99.9% metals basis ,无水 99.9% metals basis, <10μm 99.9% metals basis, 1-3cm 99.9% metals basis, 1000目 99.9% metals basis, 150-250目 99.9% metals basis, 1μm 99.9% metals basis, 50-300nm 99.9% metals basis, 500目 99.9% metals basis, 600-800nm 99.9% metals basis, 600目 99.9% metals basis, 800目 99.9% metals basis, 900目 99.9% metals basis, d50=200nm 99.9% metals basis, α相, 100nm, 亲油型 99.9% metals basis, ≤0.8μm 99.9% metals basis, ≤150nm 99.9% metals basis, ≥200目 99.9% metals basis, 平均粒径:10 μm, 近球形 99.9% metals basis, 棕色固体 99.9% metals basis, 粒径<500nm 99.9% metals basis,<50 nm 99.9% metals basis,0.5μm 99.9% metals basis,1-2μm 99.9% metals basis,1-5μm 99.9% metals basis,10-20μm 99.9% metals basis,10-30nm 99.9% metals basis,100-200 mesh 99.9% metals basis,100目 99.9% metals basis,1~2μm 99.9% metals basis,1μm 99.9% metals basis,2 μm 99.9% metals basis,2-3μm 99.9% metals basis,200目,粉末 99.9% metals basis,20nm 99.9% metals basis,2μm 99.9% metals basis,30±10nm 99.9% metals basis,300目,近球形 99.9% metals basis,40nm 99.9% metals basis,4mm,颗粒 99.9% metals basis,50-70nm 99.9% metals basis,500nm 99.9% metals basis,5~10μm 99.9% metals basis,60-100nm,黑色粉末 99.9% metals basis,60-100nm 99.9% metals basis,60-80nm 99.9% metals basis,<200nm 99.9% metals basis,ir ≥84.5% 99.9% metals basis,pd 29% 99.9% metals basis,α相,30nm,亲水型 99.9% metals basis,α相,30nm,亲油型 99.9% metals basis,≤1μm 99.9% metals basis,不规则片状 99.9% metals basis,宽:13 mm, 厚:0.3 mm 99.9% metals basis,无水 99.9% metals basis,粉末,100-200 mesh 99.9% metals basis,粉末,≥200目 99.9% metals basis,粒径<5mm 99.9% metals basis,粒径(d50)10-20μm 99.9% metals basis,粒径10μm 99.9% metals basis,粒径≤1μm 99.9% metals basis,颗粒 99.9% metals basis,黄色 99.9% rare earth metals basis,200目 99.9% trace metals basis (purity excludes ~2% hfo2) 99.9% trace metals basis, 100目 99.9% trace metals basis, 50-100 nm 99.9% trace metals basis, 50-80nm 99.9% trace metals basis,325mesh 99.9% trace metals basis,−325目 99.9%(gc),含40ppm二异丙胺 稳定剂 99.9%(isotopic value:99.1%) 99.9%(metals basis) 99.9%(mixtures) 99.9%, 100±5nm 99.9%, 100nm, 单斜相 99.9%, 1600-2000目 99.9%, 1cm-3cm 99.9%, 1μm, 单斜相 99.9%, 200nm, 单斜相 99.9%, 200目, 四方相 99.9%, 200目 99.9%, 20nm, 单斜相 99.9%, 20nm 99.9%, 300±5nm 99.9%, 500nm, 单斜相 99.9%, 50nm, 单斜相 99.9%, 60-100目 99.9%, water≤0.2% 99.9%, ≤30μm 99.9%, ≤500 μm, powder 99.9%, 不含甲醇 99.9%, 无甲醇、无甲醛、无酯、无杂醇油 99.9%, 深蓝色, 用作透明隔热薄膜 99.9%, 球型, d50=0.6-1um, 四方晶体-铁电体 99.9%, 球型, d50=0.6-1um 99.9%, 白色 99.9%, 粒径: 200-500nm 99.9%,1-2um 99.9%,1-3um 99.9%,100nm 99.9%,100目 99.9%,105-250um 99.9%,1250目 99.9%,12~16um 99.9%,15-45um 99.9%,15-53um 99.9%,17um 99.9%,1~5mm 99.9%,23um 99.9%,27um 99.9%,300目 99.9%,30nm 99.9%,3~4um 99.9%,40nm 99.9%,53-105um 99.9%,53-120um 99.9%,53-150um 99.9%,80-100nm 99.9%,800目 99.9%,8~10um 99.9%,d50(0.2~0.55μm) 99.9%,lossondrying≤5% 99.9%,metals basis 99.9%,total metallic impuriyies≤1000 ppm 99.9%,water≤50 ppm (by k.f.), mkseal 99.9%,with molecular sieves, water≤30 ppm (by k.f.), mkseal 99.9%,平均粒径≤100 nm,粉末 99.9%,比表面积≥120m2/g;粒径:30nm 99.9%,生物技术级 99.9%,粒径:1-3μm 99.9%,颗粒,锆≤0.15% 99.9%-ni 99.9%-pd 99.9%-sc(reo) 99.9%metal basis,d1=1μm 99.9%metals basis 99.95% metals basis 99.95% (loss on drying≤30%) 99.95% (metals basis), pt 51.5% min 99.95% metal basis, ru 25.3%最低 99.95% metal basis 99.95% metals basis ,白色 99.95% metals basis, os 37%最低 99.95% metals basis, rh 13.5% 最低 99.95% metals basis, ≤80目 99.95% metals basis, 钌 10.2% 最低 99.95% metals basis,1-5mm 99.95% metals basis, 99.95% metals basis,无水级,粉末 99.95%,1um 99.97% metals basis 99.99 % metals basis 99.99% (metals basis), au 84.2% 最低 99.99% metal basis, ru 23%最低 99.99% metal basis, 无气味的粉末 99.99% metals basis ,50nm 99.99% metals basis 0.5-2mm 99.99% metals basis, 3.3-5μm 99.99% metals basis, 40目 99.99% metals basis, 800目 99.99% metals basis, au≥39.3%最低 99.99% metals basis, os 52-56% 99.99% metals basis, rh 11.4%最低 99.99% metals basis, rh 46.2% 最低 99.99% metals basis, water<10 ppm (by k.f.), mkseal 99.99% metals basis, γ相, 40nm 99.99% metals basis, 平均粒径: 100nm 99.99% metals basis, 无水 99.99% metals basis, 用于镀膜 99.99% metals basis, 直径0.1-2mm 99.99% metals basis,0.1mm 直径 99.99% metals basis,0.25mm 直径 99.99% metals basis,0.5mm 直径 99.99% metals basis,0.5um 99.99% metals basis,1-3mm,powder 99.99% metals basis,1-3mm 99.99% metals basis,100nm 99.99% metals basis,150-250目 99.99% metals basis,150目 99.99% metals basis,1mm 直径 99.99% metals basis,1um 99.99% metals basis,200nm 99.99% metals basis,2~10μm 99.99% metals basis,2μm 99.99% metals basis,300目 99.99% metals basis,40-200目 99.99% metals basis,400目 99.99% metals basis,4mm颗粒 99.99% metals basis,50-70nm 99.99% metals basis,5μm 99.99% metals basis,80%α相,30nm-50nm 99.99% metals basis,α晶型,60nm 99.99% metals basis,α晶型约90%,晶型γ约10%,50nm 99.99% metals basis,α晶型约95%,晶型γ约5%,80nm 99.99% metals basis,α相,300nm,亲水型 99.99% metals basis,α相,30nm,亲水型 99.99% metals basis,α相,30nm 99.99% metals basis,α相,50nm,亲水型 99.99% metals basis,γ晶型,60nm 99.99% metals basis,γ相,10nm 99.99% metals basis,γ相,20nm 99.99% metals basis,≤0.1μm 99.99% metals basis,≤45μm 99.99% metals basis,≥100目 99.99% metals basis,不规则块状 99.99% metals basis,主体晶相,30nm-50nm 99.99% metals basis,无水级 99.99% metals basis,晶体颗粒 99.99% metals basis,晶型α,0.20μm 99.99% metals basis,晶型γ,20nm 99.99% metals basis,晶粒 99.99% metals basis,用于光学玻璃或单晶 99.99% metals basis,粒径<5mm 99.99% metals basis,粒径:10μm 99.99% metals basis,粒径:2μm 99.99% metals basis,粒径:5μm 99.99% metals basis,粒状,1-3mm 99.99% trace metals basis (purity excludes zirconium) 99.99% trace metals basis, <100 nm 99.99% trace metals basis, d50=2~3μm 99.99% trace metals basis, ≤10 μm 99.99% trace metals basis, 无水级 99.99% trace metals basis, 超干 99.99% trace metals basis,<20 μm, 99.99% trace metals 99.99%(metalsbasis去除ni),ni<0.2% 99.99%, 1μm 99.99%, 2um 99.99%, 30μm, 球形 99.99%, d50=1μm 99.99%,1-3mm 99.99%,1-3μm 99.99%,1~5mm 99.99%,1μm 99.99%,3-5 um 99.99%,4n 99.99%,metals basis 99.99%,water:0.5-0.8% 99.99%,白色粉末,锆≤0.15% 99.99%,粒径:1μm 99.99%-sn 99.99%-zr (reo) 99.99%metalsbasis 99.993%, with indicator, 8 mesh 99.995 % metals basis 99.995% metals basis,≤60目 99.995% metals basis,≤80目 99.9965% metals basis 99.997% trace metals basis 99.998% (metals basis 去除 w), w 300ppm 最高 99.998% metals basis,100目 99.998% trace metals basis,结晶,粉末 99.998% 99.9985% (metals basis), (去除最高25ppm的碱土金属) 99.9985% metals basis 99.999% metals basis 99.999% (reo) 99.999% metals basis ,无水 99.999% metals basis, 1-6mm 99.999% metals basis, 200目 99.999% metals basis, 60目 99.999% metals basis, si 10ppm 最高 99.999% metals basis,1-5mm 99.999% metals basis,1-6 mm,beads 99.999% metals basis,300目 99.999% metals basis,<2cm 99.999% metals basis,beads,1-6 mm 99.999% metals basis,powder 99.999% metals basis,无水级 99.999% metals basis,粒状,1-3mm 99.999% trace metals basis, 珠状, -10目 99.999%(metalsbasis去除ni),ni<0.2% 99.999%,5n 99.999%,≤45μm,粉末 99.999%metals basis 99.9995% trace metals basis 99.9999% metals basis,1-5mm 99.9999% metals basis,单晶棒状 99.9999% trace metals basis 99.9999% 99.99999% metals basis,块状 99.99999% metals basis,棒状或块状 99atom%13c <100nm,99% >200目 >30u/mg,20mg/ml in h2o >40% in h2o >65% >70% >80% >97%(hplc) >98.0%(gc) >99%(gc) >99%,10-100fg >99%,ultra low-abundance proteins >99% >99.0% metals basis,2μm acid terminated,lactide:glycolide 50:50,mw 24000-38000 acid terminated,lactide:glycolide 50:50,mw 38000-54000 acid terminated,lactide:glycolide 75:25,mw 4000-15000 acid terminated,mw 38000-54000 acid terminated,mw 7000-17000 acid value (koh mg/g): 200~235 acid value(koh mg/g):286~326 acs reagent, chips, 33.5-36.5% acs reagent, for spectrophotometric det. of cd,cu,hg,pb,zn, ≥98%(tlc) acs reagent, mixture of cuo and cu2o acs spectrophotometric grade, ≥99.9% acs, 99% acs, 99.8-100.3% acs, pt 37.5% min acs, ≥85% acs, ≥90% acs, ≥98% acs, ≥98.0% (rt) acs, ≥99.0% (gc) acs, ≥99.4% acs, ≥99.5% acs, 干燥剂 acs,>98% acs,48%,无色液体 acs,48% acs,97%,片状 acs,98% acs,98.0-102.0% acs,98.0-103.0% acs,99% acs,99.0% acs,99.0-100.5% acs,99.0-101% acs,99.0-101.0% acs,99.5-101.0% acs,≥97.0% acs,≥98% acs,≥99.0%(gc) acs,≥99.5%(gc) acs,≥99.5%(t) acs,≥99.7% acs,≥99.8% ag≥24% al2o3 30-40%, -600目 al2o3:46% al2o3≈32% al2o3≥30% al2o3≥50% al: 16-20%, stabilized with boric acid alkylating agent, 90% al≥8.4% al≥9.8% analytical standard ≥ 99.0 % analytical standard ≥99.0% (gc) analytical standard ≥97.0% (hplc) analytical standard, for gpc, 17,000 analytical standard,≥98% anhydrous, 99.9% metals basis anhydrous, 98% anhydrous, 99.5% anhydrous, powder, 99.9% metals basis anhydrous,98% anhydrous,99.0% anhydrous,99.9% trace rare earth metals basis anhydrous,99.995% trace metals basis anhydrous,99.998% trace metals basis anhydrous,≥99% anhydrous aps≈2微米, 99.9% metals basis aqueous solution ~0.206 m, ≥99% ar au 23.5~23.8% in h2o au 48-50% au ≥35% au ≥48% au≥51% au≥55% au≥82% available chlorine 4.0 % average m.w. 1000 average m.w. 600 average mn 1,700-3,200 average mn 10,000, contains mehq as inhibitor average mn 1310 average mn 20,000, contains mehq as inhibitor average mn 200, contains mehq as inhibitor average mn 2000, contains ≤300 ppmmehq average mn 2700 average mn 30,000-50,000 average mn 40,000 average mn 400, contains mehq as inhibitor average mn 45,000 average mn 50,000 average mn 50000 average mn 500 average mn 550, contains 270-330 ppm bht as inhibitor, 80-120 ppm mehq as inhibitor average mn 6,000, contains 1000 ppm 4-methoxyphenol as inhibitor average mn 600, contains mehq as inhibitor average mn 6000 average mn 750, contains 900-1100 ppm mehq as inhibitor average mn 80,000 average mn 85,000 average mn ~1,000 average mn ~2,500 average mn ~2,600 average mn ~27,000 average mn ~330 average mn ~357 average mn ~468, eo/phenol 1.5, contains mehq as inhibitor average mn ~50000 by gpc average mn ~512 average mn ~670, average mw ~700 average mn ~683 average mn ~692(stabilized 100ppm mehq) average mn 2,000 average mn 3,700, contains ≤1,500 ppm hq as inhibitor average mn ~1,000 average mn ~314, contains 300 ppm mehq as inhibitor average mn ~50,000 average mn ~650 average mn ~7,200 average mn-345 average mn8000 average mn~1124 average mn~380 average mn~428 average mn~432,84wt.% in 1-butanol average mn~500 average mn~640 average mn~692,含100ppm mehq稳定剂 average mn~912 average mv ~38,000, pellets average mw 1000-1500 average mw 1200-1600 average mw 1200-2500 average mw 1400-1600 average mw 1500-1800 average mw 250-500 average mw 3,000, 50 wt. % in h2o average mw 3000-5000 average mw 4000-7000 average mw 5000 average mw 550-650 average mw 570-620 average mw 600-1000 average mw 600-800 average mw 6000-8000 average mw 650-1000 average mw 700-1000 average mw 800-1400 average mw ~(162.21)n, 米黄色 average mw ~(162.21)n average mw ~1,080,000, average mn ~311,000 average mw ~1,589 average mw ~10,000 average mw ~1000000, powder average mw ~14,000, average mn ~10,000 average mw ~160,000 average mw ~165,000 by gpc, acrylonitrile 25 wt. %, pellets average mw ~185,000 by gpc, acrylonitrile 30 wt. %, powder average mw ~216000, average mn ~80,000 average mw ~240,000 by gpc, 25 wt. % in h2o average mw ~35,000, pellets average mw ~50,000 average mw ~60,000 average mw ~70000, powder average mw ~80,000 average mw ~2,200, average mn ~1,200, allyl alcohol 40 mol % average mw10000 average mw2000-3400-200 average mw20000 average mw3400 average mw~110,000 average mw~170 average mw~300000 average mw~693 averagemw1000 ba ≥30.0 % basichydrate battery grade 99.99% trace metals basis best scavenger for: ag,hg,os,pd&ru best scavenger for: as,lr,ni,os,pd,pt,rh,ru&se best scavenger for: cd,cr,pt,rh1+,rh2+ best scavenger for:cr,pt,pd2+,pd0 bf3 ≥19% bf3 ≥60%, 白色固体 bf3: 25%-26% bf3: 34%-36% bf3:17.5 - 19.0 % bf3:30.0 - 35.0 % bi 49% biochemika, ≥96.0%(tlc) biochemika, ≥99% biological stain bioreagent plus, ≥98% bioreagent, suitable for electrophoresis, 98.0-102.0% bioreagent, suitable for fluorescence, ≥98.0% (t) bioreagent, suitable for insect cell culture, ~1360 iu/g biothnology grade ,80% bioxtra, ≥98.0% (tlc) black granular br,10-20u/mg br,28% br,90% br,99% c(cdta-2na)=0.05mol/l c(nascn)=0.1008mol/l in h2o c10-hsl,ahl信号分子 c14-c17混标, 42% cl, 100 μg/ml in cyclohexane c14:98% c16:54%-62%;c18:38%-44% c16:65-75%, c18:16-26% c16:98% c18:80-90% c18≥90% c=0.100mg/ml u=3%, 溶剂: 甲醇 ca 6.6-7.4% ca. 10% in isopropyl ether,mkseal ca. 10% weight in thf ca. 15% in water ca. 45% in water ca. 50% in water ca. 8.5% in methanol cabot vulcan xc-72 carbon (anhydrous) 46.0 - 48.8 % carbon 28.8 - 30.9 % carbon 44%-45% carbon 47.4%-49.3% carbon 58.6%-74.6% carbon 64.4 - 71.2% carbon 64.7 - 70.2% carbon:43.0 - 46.1 % cd ≥75% cis and trans,94% cis and trans,98% cis and trans,99% co 43.0 - 47.0 % co 7.8 - 8.2%,溶剂:40%-80%的石脑油 co 9%-10% co ≥20% co ≥22% co ≥31% conductivity 10-50 s/cm (pressed pellet) contains >100 ppm mehq as inhibitor, 97% contains 150 ppm bht as inhibitor, 98% contains 50% dicyclohexyl phthalate as stabilizer contains 700 ppm monomethyl ether hydroquinone as inhibitor contains 75-125 ppm monomethyl ether hydroquinone as inhibitor, >90% contains ≤2% bht as stabilizer, 98% contains ≤6000 ppm hydroquinone as stabilizer content(1-mcp): ≥4.0%,carrier cyclodextrin co≥12% co≥25% cp(中国药典) cr 24% crude source of omega-3 fatty acids crystalline cu>36% cu:8% cu:9.5%-10.9%,200目 cu≥8% d,98% + bht d,99%,85 wt.% in d2o d,99%,无水级 d,99.5%+ dcl 35% w/w solution in d2o d,99.5%+0.05% v/v tms d,99.5%, 含0.03 % (v/v) tms d,99.5%,90% in d2o d,99.5%,98% in d2o d,99.50% d,99.6% d,99.8% (0.05% v/v tms) d,≥98% d-glu:d-lys (6:4), mol wt 20,000-50,000 d.98% d.99.7% +0.03%tms d.99.9% +0.03%tms d.99.9% +1%tms d.99.9% d40 d50: 3~5μm d50~300nm d60 d80 diam. 3 mm, ≥99.95% metals basis diam. 3mm×4mm, 99.99% metals basis diameter 2.0 - 2.9μm,2.5% w/v,正电位 doped, conductivity 0.5-1.5 s/cm (pressed pellet, typical), extent of labeling: ~5 wt. % loading, coated on titanium dioxide doped, conductivity 30 s/cm (bulk), extent of labeling: 20 wt. % loading, composite with carbon black dye content 30 % dye content 75 % dye content 80 % dye content 85% dye content 95 % dye content 95 % dye content 97 % dye content 97 % dye content ≥95 % dye content, 80% dye content,90% dye content,~90% dye content~95 % e-1006,羟值:132±5 e-1306,羟值:120±5 e-1310,羟值:88±5 e-1340,羟值:28±5 each 100mm,4×,过滤及高温双重灭菌 each 10mm,过滤及高温双重灭菌 each 2.5/5mm,过滤及高温双重灭菌 each 2.5mm,过滤及高温双重灭菌 each 25mm,过滤及高温双重灭菌 earle's平衡盐,,l-谷氨酰胺,酚红,过滤除菌,细胞培养适用 earle's平衡盐,l-谷氨酰胺,酚红,非必需氨基酸,粉末,细胞培养适用 earle's平衡盐,l-谷氨酰胺,酚红,非必需氨基酸,过滤除菌,细胞培养适用 earle's平衡盐,中低糖,低碳酸氢钠,hepes,l-谷氨酰胺,酚红,无非必需氨基酸,过滤除菌,细胞培养适用 earle's平衡盐,中低糖,低碳酸氢钠,hepes,l-谷氨酰胺,酚红,过滤除菌,细胞培养适用 earle's平衡盐,中低糖,低碳酸氢钠,低hepes,l-谷氨酰胺,无酚红,过滤除菌,细胞培养适用 earle's平衡盐,中低糖,低碳酸氢钠,低hepes,无l-谷氨酰胺,酚红,无非必需氨基酸,过滤除菌,细胞培养适用 earle's平衡盐,中低糖,低碳酸氢钠,低hepes,无l-谷氨酰胺,酚红,过滤除菌,细胞培养适用 earle's平衡盐,低糖,低碳酸氢钠,hepes,l-谷氨酰胺,酚红,无非必需氨基酸,过滤除菌,细胞培养适用 earle's平衡盐,低糖,低碳酸氢钠,低hepes,l-谷氨酰胺,酚红,无非必需氨基酸,过滤除菌,细胞培养适用 earle's平衡盐,低糖,低碳酸氢钠,低hepes,l-谷氨酰胺,酚红,非必需氨基酸,过滤除菌,细胞培养适用 earle's平衡盐,超高糖,碳酸氢钠,低hepes,无l-谷氨酰胺,酚红,非必需氨基酸,过滤除菌,细胞培养适用 eb 清除剂,过滤除菌 eb electronic grade, 99.999% trace metals basis electronic grade ep,bp,jp,usp级 epoxy value:0.28-0.35 eq/100g epoxy value:0.43 epoxy value:0.54-0.59/100g epoxy value:0.5 epoxy value:0.65~0.70 epoxy value~4 ep级,平均粒径:0.1-0.3μm ester terminated, 0.55-0.75 dl/g ester terminated, lactide: caprolactone 70:30 ester terminated, lactide:glycolide 82:18, viscosity:1.7-2.6 dl/g ester terminated, lactide:glycolide 85:15, viscosity:2.5-3.5 dl/g ester terminated, lactide:glycolide 85:15, viscosity:5.0-7.0 dl/g ester terminated,lactide:glycolide 50:50,mw 24000-38000 ester terminated,lactide:glycolide 50:50,mw 38000-54000 ester terminated,lactide:glycolide 50:50,mw 50000-75000 ester terminated,lactide:glycolide 50:50,mw 7000-17000 ester terminated,lactide:glycolide 75:25,mw 76000-115000 ester terminated,lactide:glycolide 85:15,mw 190000-240000 ester terminated,mw 50000-75000 ester terminated,mw 54000-69000 esterterminated,l-lactide:d,l-lactide70:30 extent of labeling: 12-15 mol per mol β-cd extent of labeling: 30 wt. % loading, matrix activated carbon support fcc fe ~20 % fe>26%, powder fe>30.5% fe, 24% fe,60.0 - 72.0 % fe2+(dry basis): 32%~36% fe2o3≤10ppm fe2o3≥85% fe: 19%-24% fe: 20% fe: 24%-30% fe≥21% fe≥50% fg fmp(显微镜用) for analysis emsure® for analysis for benchmarking research, 99.5% for chiral derivatization,≥98.5% for electrochemistry, ≥98.5% (qnmr) for enzymic, spectrophotometric determination of h2o2, ≥98% for enzymic, spectrophotometric determination for fluorescence,≥98.0% for fluorescence for gc, ≥95% for gc-hs,≥99.9%(gc) for hplc, 50% in water, 49-51% (t) for hplc, ≥98.5% for hplc, ≥99.0% for hplc,>99.8% (gc) for hplc,0.1% (v/v) in h2o for hplc,0.25 m in h2o for hplc,≥95% for hplc,≥99.0%(t) for hplc,≥99.5% for hplc,≥99.9% for hplc for ion-pair chromatography,98% for ir-spectroscopy for lc-ms, ≥99.8% for lc-ms,≥99.0% for lc-ms for microscopy(bact., bot., hist.), ~1 mol/mol water for molecular biology,≥99% for nmr spectroscopy,≥99.9%(gc) for plant cell culture,98%(hplc) for plant cell culture,≥96% for plant cell culture,≥99% for spectrophotometric det. (of b, pb) for spectrophotometric det. of ag, fe, ru, ≥98.5% for spectrophotometric det. of amino sugars, ≥99% for spectrophotometric det. of au, no2-, ce(iv), for the detection of au, co, cu, scn-, v, ≥97% for spectrophotometric det. of au,tl(iii),w, ≥99% for spectrophotometric det. of co(ii), cu(ii), ≥90% for spectrophotometric det. of cu, zn for spectrophotometric det. of fe in serum, ≥99% for spectrophotometric det. of fe(iii), ≥98.5% for spectrophotometric det. of fe, ≥97% for spectrophotometric det. of isonicotic hydrazide, amines and amino acids, ≥98%(t) for spectrophotometric det. of metal ions, ≥99% for spectrophotometric det. of mo, sn, w, and also ag and re, ≥97% for spectrophotometric det. of nitrate and nitrite, ≥99% for spectrophotometric det. of nitrate and perchlorate, ≥97% for spectrophotometric det. of proline and thiophene, ≥99% for spectrophotometric det. of s2-,cl2, ≥99% for spectrophotometric det. of si, ≥95% for spectrophotometric det. of so42-, s2-, ≥97% for spectrophotometric det. of transition metals, ≥95% for spectrophotometric det. of zn(ii), cu(ii), fe(ii), co(ii), h2o2, ≥95% for spectrophotometric det., bi,71-74% bi basis (kt) for spectrophotometric det., ≥99% for spectrophotometric for synthesis, mixture of isomers for synthesis for the spectrophotometric det. of bi, co, ≥97% for the spectrophotometric det. of fe, ≥98%(hplc) for the spectrophotometric determination of fe, pd, v, ≥99% for tlc derivatization, for spectrophotometric det. of phosphorus-containing pesticides, ≥98% for use in transformations, x-ray crystallography and nmr formicroscopy free macrogoly, 25-40% free, 90% free, 98% glu:tyr (4:1), mol wt 20,000-50,000 glu:tyr (4:1), mol wt 5,000-20,000 grade 135 granular hanks's平衡盐,中低糖,低碳酸氢钠,低hepes,l-谷氨酰胺,酚红,无非必需氨基酸,过滤除菌,细胞培养适用 hcl salt,98% hepes, l-谷氨酰胺,酚红,过滤除菌,细胞培养适用 hf 65% w/w hlb值:13-14,ph值:5.0-7.0 hlb值:16~17 hp-55s,邻苯二甲酰含量24% hplc hpo3≥38% hpo3≥43% hydroxyl value 75-95mgkoh/g in 2mm dmso in dmso in h2o indicator inherent viscosity: 0.3-2.5dl/g ir 48.0 - 55.0 % ir 50-54% ir:73% isomeric mixture kaighn改良,l-谷氨酰胺,酚红,过滤除菌,细胞培养适用 l-谷氨酰胺,无酚红,无核苷,脱氧核苷,过滤除菌,细胞培养适用 l-谷氨酰胺,酚红,无hepes l-谷氨酰胺,酚红,无核苷和脱氧核苷,过滤除菌,细胞培养适用 l-谷氨酰胺,酚红,核苷,脱氧核苷,过滤除菌,细胞培养适用 l-谷氨酰胺,酚红,过滤除菌,细胞培养适用 lactide:glycolide(50:50),mol wt 30000-60000 lactide:glycolide(65:35),mw 40000-75000 lactide:glycolide(75:25),mol wt 66000-107000 large,粒径: 900-1000 nm,表面积:550m2/g leucine aminopeptidase inhibitor m.w 1000 m.w 11000-12000 m.w 2000 m.w 3000 m.w 7000-7500 m.w :30000-100000 m.w. 10000 m.w. 2000,不含酯基 m.w. 28000 m.w. 8000 m.w.10000 m.w.1000 m.w.1500 m.w.175,000 m.w.20000 m.w.5000 mass spec std may contain up to 10% ethanol,85% may contain ≤10% dmf medium,粒径: 400-450 nm, 表面积: 400m2/g mgo:45% mix tbc as stabilizer mix.80% mixed,50% in propylene carbonat mixture of cmi and mi,1.50-1.75% in water,ph:2.0-4.0 mixture of cmi and mi,2.5-3.5% in water,ph:2.5-5.0 mixture of isomers, stabilized with mehq mixture of isomers,90% mixture of oligomers,98% mixture of perfluoroadamantane adn perfluoro(1-methyladamantane) mixture, 粘度:1500-1800cps mixtures of cob&co2b mn >44% mn 2,000 mn 30% mn 40,000 mn 4000,50%溶液 mn 500 mn 520-550 mn 6,000 mn 6000 mn 90k-250k mn ca. 6% mn ~300,000 mn ~492 (n≈6) mn ≥71.0%,bet surface area 5~7 m2/g mn: 2500-3000, viscosity: 32-42cps, contains <100 ppm mehq as inhibitor mn~25000 mn~266 mn~3000 mn≥15.1% mn≥4.0%水溶液 mo 56.5% mo: 45% --63% moistened with water, 10% pd basis (based on dry substance) moistenedwithwater,5%pd,unreduced mol wt >30,000 mol wt 15,000-20,000 da mol wt 150,000-350,000 mol wt 15000-30000 mol wt 2,000-11,000 mol wt 5000 molwt 1000-10000 mo≥45 % mo≥50 % mo≥61.1 % mpeg5k-b-plkc10,average mw 6600 mv 2000-3000 mv 2000-5000 mw 10,000-50,000 by gpc mw 1000 da mw 1000, 含0.5-1 wt% bht稳定剂 mw 10000 da mw 130000-200000 mw 2000 mw 3000 mw 5000 da mw 9500-10500 mw ~1000 mw ~120,000, mn ~50,000 mw ~315 mw ~480 mw ~590 mw ~60,000 mw-25000 mw10000 mw1000 mw20000 mw400 mw520,000,mn150,000(typical),acrylamide~80wt.% mw6000 mw:1000 mw:2000 mw:273,油溶性 mw:317,油溶性 mw:4000 mw:405,溶于水和有机溶剂 mw:5000 mw:625,水溶性 mw:845,水溶性 mw<100kda mw<5000 mw=2500~2700 mw=4000 mw~1000 mw~48,000, mn~15,000 n 8% n>32.5 %, d50=5.0μm n=2 na2o:18.7-23.4% nanoparticles, dispersion, in h2o nanopowder, <100 nm particle size (laser psa), 99.8% trace metals basis nanopowder, <100 nm particle size (bet), >97% trace metals basis nanopowder, <200 nm particle size (bet), >99% nanopowder, 21 nm primary particle size (tem) , ≥99.5% trace metals basis nature, ≥98% nco content ~30%, 粘度~200mpa·s(25℃) nd: 28-34% ni 61% ni:47% ni:8% ni≥180g/l nominally 75% in ethanol n~10,average mn ~711 n~100,average mn ~4670 n~20 n≈100 n≈15 n≈18 n≈20 n≈40 os 38.7% os 38.7%最低 os 42.5% os 83% oxirane oxygen:7.8-8.5 (mixture of isomers) p2o5: 30-42% p2o5:60-70% p2o5≥30% p2o5≥60% palladium(pd)≥19.6% particle size:3 mm,mw ~110,000 particle size:3 mm,mw ~80,000 pb ≥82% pb:59.35~61.36% pc50 pc60 pc70 pc80 pc90 pd 13.0-15.0% pd 14.2% pd 14.5% pd 15.2% pd 17.1% pd 18% pd 18.09 wt. % in nitric acid pd 20.8% pd 21.5% pd 23.9% pd 26.2% pd 27.7% pd 34.9% pd 37.3% pd 4-5% w/w (cont. pd) pd 40 % pd 41.0% pd 44.8% pd 51.2%-53.9% pd 58.2% pd 59-60% pd ~40.0% pd ≥20.5% pd ≥27.5% pd ≥32.6% pd ≥36.5% pd ≥39.0% pd ≥44% pd ≥50% pd ≥85% pd,27.4% peg average mn 2,000 peg2000 peg400ml peg400mo peg600mo peh-15 peh-3 peh-6 pestanal®, analytical standard ph 6.8 ph 8.8 ph eur ph. eur.,bp,usp,99-100.5% ph. eur. ph5.0 ph6.0 ph6.7,过滤除菌 ph7.0,2x ph7.0-7.5,earle's平衡盐,低糖,低碳酸氢钠,hepes,l-谷氨酰胺,酚红,过滤除菌,细胞培养适用 ph7.0-7.5,earle's平衡盐,低糖,低碳酸氢钠,低hepes,l-谷氨酰胺,酚红,过滤除菌,细胞培养适用 ph7.0-7.5,earle's平衡盐,低糖,低碳酸氢钠,低hepes,l-谷氨酰胺,酚红,非必需氨基酸,过滤除菌,细胞培养适用 ph7.0-7.5,earle's平衡盐,低糖,低碳酸氢钠,低hepes,无l-谷氨酰胺,酚红,过滤除菌,细胞培养适用 ph7.0-7.5,earle's平衡盐,低糖,碳酸氢钠,hepes,l-丙氨酰-谷氨酰胺,酚红,非必需氨基酸,过滤除菌,细胞培养适用 ph7.0-7.5,earle's平衡盐,超高糖,碳酸氢钠,低hepes,无l-丙氨酰-谷氨酰胺,酚红,过滤除菌,细胞培养适用 ph7.0-7.5,hanks's平衡盐,低糖,低碳酸氢钠,低hepes,l-谷氨酰胺,酚红,过滤除菌,细胞培养适用 ph7.0-7.5,中低糖,低碳酸氢钠,l-丙氨酰-谷氨酰胺,酚红,过滤除菌,细胞培养适用 ph7.0-7.5,低糖,丙酮酸钠,碳酸氢钠,,高l-谷氨酰胺,酚红,过滤除菌,细胞培养适用 ph7.0-7.5,低糖,丙酮酸钠,碳酸氢钠,高hepes,高l-谷氨酰胺,酚红,过滤除菌,细胞培养适用 ph7.0-7.5,无糖,丙酮酸钠,酚红,l-丙氨酰-谷氨酰胺,过滤除菌,细胞培养适用 ph7.0-7.5,高糖,丙酮酸钠,碳酸氢钠,无hepes,高l-谷氨酰胺,酚红,过滤除菌,细胞培养适用 ph7.0-7.5,高糖,丙酮酸钠,碳酸氢钠,高hepes,高l-谷氨酰胺,酚红,过滤除菌,细胞培养适用 ph7.0-7.5,高糖,丙酮酸钠,碳酸氢钠,高l-谷氨酰胺,无酚红,过滤除菌,细胞培养适用 ph7.0-7.5,高糖,无丙酮酸钠,低碳酸氢钠,l-谷氨酰胺,酚红,过滤除菌,细胞培养适用 ph7.0-7.5,高糖,碳酸氢钠,hepes,l-丙氨酰-谷氨酰胺,酚红,过滤除菌,细胞培养适用 ph7.2±0.2,无葡萄糖,无碳酸氢钠,,l-丙氨酰-谷氨酰胺,酚红,过滤除菌,细胞培养适用 ph7.2±0.2,盐酸吡哆醇,碳酸氢钠,hepes,l-谷氨酰胺,酚红,过滤除菌,细胞培养适用 ph7.2±0.2,盐酸吡哆醇,碳酸氢钠,低hepes,l-谷氨酰胺,无酚红,过滤除菌,细胞培养适用 ph7.2±0.2,盐酸吡哆醇,碳酸氢钠,低hepes,无l-谷氨酰胺,酚红,过滤除菌,细胞培养适用 ph7.2,2x ph7.2,过滤除菌,无菌无酶,细胞培养适用 ph7.4,2x ph7.4 ph8.0,过滤除菌 ph:11.0(blue)-13.0(red) ph:6.8(yellow)--8.2(red) ph:8.0(colorless)-10.0(red) potency: ≥6.2 iu/mg powder, <5 μm powder, 60 mesh, 99% powder, 99.5% metals basis powder,1-2 μm,99% powder,acs,≥98.0% ppg-2000do practical grade, ≥85% (titration), powder predominantly trans 95% proclin 8020 防腐剂 protease substrate pt >99.9% metals basis, ≤20 μm pt 10% pt 15% pt 15.2% pt 20% pt 34.0% pt 43.7% pt 5% pt 50.5% pt 51.6-52.6% pt 59.0% pt 59.7% pt 65% pt basis ≥73% pt ≥24.2% pt ≥57% pt ≥61.1% pt ≥64.5% pt, 80-85% pt, ~2% 二甲苯溶液 pt,18.02% pt:54-56% pt:≥58% pt≥18% pt≥43.4% pure purified by redistillation,≥99.5% puriss. p.a., acs reagent, reag. iso, reag. ph. eur., ≥99.5% puriss., meets analytical specification of ph. eur., 80-82.5% bi basis (按干物质计算) puriss., ≥99% puriss., ≥99.0%(gc) purum, ≥98.0% (tlc) purum,≥98.0%(hplc),粉末,红棕色 ratiocarbondioxide/dimethylamine<2:1 re: 80g/l reagent grade, 40.0% reagent grade, 97% reagent grade, co 43.0 - 47.0 % reagent grade,98.0% red(hematite)(99.8%-fe) regioregular(80-90%), mw=54000 (typical) research grade, 99 atom % 13c rh 11.2% rh 17.1% rh 18.5 - 21.3% rh 21% rh 21.3% rh 25.3% rh 27.5% rh 30% min rh 38.5-42.5% rh ≥23.3% rh ≥8.7% rh: 43.0%-46.6% rh≥25.0% rna染色,过滤除菌 roplatinum(iv), pt 52.6% ru 1.5% w/v ru 12.3% ru 23.0% min ru 29% min ru 35.8-36.1% ru 40-45% ru 5% ru content 45-55% ru: 5%,avg=200 nm ru>44% s: 13.5-15.5% sio2,44-47% sn 56%±0.5% sn 56.5%±0.5% sn>18.8% sn≥17% sn≥42% sn≥46% sodium salt, ≥90% solid content 99% solid solution complete solution incomplete spectrophotometric grade, 99% spectrophotometric grade spray reagent, 10% in ethanol stabilized with bht 1 % w/w standard for gc, >99.5% standard for gc, 99% standard for gc, 99.9% standard for gc, ≥99.5% standard for gc,≥99.5% statsafe 6000 strength 200% strength 95-105% strength ≥290% sublimed,>99% suitable for fluorescence, ≥75% (hplc) suitable for plant cell culture, bioreagent, liquid surface area 250 m2/g surface area 800-1075, pore volume 0.31-0.41 su synthetic, 98% t-98% taqman探针 tech grade, 95% tech. 80% tech. 90%(异构体的混合物) tech.85% tech.90% technical grade, 70% technical grade, 75% technical grade, 80 % technical grade, 80% technical grade, 85 % technical grade, ≥90% technical grade,90% technical, 0.5-1.5 m in diethylene glycol diethyl ether technical, mixture of isomers(mainly the α-isomer), ≥90%(gc) technical, ~1.6% active oxygen basis technical, ≥80% technical, ≥84% technical, ≥85% (gc) ,含铜屑稳定剂 technical, ≥90 % technical, ≥90% (gc,mixture of isomers) technical, ≥90% (t) technical, ≥90%(gc) technical,75% technical,90%,ee 99% technical,90% technical,≥85 % technical,≥85% technical,≥90 % sum of enantiomers technical,≥90%(gc) technical,≥90% tested according to ph. eur. tfa salt, ≥94% the jnk3 inhibitor xii, sr-3576, also referenced under cas 1164153-22-3, controls the biological activity of jnk3. this small molecule/inhibitor is primarily used for phosphorylation & dephosphorylation applications. ticl3:76.0-78.5% total omega3 ≥50% trizol ulc-ms,0.04% in water ulc-ms,0.1% in acetonitrile ulc-ms,0.3% in water ulc-ms,99% ulc-ms ultra dry ultra pure,≥99.0% umicore usp,ep usp,ph eur usp级,cross-linked,粉末 v/v viscosity 1,300-2,200 cp (25 °c)(lit.) viscosity 1.4dl/g viscosity 12000-17000 mpa.s viscosity 150-300 cst(25 °c) viscosity 32000-37000 mpa.s viscosity 400-600 cst(25 °c) viscosity 45000-55000 mpa.s viscosity 5-8 cst(25 °c) viscosity 600-1000 cst(25 °c) viscosity 70-75 cst (25 °c) viscosity 70000-80000 mpa.s viscosity 80-150 cst (25 °c) viscosity 800-1200 cst (25 °c) viscosity 800-1400 cst(25 °c) viscosity ~150 mpa.s, neat(25 °c) viscosity,1.5-2.2 dl/g viscosity:800-5000 mpa.s v≥50% (mixture of ⅲ&ⅴ) w(k2cro4)=20g/l w(k2cro4)=40g/l white granular, viscosity:0.8-0.83 dl/g with indicator, 10-20 mesh wo3≥85% zero2, ≥98.0% zn 10-12%,200目 zn 10-12%,325目 zn 10-12% zn: 15% zn: 18% zn: 19%-22% zno≥61%, cro3≥19% zn≥ 35.5% zn≥18% zr, 40.4-43.3% gravimetric zro2+hfo2 ≥33.0% zro2≥20% ~0.1 m in h2o ~0.5 m in tert-butyl methyl ether, ≥97.0% (hplc) ~0.5 m in 2-methyltetrahydrofuran, ≥95.0% ~0.8 m in hexane ~10% (~1.3 m), for gc derivatization,mkseal ~10% in h2o ~100 μg/ml in ethanol, ≥97% ~100mm in ipa ~13% in water ~15 wt. % in dilute sulfuric acid,99.99% trace metals basis ~17% aromatics basis ~2 m in 1-methyl-2-pyrrolidinone ~20% in h2o ~20 wt. % in d2o, 98 atom % d ~200 mesh, 99% ~25% in h2o ~25% in methanol ~25% solids in h2o ~3 n in h2o, 98 atom % 15n ~30% in h2o ~40% in h2o ~40% in methanol ~5% in h2o ~50% in h2o ~50% in water ~65% in h2o ~65%水溶液 ~70% alpha-thujone basis, ~10% beta-thujone basis ~70% in h2o ~75%(al) ~80% in h2o, for spectrophotometric det. of palladium, iron, uranium(vi), molybdates and nitrites ~85% (kt) ~95% (tlc) α相,99.9% metals basis,100nm α相,99.9% metals basis,200nm α相,99.9% metals basis β-form,98% β-phase,95%,1-3μm β型, 99.9% metals basis β相, 99.9% metals basis, d50=500nm β相,99.9% metals basis,200nm β相,99.9% metals basis ρ(naoh)=200g/l,适用于hj636-2012 φ4mm-6mm, 干燥剂用 φ5mm 高2.5mm 圆柱体,ge≥99.999% −60 mesh ≤10% water ≤100nm, 99% metals basis ≤100nm, 99.5% metals basis ≤20mm, 99.9% (reo) ≤3% water ≤500 nm, 99.9% metals basis ≤65μm,分散在水中 ≥ 98 % hplc ≥ 98 % ≥ 98% ≥ 99.0 % ≥0.15 units/mg dry weight ≥0.2 units/mg ≥10 units/μl ≥100,000-500,000 units/ml ≥18% na (as na2o) basis, ≥60% si (as sio2) basis, powder ≥2 units/mg dry weight ≥20 units/mg dry weight ≥20.0% in thf ≥200 iu/mg ≥200 mesh particle size ≥200 units/mg dry weight ≥29% ti (as tio2) basis, technical ≥300 units/g dry weight ≥300,000 units/mg protein ≥35% ≥37% ru basis ≥4 units/mg protein ≥40% zro2 basis ≥40%(gc) ≥40%,含菜油甾醇乙酸酯 ≥40.0% ≥400 mesh particle size, ≥97.5% ≥400 u/mg ≥400u/mg ≥45%(e) ≥45% ≥5 units/μl ≥50 units/mg dry weight ≥50%, contains ≤50% acetonitrile ≥50.0% pt basis ≥52% in water ≥52% ≥55%(gc) ≥55%(hplc) ≥55% ≥57% zno basis ≥57% ≥6,000 units/mg protein ≥60% (hplc) ≥62%(gc), 顺反混合物, 含≤38%的3-氯-1-丁烯 ≥64% ≥65%(gc) ≥65%(hplc) ≥65%,含3-磺酸邻苯二甲酸盐 ≥65%,含有异构体 ≥65.0%(gc),含2000ppm生育酚稳定剂 ≥69% ≥70% (gc) ≥70%(t) ≥70%,α-和β-位的混和物 ≥70%,含苯酚 ≥70%,块状 ≥72% (elsd) ≥75%,单钠盐和二钠盐的混合物 ≥75%,含5-甲基-4-己烯-2-酮 ≥75%,顺反异构体混合物 ≥78%(t) ≥78% ≥80% (ce) ≥80% (gc); 80% ≥80% (hplc) ≥80%(gc), 异构体混合物 ≥80%(hplc) ≥80%(qnmr) ≥80%,最多含10%的乙醇 ≥80.0% (hplc at 254 nm) ≥80.0% ≥83% ≥84% ≥85% (gc) ≥85% (hplc) ≥85% (page),不含钙 ≥85%(gc)(n) ≥85%(hplc)(t) ≥85%(l-香茅醇和香叶醇的混合物) ≥85%(qnmr) ≥85%(t)(hplc) ≥85%, contains mehq as stabilizer ≥85%,nmr ≥85%,含水约30% ≥85%,外消旋和内消旋混和物 ≥85%,用于荧光分析 ≥85.0%(gc) ≥85.0%(hplc) ≥87% ≥88% (uv-vis) ≥88%,contain inhibitor ≥88%,顺反异构体混和物 ≥88% ≥89%(gc) ≥90% (gc), mixture of isomers ≥90% (hpce) ≥90% (hplc),用于荧光分析 ≥90% (t) ≥90% (vpcc) ≥90%(lc-ms) ≥90%(tlc) ≥90%, 以干物质计 ≥90%, 含有dkss, 混合物 ≥90%, 含稳定剂铜屑 ≥90%,gc ≥90%,n=9 ≥90%,苏-和赤-的混和物 ≥90%,顺反异构体混合物 ≥90.0 % ≥90.0% (hplc) ≥90.0%(hplc)(qnmr) ≥90.0%,顺反异构体混和物 ≥900ug/mg,dry basis,de-nacl and residual solvents ≥91%, 浊点61°c ≥91%,浊点90℃ ≥91% ≥92%(lc) ≥92%, 500 ppm bht as stabilizer ≥92%,80-150目,中性 ≥92%,80-150目,碱性 ≥92%,80-150目,酸性 ≥92%,mw<10kda ≥92.5% ≥93% (gc) ≥93% (hplc) ≥93%(hplc),用于荧光分析 ≥93%,异构体的混和物 ≥93.0% (gc) ≥93.0% (qnmr) ≥93.0%(qnmr) ≥94% (oligomer purity) ≥94%,顺反异构体混合物 ≥94.0 %(gc) ≥94.0% (hplc) ≥94.0% (tlc); 94% ≥94.0%(gc) ≥95 atom % d, ≥99%(cp), contains 35% tris-d5 as stabilizer ≥95 atom % d ≥95% (lc/ms-elsd) ≥95% (mixture of isomers) ≥95% (nmr) ≥95% (oligomer purity) ≥95% (tlc), ~1 mg/ml in methanol: nh4oh (7:3) ≥95% (uv) ≥95% ,异构体混合物 ≥95% h4p2o7 basis ≥95%(ce) ≥95%(gc&t) ≥95%(h-nmr) ≥95%(hg) ≥95%(hpce) ≥95%(hplc), 50mg/ml in water ≥95%(lc-ms) ≥95%(nt) ≥95%(qnmr) ≥95%(stabilized with tbc) ≥95%(sum of isomers) ≥95%(t&qnmr) ≥95%(t),非对映异构体混合物 ≥95%(tbc作为稳定剂) ≥95%(titration) ≥95%(对映体总量, gc) ≥95%, 10 mg/ml in ethanol ≥95%, 3500-5000目 ≥95%, 400-800目 ≥95%, 50%(w/v) in h2o ≥95%, a4/(a3+a4)≥0.8 ≥95%, ee99% ≥95%, mixture of isomers ≥95%, stabilized with mehq ≥95%, stabilized, fg ≥95%, ~1 m in h2o ≥95%, 含0.1%tbc稳定剂 ≥95%, 异构体混合物(主要以反式形式存在) ≥95%, 邻位~20%, 对位~80% ≥95%, 邻位~30%, 对位~70% ≥95%, 邻位~40%, 对位~60% ≥95%,2000目 ≥95%,[(5e,9e,13e)-和(5z,9e,13e)异构体混合物] ≥95%,mixture of isomers ≥95%,≥250g/l in water ≥95%,≥99% e.e. ≥95%,异构体的混和物 ≥95%,混合物 ≥95%,立体异构体混合物 ≥95%; 100%ee 95% (isomer mixture) 98% +(mix) ≥95.0 % ≥95.0% (h-nmr) ≥95.0% (nt) ≥95.0% (qnmr) ≥95.0%(gc), 含3-5%水作稳定剂 ≥95.0%(gc),mixture of isomers ≥95.0%(gc),含稳定剂氢氧化钾 ≥95.0%(nmr) ≥95.0%,mixture of isomers ≥96%(gc&t) ≥96%(hplc)(t) ≥96%(lc&n) ≥96%, isotopic purity: ≥95% ≥96%, mixture ≥96%, n≤0.0005% ≥96%, rel-(1r-2e-pr)-equatorial ≥96%, 粒径: 10 μm ≥96%,sum of enantiomers ≥96%,含稳定剂hq ≥96%,立体异构体混合物 ≥96%,顺反混合物 ≥96.0% (gc) ≥96.0% (hplc) ≥96.0% (nt) ≥96.0% (reversed phase hplc) ≥96.0%(gc) ≥96.0%(t) ≥96.5% (hplc); 96.5-103.5% (at); 97% ≥96.5% (hplc); 97% ≥97 atom % d, ≥99% (cp), contains hydroquinone as stabilizer ≥97% (chn) ≥97% (enzymatic) ≥97% (hpce) ≥97% (hplc), white powder ≥97% (nmr) ≥97% (t) ≥97% (tlc) ≥97% ,≥99% ee ≥97%(at) ≥97%(enaymatic) ≥97%(enzymatic) ≥97%(gc&n) ≥97%(gc), stabilized with 2.5% k2co3 ≥97%(gc), 含稳定剂koh ≥97%(gc), 异构体混合物 ≥97%(gc/ch) ≥97%(hpce) ≥97%(hplc)(n) ≥97%(hplc)(qnmr) ≥97%(mixture of isomers) ≥97%(pure) ≥97%(qnmr) ≥97%(t), hplc标记用 ≥97%(ti) ≥97%(w) ≥97%(铜片作为稳定剂) ≥97%, 1 mg/ml in hexane containing 1% triethylamine ≥97%, 100 μg/ml in hexane containing 1% triethylamine ≥97%, 100mm in water ≥97%, 2 mg/ml in methanol ≥97%, fg ≥97%, iii类, 冻干粉, 来源于鸡蛋黄 ≥97%, stabilized with mehq ≥97%, 异构体混合物 ≥97%, 用于昆虫细胞培养 ≥97%,<50nm(bet),粉末 ≥97%,mixture of isomers ≥97%,n ≥97%,含有稳定剂吩噻嗪 ≥97%,含稳定剂tbc ≥97%,混和物 ≥97%,约含≤2%2-丁醇 ≥97%,非对映异构体混合物 ≥97%,顺反混合物 ≥97.0 % ≥97.0% (calc. based on dry substance, nt) ≥97.0%(gc)(qnmr) ≥97.0%(gc),contains mehq as stabilizer ≥97.0%(rt) ≥97.5% (gc); 98% ≥97.5% (hplc) ≥97.5%; 97.5-102.5% (titration); 98% ≥98 % hplc, solid ≥98 atom % 13c, ≥98%(cp) ≥98 atom % d(based on d7), ≥98%(cp) ≥98 atom % d, 96%(cp) ≥98 atom % d, ≥96%(cp) ≥98 atom % d, ≥99%(cp) ≥98 atom % d,98% ≥98 atom % 15n, ≥95%(cp) ≥98 atom %, ≥95%(cp) ≥98 atom %, ≥97%(cp) ≥98 atom% d ≥98% (enzymatic) ≥98% (gc), ~10 mg/ml in methanol ≥98% (gc) ≥98% (hplc), solid ≥98% (mixture of regioisomers) ≥98% (tlc); ≥98% (as erucic acid) ≥98% hplc, solid ≥98% metals basis ≥98% sum of enantiomers ≥98%(0.1%生育酚作为稳定剂) ≥98%(at) ≥98%(ch) ≥98%(gc)(n) ≥98%(gc)(t ≥98%(gc), 顺反异构体混和物 ≥98%(gc), 异构体混合物 ≥98%(gc), 顺反异构体混合物 ≥98%(gc),含稳定剂bht ≥98%(gc),含稳定剂mehq ≥98%(gc),含稳定剂tbc ≥98%(hplc)(t ≥98%(hplc), oil ≥98%(hplc), solid ≥98%(hplc), 用于气相色谱/质谱的环状硼化剂 ≥98%(hplc), 用于生化研究 ≥98%(hplc),10mg/ml in acetonitrile ≥98%(lc&w) ≥98%(mixture of isomers) ≥98%(n&t) ≥98%(s,s)-me-bpe-rh ≥98%(sum of enantiomers) ≥98%(sum of enantiomers, gc) ≥98%(t&n) ≥98%(t)(hplc), 用于生化研究 ≥98%(t), 用于生化研究 ≥98%(w) ≥98%(铜片作为稳定剂) ≥98%, 1mg/ml in dcm solution ≥98%, 99%e.e. ≥98%, contains ca. 10% triuret ≥98%, hplc ≥98%, hplc标记用 ≥98%, hplc用 ≥98%, mixtures ≥98%, ni:22.5% ≥98%, powder, ~180 mesh ≥98%, powder, ~325 mesh ≥98%, powder, ~80 mesh ≥98%, stabilized with n-nitrosodiisopropanolamine ≥98%, 含稳定剂mehq ≥98%, 四种异构体混合 ≥98%, 用于合成 ≥98%, 用于白蛋白结合实验 ≥98%, 粘度:2~8 mpa.s(25℃), 总氯: ≤3000 mg/kg ≥98%, 顺反混合异构 ≥98%,1h-,2h-异构体混合物 ≥98%,200 ppm monomethyl ether hydroquinone as inhibitor ≥98%,hplc ≥98%,kosher ≥98%,particle ≥98%,pellets(anhydrous) ≥98%,ru>15.75% ≥98%,water≤1% ≥98%,含pth-别异亮氨酸 ≥98%,含稳定剂koh ≥98%,含稳定剂丁基硫醇 ≥98%,含稳定剂吩噻嗪 ≥98%,外消旋和内消旋混合物 ≥98%,生物技术级 ≥98%,白色 ≥98%,细胞培养级 ≥98%棕榈酸基(gc) ≥98.0% (at) ≥98.0% (f) ≥98.0% (gc); ≥98.0% ≥98.0% (sum of enantiomers, gc) ≥98.0% (sum of isomers, hplc), ~2500 u/mg, stabilized with bht ≥98.0%(gc),inhibited with 100 ppm mehq ≥98.0%(gc),mixture of isomers ≥98.0%(qnmr) ≥98.0%(sum of enantiomers,hplc) ≥98.5% (nmr); 99% ≥98.5% (sum of enantiomers, gc); 99% ≥98.5%, 200-400nm ≥99 % hplc, powder ≥99 atom % d, ≥99% (cp) ≥99 atom % 13c, ≥99 atom % d, ≥99%(cp) ≥99 atom % 13c, ≥99% (cp) ≥99 atom %, ≥98%(cp) ≥99 atom% 13c, ≥99%(cp) ≥99 atom% d, ≥99% ≥99% (cp) ≥99% (sum of isomers) ≥99% metals basis ≥99% sum of enantiomers ≥99%(75% in ethyl acetate solution) ≥99%(gc)(t), 升华提纯 ≥99%(gc), 升华提纯 ≥99%(gc), 工业级, 浅黄色晶体 ≥99%(gc), 用于生化研究 ≥99%(hplc)(t) ≥99%(hplc), for γ-gt ≥99%(hplc), 升华提纯 ≥99%(hplc), 用于有机电子 ≥99%(n) ≥99%(t), 用于生化研究 ≥99%(t), 电解质用 ≥99%, 4-16mesh ≥99%, 5% w/v异丙醇溶液 ≥99%, acs reagent ≥99%, al2o3≥23.4% ≥99%, anhydrous ≥99%, crystalline ≥99%, for photovoltaic ≥99%, from myxococcus fulvus mx f85 ≥99%, in 100mg/ml ethanol ≥99%, ni:≥47% ≥99%, pd≥34.7% ≥99%, powder ≥99%, suitable for determination of sulfhydryl groups ≥99%, ≤500 ppm h2o ≥99%, ≥96%e.e. ≥99%, 同分异构体混合物 ≥99%, 无水级, 同分异构体混合物 ≥99%, 用于gc衍生化 ≥99%, 用于电化学分析 ≥99%, 用于药物研究 ≥99%, 用于邻甲酚的测定 ≥99%, 由ineos低聚物生产 ≥99%,300目 ≥99%,tcep,无酶 ≥99%,含50 - 100 ppm bht 稳定剂 ≥99%,异构体混合物 ≥99%,无氯 ≥99%,混合物 ≥99%,粒度:>10um,白色粉末 ≥99.0% (c) ≥99.0% (tlc) ≥99.0%(t)(hplc) ≥99.5 % ≥99.5 atom % d, ≥99% (cp) ≥99.5% (4 times purification) ≥99.5% (hplc) ≥99.5% (metals basis) ≥99.5% trace metals basis,20-80nm ≥99.5% trace metals basis,平均粒径25 nm,铁含量约16%-19%,湿粉 ≥99.5%(gc), gc用标准物质 ≥99.5%(lc) ≥99.5%(电子级) ≥99.5%, 1250目 ≥99.5%, 2500目 ≥99.5%, 5000目 ≥99.5%, 98 atom % d ≥99.5%, 用于有机电子 ≥99.5%, 粒径<15μm ≥99.5%,100nm ≥99.5%,99.999% metals basis ≥99.5%,gc ≥99.5%,适用于植物细胞培养 ≥99.5(gc),含0.01% koh稳定剂 ≥99.7%(gc) ≥99.9% (gc) ≥99.9% metals basis,pt ≥46.0% ≥99.9% trace metals basis, <5μm ≥99.9% trace metals basis,<250 nm particle size (tem), 粉末 ≥99.9%,100-150 kda ≥99.95% metals basis ≥99.95% ≥99.98% metals basis ≥99.99 % ≥99.99% metals basis,200目 ≥99.99% metals basis,99.7-100.5% dry basis ≥99.99% trace metals basis (不包括 molybdenum),粉末 ≥99.995% metals basis ≥99.995% trace metals basis ≥99.999% metals basis,粒径:1-6mm ≥99.999%(metals basis) ≥99.9995% metals basis 不含edta,不含酚红,过滤除菌,细胞培养适用 不含钙、镁离子,含酚红,过滤除菌,无菌无酶,细胞培养适用 不含钙、镁离子和酚红,,过滤除菌,无菌无酶,细胞培养适用 不含钙、镁离子和酚红,干粉,无菌无酶,细胞培养适用 丙酮酸钠, hepes l-谷氨酰胺,无α-硫代甘油和β-巯基乙醇,过滤除菌,细胞培养适用 丙酮酸钠,hepes,l-谷氨酰胺,无酚红,过滤除菌,细胞培养适用 丙酮酸钠,hepesl-谷氨酰胺,酚红,减血清,过滤除菌,细胞培养适用 丙酮酸钠,低碳酸氢钠,l-谷氨酰胺,酚红,非必需氨基酸,过滤除菌,细胞培养适用 丙酮酸钠,无l-谷氨酰胺,酚红,非必需氨基酸,过滤除菌,细胞培养适用 中丰度蛋白 中低糖,,低碳酸氢钠,低hepes,l-谷氨酰胺,无酚红,过滤除菌,细胞培养适用 中低糖,丙酮酸钠,低碳酸氢钠,无hepes,无l-谷氨酰胺,无酚红,甘氨酸,过滤除菌,细胞培养适用 中低糖,低碳酸氢钠,l-谷氨酰胺,酚红,非必需氨基酸,过滤除菌,细胞培养适用 中低糖,低碳酸氢钠,无hepes,l-谷氨酰胺,酚红,,过滤除菌,细胞培养适用 中低糖,低碳酸氢钠,无l-谷氨酰胺,酚红,过滤除菌,细胞培养适用 中低糖,无hepes,无丙酮酸钠,细菌蛋白胨,过滤除菌,细胞培养适用 中高糖,丙酮酸钠,低碳酸氢钠,l-谷氨酰胺,酚红,过滤除菌,细胞培养适用 中高糖,丙酮酸钠,低碳酸氢钠,高hepes,l-谷氨酰胺,酚红,过滤除菌,细胞培养适用 中高糖,无碳酸氢钠,无l-谷氨酰胺,酚红,干粉,细胞培养适用 丰度:10atom %;化学纯度:≥98.5% 丰度:10atom%;化学纯度:≥98% 丰度:5atom%;化学纯度:≥98.5% 丰度:60atom%;化学纯度:≥98.5% 丰度:98atom%;化学纯度:≥98% 丰度:98atom%;化学纯度:≥99% 丰度:99atom%;化学纯度:≥99% 乙烯含量: 50% 乙烯含量:53%;enb:4.0% 乙烯含量:55%;enb:9.5% 乙烯含量:60%;enb:7.8% 乙烯含量:68%;enb:5.7% 乙烯含量:69%;enb:4.5% 乙烯含量:72%;enb:4% 乙酰基含量13.5%, 丁酰基含量38% 乙酰基含量15.5%, 丁酰基含量35.5% 乙酰基含量2%, 丁酰基含量46% 乙酰基含量2%, 丁酰基含量52% 乙酰基含量2%,丁酰基含量53%,粘度0.01-0.03 乙酰基含量2.5%,混合乙酸含量45% 乙酰基含量3%, 丁酰基含量50% 乳化型, 99% 二氧化硅:38.0%~42.0% 二氧化硅含量:29%~31% 二聚,三聚和四聚甘油 ≥75 w/%,七聚甘油以上 ≤10w/% 亚胺当量(克当量): 130 ~ 150 亲水,比表面积:150 m2/g 亲油性, 99% 介孔,粒径:0.5μm, 孔径:2nm 介孔,粒径:1μm, 孔径:4nm 介孔,粒径:2μm, 孔径:4nm 介孔,粒径:3μm, 孔径:2nm 介质: h3po4(cp) 从紫胶所得 优级试剂 , 适用于分析, acs, iso, reag. ph eur 优级试剂 , 适用于分析, acs,reag. ph eur 优级试剂, 70% 优级试剂, 85% 优级试剂, 97% 优级试剂, 99.7% 优级试剂, ≥60% 优级试剂, ≥85 wt. % in h2o 优级试剂, ≥90% 优级试剂, ≥99% 优级试剂, ≥99.0%(gc),用于测定醛 优级试剂, ≥99.0%(t) 优级试剂, ≥99.5%(gc) 优级试剂, ≥99.5%(rt) 优级试剂, ≥99.8% 优级试剂,99.8% 低丰度蛋白 低内毒素,低脂肪酸,干粉,细胞培养适用 低内毒素,干粉,细胞培养适用 低电渗 低糖,丙酮酸钠,低碳酸氢钠,hepes,l-谷氨酰胺,酚红,过滤除菌,细胞培养适用 低糖,丙酮酸钠,低碳酸氢钠,低hepes,l-谷氨酰胺,无酚红,过滤除菌,细胞培养适用 低糖,丙酮酸钠,低碳酸氢钠,低hepes,l-谷氨酰胺,酚红,过滤除菌,细胞培养适用 低糖,丙酮酸钠,低碳酸氢钠,低hepes,无l-谷氨酰胺,酚红,过滤除菌,细胞培养适用 低糖,丙酮酸钠,无hepes,l-谷氨酰胺,酚红,过滤除菌,细胞培养适用 元素分析仪专用 光玻级,99.99% metals basis 光致抗蚀剂级,99% 光谱级, ≥99.5% 光谱级,≥99.8% 光谱纯,>99%(gc) 冻干粉, 5-15 units/mg protein 冻干粉 分子生物学,≥99%,8m in water 分子生物学级,≥99 % 分子生物级, ≥99.0% (at) 分子量 <10kda 分子量 7000~8000 分子量 8000-10000 分子量1.0mda~1.8mda 分子量10k 分子量200-400 分子量2000 分子量200kda~400kda 分子量240kda,脱乙酰度大于90%,取代度90% 分子量3000 分子量500 分子量800kda~1.0mda 分子量:10-20万 分子量:1200 分子量:150-250万 分子量:20-40万 分子量:2000 分子量:3000 分子量:3500-4500 分子量:40-80万 分子量:4000-5000 分子量:80-150万 分子量:900 分子量~10000 分子量~1000 分子量~1200 分子量~2000 分子量~6000 分子量≥1.8mda 分析对照品, 98%(hplc) 分析对照品, >98% 分析对照品, 100ug/ml in methanol 分析对照品, 96% 分析对照品, 97%(含水约40%) (单位重量以湿重计) 分析对照品, 99 atom % d, ≥98% 分析对照品, 99% 分析对照品, hplc≥98% 分析对照品, standard for gc, 99.5% 分析对照品, ≥90% 分析对照品, ≥95%(hplc) 分析对照品, ≥99%(gc) 分析对照品, ≥99.5%, 异构体混合物 分析对照品, ≥99.6%(hplc) 分析对照品,>99.7% 分析对照品,95% 分析对照品,97% 分析对照品,98%(hplc) 分析对照品,99.95% 分析对照品,>96% 分析对照品,>97% 分析对照品,hplc≥95% 分析对照品,≥97% 分析对照品,≥97.5% (gc),≥95 atom % d 分析对照品,≥98%(hplc) 分析对照品,≥98.5% 分析对照品,≥99.5%(gc) 分析对照品,≥99.7%(gc) 分析对照品,≥99.7% 分析对照品,≥99.8%(gc) 分析对照品,混合物 分析标准品,1000μg/ml甲醇溶液 分析标准品,98.6% 分析标准品,99.93% 分析标准品,99.95% 分析标准品,≥99% 分析标准品,异构体混合物 分析滴定液,2.0m 分析滴定液,4.0m 分析滴定液,8.0m 初熔点≥65℃, 晶体 制备色谱级, 99.5% 制备色谱级,99.8% 助滤剂 包含 100 ppm naoh 稳定剂, 99% 包含 100 ppm naoh 稳定剂, 99.9% 包含1500 ppm 对苯二酚稳定剂, 90% 包含50-185 ppm mehq稳定剂, 98% 包含≤1000 ppm 氧化丙烯稳定剂, 98% 包含有200 ppm mehq阻聚剂, 99% 医用研究级,白色 医用研究级,红色 医药级(usp/ep/bp/jp/cp) 医药级, ph. eur..bp, chp, jp, usp 医药级, ph. eur..jp, usp 升华, 99.9% (reo) 升华品99% 升华提纯, 98.0%(t) 升华提纯, 99.8% metals basis 升华树枝状, 99.9% (reo) 单酯含量: 90%, 异构体混合物 单酯和二酯的混合物 即用型喷雾试剂, 用于色谱法, 5 wt.% in ethanol 取代度 40% 取代度 92% 取代度 95% 取代度 98% 变性,10%,10孔,无菌无酶 变性,10%,15孔,无菌无酶 变性,15%,10孔,无菌无酶 变性,15%,15孔,无菌无酶 变性,5%,10孔,无菌无酶 变性,5%,15孔,无菌无酶 合成法, 99.9% 合成洗涤剂助洗剂用 含0.2 % 碳酸钾稳定剂, 97% 含10%淫羊藿苷 含200-650ppm mehq稳定剂 含edta,不含酚红,过滤除菌,细胞培养适用 含edta,含酚红,过滤除菌,细胞培养适用 含has,d-葡萄糖,l-谷氨酰胺,庆大霉素,不含酚红,过滤除菌,细胞培养适用 含has,d-葡萄糖,l-谷氨酰胺,庆大霉素,酚红,过滤除菌,细胞培养适用 含≤650 ppm mehq 稳定剂 含固量:40±2% 含有mehq作为抑制剂 含百秋里醇(约26%~33%) 含紫苏醛≥55% 含血清和pha-m,过滤除菌,细胞培养适用 含量(h3po4):105% 含量(h3po4):115% 含量(p2o5)% ≥85% 含量52.5~56.5 含量测定 含钙镁离子,过滤除菌,无菌无酶,细胞培养适用 含铂量:27% 固含量: 98% 固含量:99% 固含量~70% 固含量≥99% 固相,过滤除菌 块状,99.9% metals basis 型号: p-df-03-ls 型号:6501(1:1) 基质:sio2,表面基团:-epoxy,粒径:0.1-1μm,单位:5mg/ml 基质:sio2,表面基团:-nh2,粒径:3-4μm,单位10mg/ml 基质:sio2,表面基团:-nh2,粒径:4-5μm,单位10mg/ml 基质:sio2,表面基团:-sioh,粒径:0.1-1μm,单位:5mg/1ml 基质:sio2,表面基团:-sioh,粒径:0.1-1μm,单位:5mg/ml 基质:uf,表面基团:-cooh,粒径:1-2μm,单位:10mg/ml 基质:uf,表面基团:-cooh,粒径:4-5μm,单位:10mg/ml 基质:uf,表面基团:-epoxy,粒径:1-2μm,单位:10mg/ml 基质:uf,表面基团:-epoxy,粒径:2-3μm,单位:10mg/ml 基质:uf,表面基团:-epoxy,粒径:3-4μm,单位:10mg/ml 基质:uf,表面基团:-epoxy,粒径:4-5μm,单位:10mg/ml 基质:uf,表面基团:-epoxy,粒径:5-7μm,单位:10mg/ml 基质:uf,表面基团:-nh2,粒径:1-2μm,单位:10mg/ml 基质:uf,表面基团:-nh2,粒径:2-3μm,单位:10mg/ml 基质:uf,表面基团:-nh2,粒径:3-4μm,单位:10mg/ml 基质:uf,表面基团:-nh2,粒径:5-7μm,单位:10mg/ml 基质:uf,表面基团:-sioh,粒径:1-2μm,单位:10mg/ml 基质:uf,表面基团:-sioh,粒径:2-3μm,单位:10mg/ml 基质:uf,表面基团:-sioh,粒径:3-4μm,单位:10mg/ml 基质:uf,表面基团:-sioh,粒径:4-5μm,单位:10mg/ml 基质:uf,表面基团:-sioh,粒径:5-7μm,单位:10mg/ml 天然来源, 98%, 异构体混合物 天然来源, d-柠檬烯含量≥94% 天然来源, ≥85% 天然来源, ≥86% 天然来源, ≥95% 天然来源, ≥96%, 异构体混合物 天然来源, ≥97% 天然来源, ≥99% 天然来源,≥98% 天然矿物,晶粒,大约 0.06-19in 季铵盐含量:≥45% 容量法,0.1000mol/l(0.1n) 对照品,99.8% 工业用 工业级, 90% 工业级, 93% 工业级, 98% 工业级, ≥90%(gc) 工业级, 以cu计54-56% 干粉,无菌无酶,细胞培养适用 干粉,适用于细胞培养 平均mn~70000 平均分子量 ~400 平均分子量1800 平均分子量2500 平均分子量3300 平均分子量8000 平均分子量: 1000, 无色粘稠液体 平均分子量: 1000, 白色固体 平均分子量: 2000, 无色粘稠液体 平均分子量: 2000, 白色固体 平均分子量: 3000, 无色粘稠液体 平均分子量: 3000, 白色固体 平均分子量: 500, 无色粘稠液体 平均分子量: 500, 白色固体 平均分子量~500, 含900 ppm mehq作稳定剂 平末端,双抗性 平末端 异构体混合物, 40 wt. % in h2o 异构体混合物,80% 异构体混合物,97% 异构体混合物,99% 异构体混合物,含稳定剂mehq 异构体混合物 异构体的混和物 总胺值(mg koh/g): 115±4 总胺值(mg koh/g): 157±5 总胺值(mg koh/g): 40±2 总胺值(mg koh/g): 49±2 总胺值(mg koh/g): 60±3 总胺值(mg koh/g): 79±3 总胺值(mg koh/g):173~183 总胺值:178-188mgkoh/g, 酸值<10mgkoh/g 总胺值:82-92mgkoh/g 总胺值mgkoh/g 18~22,叔胺值mgkoh/g 18~22 总胺值mgkoh/g 28~32,叔胺值mgkoh/g 28~32 总胺值mgkoh/g 44~50,叔胺值mgkoh/g 44~50 总胺值mgkoh/g 50~60,叔胺值mgkoh/g 50-60 总胺值mgkoh/g 75~85,叔胺值mgkoh/g 75~85 总酰胺:375-450 mg/g 手性纯99% 抗凝血 抗凝血高保真 摩擦片专用,97%,1250目 支链异构体混合物,含稳定剂mehq 支链异构体类的混和物 无hepes,l-谷氨酰胺,无酚红,过滤除菌,细胞培养适用 无hepes,无l-谷氨酰胺,过滤除菌,细胞培养适用 无hepes,无l-谷氨酰胺,酚红,过滤除菌,细胞培养适用 无hepesl-谷氨酰胺,酚红,过滤除菌,细胞培养适用 无rnase,50 mm nacl; 10mm tris-hcl ph8.0; 1mm edta ph 8.0 无rnase 无rnase的tris-hcl溶液, tris-hcl浓度:40mm;ph:7.3 nacl浓度:60mm; mgcl2浓度:6mm 无动物源,干粉,细胞培养适用 无动物源,过滤除菌,细胞培养适用 无孔,粒径:1μm 无孔,粒径:500nm 无孔,粒径:50μm 无定型, 2-6mm (0.08-0.2in),99.999% (metals basis) 无定形, 0.5-2μm, 99.9% 无定形,<5μm,98% 无定形,99%,粒径(d50) 10-20um 无水 99.9%(reo) 无水, 99.95% 无水, 99.99% metal basis 无水, 99.995% metals basis 无水, 99.995% 无水, ≥98% 无水, 粉末, 99.5% metals basis 无水, 粉末, 99.9% 无水, 粉末, 99.95% metals basis 无水, 粉末, 99.999% metals basis 无水, 粉末, ≥99.99% metals basis 无水,-10目,99.99% trace metals basis 无水,99.5% metals basis 无水,99.999% metals basis 无水,99.999% 无水,acs,≥98% 无水,≥98% 无水,≥99% 无水,片状,99.9% metals basis 无水,粉末,99.9% trace metals basis 无水,粉末,99.9% 无水,粉末,99.99% metals basis 无水,鳞片, 99.99% metals basis 无水级, 99.99% trace metals basis 无水级, acs, ≥99% 无水级, usp,fcc,e 331 无水级, ≥99% 无水级, 用于药物研究, ep, bp, jp, usp 无水级,acs试剂, ≥99% 无水级,reagent plus, ≥99% 无水级,≥99.9%,含50ppm bht 抑制剂 无糖,丙酮酸钠,低碳酸氢钠,低hepes,l-谷氨酰胺,酚红,过滤除菌,细胞培养适用 无糖,碳酸氢钠,hepes,l-谷氨酰胺,酚红,无非必需氨基酸,过滤除菌,细胞培养适用 无菌,100 mm nacl; 10mm tris-hcl ph8.0; 1mm edta ph 8.0 无菌,免疫染色适用 无菌,蛋白提取适用 无菌无酶,细胞培养适用 无葡萄糖,d-半乳糖,丙酮酸钠,无碳酸氢钠,l-谷氨酰胺,酚红,过滤除菌,细胞培养适用 昆虫细胞培养级, ≥99% 晶体, aps ≈100nm, 99%, 等离子合成 晶状, -4+40 目,99.9999% (metals basis) 有效氧: 9-11% 有效氯 ≥20% 有效氯 ≥30% 来源: 天然五倍子 来源于米曲霉, 色谱纯化,冻干 来源于细菌 松油烯-4-醇含量:≥35% 染料含量~80% 染料法 柠檬烯>90% 标准溶液,10mm in water 树脂专用 植物细胞培养级, ≥98% 植物细胞培养级, ≥99.0%(gc) 植物细胞培养级,≥99.5% 橙色结晶 母液, 4.00mg/ml 比表面积10-15m2/g,粒度20nm-100nm,99.9% 比表面积3-8m2/g,粒度80nm,99.9% 氮≥19.5 % 沉淀法 沉淀碳酸钙, 中国药典 沉淀碳酸钙, 欧洲药典 沸点130-134℃ 沸点184-188℃ 油状50% 活性氧: 4.0%-5.3% 活性氧≥15% 活性物: 50%, 主要溶剂: 烷烃 活性物: 60%, 主要溶剂: 辛醇 活性物: 70%, 主要溶剂: 异丁醇 活性物: 70%, 主要溶剂: 甲醇 活性组分(以pbtca计): 30% 活性组分: 21-26% 涂料专用型,98.5%,6000目 液相,过滤除菌 淡黄水珠 淡黄液体 游离的液体98% 滴熔点142,中粒径25μm 灰白色粉末 灰色粉末 照相一级 特级 环保试剂,96% 环氧值: 0.63~0.68eq/100g 环氧值: 0.64-0.69eq/100g 环氧值: 0.65~0.70eq/100g 环氧值:0.20~0.28 eq/100g 环氧值:0.35~0.40eq/100g,粘度(25℃):40~80mpa.s 环氧值:0.70~0.80mol/100g,粘度(25℃):5~25mpa.s 环氧值eq/100g:0.70 环氧当量117-120gm/eq 环氧当量: 125-145 环氧当量: 425 g/mol~575 g/mol 环氧当量:143-154克/当量,粘度:100-300mpa·s 环氧当量:540-580 玻璃钢专用 珠子, 98% 生物制剂,适用于凝血分析,4%(w/v) in h2o 生物制剂,适用于昆虫细胞培养,85% 生物基含量33%-100% 生物技术级,≥99% 生物技术级,≥99.7% 生物技术级,≥99.9% 生物试剂级,99.0%,荧光分析专用 用于dna合成, 1 μm 滤膜过滤, ~0.45 m 乙腈溶液 用于dna溶液,过滤除菌 用于gc衍生化, ≥98.0% 用于gc衍生化 用于hplc,2.0 mol/l in h2o 用于hplc衍生化, ≥98.5% 用于hplc衍生化, ≥99% 用于hplc衍生化, ≥99.0%(t) 用于western及ip 用于分子生物学,95%,100mm in h2o 用于分子生物学,≥99.0%(t) 用于分子生物学,≥99.5%(gc) 用于分子生物学,≥99.5% 用于基准化研究, 99.8% 用于基准化研究, 99.9% 用于基准化研究, 99.9-100.1% 用于基准化研究, 99.99% 用于尿素的分光光度测定,99% 用于昆虫细胞培养,用于植物细胞培养, ≥96.0% 用于检测类固醇,≥99.0%(hplc) 用于植物细胞培养,99.5% 用于氨基酸分析,≥99.5%(gc) 用于电池,粒度:7-10um,99.9% metals basis 用于组氨酸甲基化 用于细胞与昆虫细胞培养,≥99.0%(t) 用于细胞和昆虫细胞培养, 81-83% as moo3 用于细胞和昆虫细胞培养,≥99%(t) 用于荧光分析,99.7% 用于药物研究, ≥98%(gc) 用于萃取分析, 优级试剂, acs,reag. ph eur 用于蛋白质分离,层析 电子级, 25%水溶液 电子级, 99.9% metals basis 电子级, 99.99999% metals basis 电子级, ≥99% 电子级,0.3~0.5um,99.5% 电子级,99.9% 电子级,99.98% metals basis 电子级,99.999% metals basis,钠除外 电子级 电子陶瓷专用 电泳专用级 电泳级,≥99% 电镀级,99% 白色,al2o3≥30% 白色到淡黄色粉末 白色固体 皂化值:84-94mgkoh/g, hlb值:13-14 皂化值mgkoh/g:235~245 盐水溶液 盐酸吡哆醇,低碳酸氢钠,hepes,l-谷氨酰胺,无酚红,过滤除菌,细胞培养适用 盐酸吡哆醇,低碳酸氢钠,hepes,无l-谷氨酰胺,酚红,过滤除菌,细胞培养适用 直径:0.1-0.3μm, 长度:3-5μm 直径:0.2-0.5μm, 长度:5-15μm 直径:1.0mm, 退火, 99.9995% metals basis 直径:20-100nm, 长度:≈1μm 直径:3-5μm, 长度:10-30μm 着色强度:100% 石化用芳烃油脱烯烃吸附剂 石油催化剂专用 硬脂酸和棕榈酸:≥ 90.0% 硬脂酸和甲基丙烯酸十六酯的混合物,含有mehq作为抑制剂 碲粒 2-3mm 99.999% 碳含量:43-48% 碳含量:61-67% 磷含量: 23%-24% 离子对色谱专用,≥99.0% 离子对色谱级, ≥99.0% (at) 筹码专用,98%,3000目 粉末, <5μm, ≥99.5% metals basis 粉末, 98% 粉末, 99.99% metals basis 粉末, ≤45μm, ≥99.5% metals basis 粉末, ≥99.9% metals basis 粉末,<5μm 粒径 (bet),97% 粉末,99.5% 粉末,99.99% metals basis,-200目 粉末,99.99% metals basis,100目 粉末,99.99% metals basis 粉末,过滤除菌,无酶 粉末,过滤除菌 粉末磷脂 粉煤灰活化剂用 粒度 6~10μm,防腐级 粒度:2-20μm 粒径<100 nm, 5 wt. %水溶液, ≥99.9% metals basis 粒径1.5-5μm 粒径:50nm 粒径≤50μm 粒状,1-4mm,99.999% metals basis 粒状,尺寸:0.8-4mm 粘度 2.7dl/g 粘度(5%水溶液,20℃):500-20000mpa.s 粘度(50°c): 16-24 mpas 粘度8,000-10,000 cst 粘度900-1300cps 粘度: 4-7 cst(25°c) 粘度: 40,000mpa.s(25 °c) 粘度: 40-80 cps 粘度:1160-1740 mm²/s 粘度:150-180 mpa.s 粘度:20~25mpa.s 粘度:300-800 mpa.s(25℃), 环氧当量:125-173 gm/eq 粘度:3000~6000 cps;115~135 gm/eq 粘度:600-1200mpa.s(25℃),环氧当量:150-180 g/mol 粘度:~300 cps,环氧当量:95-115 gm/eq 粘度:~600 cps,环氧当量:95-115 gm/eq 粘度mpa.s/25°c 40-80 粘性液体, 无防腐剂, 低过氧化物, 低羰 粘末端,双抗性 粘末端,无多克隆位点 粘末端 红外分析用,≥99% 红棕色粉末 约0.5mol/l的水溶液 约13%于四氢呋喃中, 约2mol/l 约15%于四氢呋喃中, 约2.0mol/l 约15%于己烷中 约16%于四氢呋喃中, 约1mol/l 约20%于水中 约40%水润湿品 约40%水溶液 约44%于异丙醇,水中 约63%于异丙醇中 约70%的水溶液 约75%于水中 约80%溶剂油溶液 (zn 17-19%) 约85%的水溶液 纯度标准物质100.00%±0.02% 纯度标准物质99.96%+-0.02% 纳米粉末<50纳米粒径(tem) 纳米粉末, <50nm 粒径 (bet), 99% trace metals basis 纳米粉末, 粒径<150nm(bet) 纳米粉末,≤100nm粒径(bet),≥99% trace metals basis 纳米纤维,d<2.5μm,l/d≥20,98% trace metals basis 细胞培养级, 99% 细胞培养级,98-101% 细胞培养级 细胞培养适用 结晶, aps ≤50nm, 98%, 气相激光合成 结晶, 医药级, ph.eur.,bp,usp 缓冲溶液, 10-40 units/mg protein (biuret) 羟值(mg koh/g):133~148 羟值(mg koh/g):23.0-25.0 羟值mgkoh/g:28±3 羟值mgkoh/g:40±4 羟值mgkoh/g:52±6 羟值mgkoh/g:67±5 羟值mgkoh/g:≤15,皂化值mgkoh/g:180~190 羟基值54-62 mg koh/g 耐叶绿素 耐火材料粘结剂用 聚乙二醇分子量:2000 聚乙二醇分子量:3400 脱乙酰度 80.0%-90.0% 脱色率≥90 %, 活性度≥180 h+mmol/kg, 水分≤10 % 脱色率≥90%, 比表面积≥180 m2/g, 水分≤3.0 %, 颗粒平均抗压力≥1 n, 抗水型 脱色率≥90%, 比表面积≥180 m2/g, 水分≤5.0 %, 颗粒平均抗压力≥1 n, 脱氮型 脱色率≥90%, 比表面积≥180 m2/g, 水分≤5.0%, 颗粒平均抗压力≥0.7 n 脱色率≥90%, 比表面积≥300 m2/g, 水分≤8.0%, 颗粒平均抗压力≥1 n 脱色率≥92 %, 活性度≥100 h+mmol/kg, 水分≤12 % 脱色率≥98% 色谱级, ≥99.9% 苯酚含量:40-60% 荧光粉专用 荧光级,>97%(hplc) 荧光级 药用注射级 药用级,99.5% 药用级,ph eur 药用级,≥99.5%(gc) 药用试剂级 葡萄糖当量13.0-17.0 葡萄糖当量:16.5-19.5 蒸馏枝形片状 99.95% metals basis 蒸馏树枝状, 99.9% (reo) 蒸馏纯化,≥99.5% 试剂级, >97.0%(gc) 试剂级, >98.0%(gc) 试剂级, >98.5%(gc) 试剂级, >99.0%(t) 试剂级, 10-15ppm tbc as stabilizer 试剂级, 100nm 试剂级, 2000目 试剂级, 25%水溶液 试剂级, 25%甲醇溶液 试剂级, 3% in h2o 试剂级, 325目, 白色 试剂级, 36% 试剂级, 40 wt. % in h2o 试剂级, 40% 试剂级, 40-45% mgo basis 试剂级, 49% 试剂级, 5% in h2o 试剂级, 54-57% cu basis 试剂级, 55.3% sno2 试剂级, 57.5% 试剂级, 60% 试剂级, 65% 试剂级, 77% 试剂级, 80% 试剂级, 85-90% 试剂级, 85.0% 试剂级, 92% 试剂级, 93% 试剂级, 96.5% 试剂级, 97.2% 试剂级, 98%,含3%乙醇稳定剂 试剂级, 98.0%(mixtures) 试剂级, 98.5%(gc) 试剂级, 99%,含10ppm bht稳定剂 试剂级, 99.0%,含40ppm二异丙胺 稳定剂 试剂级, 99.0%,白色晶体 试剂级, 99.5% metals basis 试剂级, 99.5%,低温煅烧 试剂级, 99.5%,粉末 试剂级, co 13.5~14.5% 试剂级, cr≈32% 试剂级, fe 21-23 % 试剂级, fe 21-23% 试剂级, mg 4.0-5.0% 试剂级, mg≈14% 试剂级, mn >47% 试剂级, mo≥47% 试剂级, pd 46.0 - 48.0 % 试剂级, pt ≥37.5% 试剂级, ratio(mgo/al2o3)=3-1,含水率:≤8.5% (100℃,1h) 试剂级, so2≥6% 试剂级, ≥ 44.0% 试剂级, ≥47.0%,含≤1.5 % h3po2 稳定剂 试剂级, ≥60% 试剂级, ≥75 wt. % in h2o 试剂级, ≥80%,gc 试剂级, ≥85 wt. % in h2o 试剂级, ≥85.0% moo3 basis 试剂级, ≥98.0%((hplc)) 试剂级, ≥98.0% 试剂级, ≥98.5 %(gc) 试剂级, ≥99 % 试剂级, ≥99% (titration) 试剂级, ≥99.0%(rt) 试剂级, ≥99.5%(gc) 试剂级, ≥99.5%,200目 试剂级, 含~75 ppm bht稳定剂 试剂级, 块状 试剂级, 异构体混合物 试剂级, 无水级 试剂级, 模数:2.00-2.20 试剂级, 模数:2.30-2.50 试剂级, 模数:2.80-3.00 试剂级, 模数:3.10-3.40 试剂级, 白色粉末 试剂级, 硅改性 试剂级, 硝酸法 试剂级, 硫酸铝法 试剂级, 碳化法 试剂级, 磷改性 试剂级, 镧改性 试剂级,70%溶液 试剂级,ir>52% 质量浓度 1000mg/l,u=16 mg/l 超干, 99.9% metals basis 超干, 99.996% metals basis 超干, 99.998% metals basis 超干,99.995% metals basis 超干级, 99%metals basis 超干级, 99.9% (reo) 超干级, 99.99%metals basis 超干级, 99.99% 超干级, 99.999% metals basis 超灵敏,用于 elisa 超纯生物试剂级, ≥99.5%(nt) 超纯生物试剂级,2m in h2o 超纯生物试剂级,8m in h2o 超纯生物试剂级,适用于分子生物学,1m in h2o 超纯级, 25%水溶液, 用于痕量分析 超纯级, ≥99.0%(kt) 超纯级,>99.5%(gc) 超纯级,99% 超纯级,99.9% 超纯级,≥99%(nmr) 超纯级,≥99% 超纯级,≥99.5%(gc) 软型,直链异构体的混和物 轻质,99% 过滤及高温双重灭菌,电转感受态细胞复苏培养 过滤除菌,细胞培养适用,过滤除菌,细胞培养适用 适用于hplc,99.0-101.0% 适用于maldi-ms,50%acn+47.5%h2o+2.5%tfa 适用于分子生物学,1.00±0.04mol/l in water 适用于发光,超纯生物试剂级,≥99.5%(gc) 适用于荧光, ≥90%(hplc) 通常38% 溶剂油溶液(6%fe) 通常92%, 溶于2-二乙基己酸 造影级 酐:90%酸:10% 酸值(mg koh/g) ≤0.5, 皂化值(mg koh/g): 325~360 酸值(mg koh/g) ≤10, 皂化值(mg koh/g): 100~130 酸值(mg koh/g) ≤10, 皂化值(mg koh/g): 85~105 酸值8.5-12mgkoh/g 酸值: ≤0.1 mg koh/g, 皂化值: 185-210 mg koh/g 酸值mgkoh/g ≤10,皂化值mgkoh/g 120~140 酸值mgkoh/g ≤10,皂化值mgkoh/g 212~222 酸值mgkoh/g ≤3,皂化值mgkoh/g 210~220 酸值≤1mgkoh/g 酸性, 二氧化硅含量:20 %-30 % 重蒸馏, ≥99.5% 金黄色,al2o3≥30% 钙基, 比表面积 240 m2/g 钛酸镁 粉末, 钠基, 比表面积 240 m2/g 钠除外,灰紫色 钯含量 0.5% 钻井液和完井液助剂用 铁未结合型,干粉,细胞培养适用 铁饱和型,干粉,细胞培养适用 铂含量,>99.9%,粒径10 nm 铂含量:52.0% 铂含量≥85.4% 铑含量(wt%) ,5% 铑含量,10.1% 铝含量:38%-41% 铱含量:43.0% 铱含量≥39% 锌: 20.5~22.0%, 磷: 19.5~21.0% 锑含量≥60% 锭, 99.9% metals basis,,液体石蜡保存 锭, 99.9% metals basis 锭, 存放于油中,99.9% metals basis 锭,99.5% 镀膜级,99.99% metals basis,3.5-5 mm 镀膜级,颗粒,99.9% metals basis 镁含量:57% 镍 45.0 - 52.5 % 长片段 闪烁纯,99% 阴离子型,1800万分子量,水解度:20-30% 阴离子型,1800万分子量,水解度:5-17% 阴离子型,2500-3000万分子量,水解度:5-17% 非变性,10%,10孔,无菌无酶 非变性,10%,15孔,无菌无酶 非变性,15%,10孔,无菌无酶 非变性,15%,15孔,无菌无酶 非变性,5%,10孔,无菌无酶 非变性,5%,15孔,无菌无酶 非离子剂, 酸值<5.5mgkoh/g 非离子剂 非离子型,分子量:1600万 非离子型,分子量:1800万 非离子型,分子量:2000万 非离子型,粘度:160-200mpa•s 顺反异构体混和物 饱和水溶液 饱和溶液 高丰度蛋白 高度精炼, 酸度低 高糖,l-谷氨酰胺,无碳酸氢钠,酚红,干粉,细胞培养适用 高糖,l-谷氨酰胺,碳酸氢钠,无酚红,l-丙氨酰-谷氨酰胺,过滤除菌,细胞培养适用 高糖,丙酮酸钠,低碳酸氢钠,hepes,l-谷氨酰胺,酚红,过滤除菌,细胞培养适用 高糖,丙酮酸钠,低碳酸氢钠,低hepes,l-谷氨酰胺,无酚红,过滤除菌,细胞培养适用 高糖,丙酮酸钠,低碳酸氢钠,低hepes,l-谷氨酰胺,酚红,atcc改良,过滤除菌,细胞培养适用 高糖,丙酮酸钠,低碳酸氢钠,低hepes,l-谷氨酰胺,酚红,减血清,过滤除菌,细胞培养适用 高糖,丙酮酸钠,低碳酸氢钠,低hepes,l-谷氨酰胺,酚红,过滤除菌,细胞培养适用 高糖,丙酮酸钠,低碳酸氢钠,低hepes,无l-谷氨酰胺,无酚红,过滤除菌,细胞培养适用 高糖,丙酮酸钠,无hepes,高l-谷氨酰胺,酚红,过滤除菌,细胞培养适用 高糖,丙酮酸钠,无hepes和l-谷氨酰胺,酚红,非必需氨基酸,过滤除菌,细胞培养适用 高糖,丙酮酸钠,无碳酸氢钠,hepes,l-谷氨酰胺,酚红,干粉,细胞培养适用 高糖,丙酮酸钠,无碳酸氢钠,无hepes,酚红,干粉,细胞培养适用 高糖,无l-谷氨酰胺,酚红,过滤除菌,细胞培养适用 高糖,无丙酮酸钠,hepes,l-谷氨酰胺,酚红,过滤除菌,细胞培养适用 高糖,无丙酮酸钠,hepes,高l-谷氨酰胺,酚红,过滤除菌,细胞培养适用 高糖,无丙酮酸钠,低碳酸氢钠,低hepes,l-谷氨酰胺,酚红,过滤除菌,细胞培养适用 高糖,无碳酸氢钠,无l-谷氨酰胺,无ht添加剂,无酚红,干粉,细胞培养适用 高糖,碳酸氢钠,无l-谷氨酰胺, ht添加剂,酚红,过滤除菌,细胞培养适用 高糖,碳酸氢钠,无l-谷氨酰胺,ht添加剂,无酚红,过滤除菌,细胞培养适用 高纯级,>99.5%(gc) 高纯级 黄腐酸fa ≥90%